Francis Clube, Simon Gray, Denis Struchen, Jean-Claude Tisserand, Stephane Malfoy, Yves Darbellay
Optical Engineering, Vol. 34, Issue 09, (September 1995) https://doi.org/10.1117/12.205673
TOPICS: Holography, Photomasks, Holograms, Semiconducting wafers, Lithography, Optical alignment, Prisms, Optical lithography, Flat panel displays, Imaging systems
Holographic mask aligners represent the latest addition to commercially available lithographic technologies. Their combination of very high resolution (< 0.5 μm) and very large exposure field brings a new capability to the microelectronics industry, especially for the manufacture of flat panel displays. The machine is fully automated and includes a scanning laser illumination system, a dynamic focus system permitting patterns to be printed over poor-flatness substrates, and an alignment system providing 0.3-μm overlay accuracy. A higher-accuracy alignment system under development demonstrates 50-nm measurement accuracy. A step-and-repeat hologram recording method enables tighter control of feature linewidth.