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Alex Pate
Photolithography Process Engineer at SAMSUNG Austin Semiconductor LLC
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Publications (3)
Proceedings Article | 20 March 2020 Presentation + Paper
Using e-Beam inspection and overlay as tool for identifying process weaknesses in semiconductor processing
Kwame Owusu-Boahen, Suraj Patil, Arun Vijayakumar, Alex Pate, Carl Han, Jorg Schwitzgebel, Chulwoo Kim, David Moreau
Proceedings Volume 11325, 113251V (2020) https://doi.org/10.1117/12.2551656
KEYWORDS: Semiconducting wafers, Inspection, Overlay metrology, Semiconductor manufacturing, Transmission electron microscopy, Manufacturing, Defect detection, Wafer testing, Semiconductors, Lithography
Proceedings Article | 28 March 2017 Presentation + Paper
A hybrid solution using computational prediction and measured data to accurately determine process corrections with reduced overlay sampling
Ben Noyes, Babak Mokaberi, Ram Mandoy, Alex Pate, Ralph Huijgen, Mike McBurney, Owen Chen
Proceedings Volume 10145, 1014508 (2017) https://doi.org/10.1117/12.2257486
KEYWORDS: Metrology, Process control, Semiconductors, Semiconducting wafers, Overlay metrology, Control systems, Data modeling, Computing systems, Time metrology, Modeling
Proceedings Article | 28 March 2017 Paper
Hybrid methodology for on-product focus control using CD and diffraction-based focus marks
Ben Noyes, Alex Pate, Steve Zhou, Marco J. van der Heijden, Kevin Park, Reza Sadat Gousheh, Ralph Huijgen, Michael McBurney, Francois van Loon
Proceedings Volume 10145, 1014526 (2017) https://doi.org/10.1117/12.2257419
KEYWORDS: Semiconducting wafers, Metrology, Semiconductors, Reticles, Finite element methods, Scanners, Critical dimension metrology, Inspection, Scanning electron microscopy, Cadmium
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