Dr. Alex K. Raub Profile

Dr. Alex K. Raub

Senior Design Enginneer

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Author

Publications (6)

Proceedings Article | 20 March 2006 Paper

Simulation of dense contact hole (κ₁=0.35) arrays with 193 nm immersion lithography

Alex Raub, Abani Biswas, Y. Borodovsky, G. Allen, S. Brueck

Proceedings Volume 6154, 61542U (2006) https://doi.org/10.1117/12.656694

KEYWORDS: Polarization, Photomasks, Optical proximity correction, Lithographic illumination, Imaging arrays, Lithography, Spatial frequencies, Printing, Interferometry, Optical lithography

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Proceedings Article | 4 May 2005 Paper

193nm dual layer organic BARCs for high NA immersion lithography

David Abdallah, Mark Neisser, Ralph Dammel, Georg Pawlowski, S. Ding, Francis Houlihan, Andrew Romano, J. Biafore, Alex Raub

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600736

KEYWORDS: Fourier transforms, Reflectivity, Lithography, Etching, Bottom antireflective coatings, Multilayers, Antireflective coatings, Semiconducting wafers, Stereolithography, 193nm lithography

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Proceedings Article | 4 May 2005 Paper

Study of barrier coats for application in immersion 193-nm lithography

Francis Houlihan, Wookyu Kim, Raj Sakamuri, Keino Hamilton, Alla Dimerli, David Abdallah, Andrew Romano, Ralph Dammel, Georg Pawlowski, Alex Raub, Steve Brueck

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601768

KEYWORDS: Thin film coatings, Lithography, Immersion lithography, Interferometry, Semiconducting wafers, Water, Refractive index, Contamination, Doping, Lithium

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Proceedings Article | 28 May 2004 Paper

Deep-UV immersion interferometric lithography

Alex Raub, Andrew Frauenglass, Steven Brueck, Will Conley, Ralph Dammel, Andy Romano, Mitsuru Sato, William Hinsberg

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536772

KEYWORDS: Liquids, Polymers, Lithography, Water, Coating, Immersion lithography, Interferometry, Picosecond phenomena, Prisms, Refractive index

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Proceedings Article | 26 June 2003 Paper

Deep UV immersion interferometric lithography

Alex Raub, Steven Brueck

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.482337

KEYWORDS: Liquids, Water, Lithography, Immersion lithography, Interferometers, Optical lithography, Semiconducting wafers, Interferometry, Absorption, Deep ultraviolet

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Proceedings Article | 29 October 2001 Paper

Selective intermixing of InGaAs/GaAs/AlGaAs quantum wells with spin-on-glass/MgF2 grating caps

Yan-Rui Zhao, Julius Yellowhair, Jinhyun Lee, Shuang Zhang, Alex Raub, Ronghua Wang, Petros Varangis, Abdel-Rahman El-Emawy, Mauro Vilela, Marek Osinski

Proceedings Volume 4594, (2001) https://doi.org/10.1117/12.446541

KEYWORDS: Gallium, Quantum wells, Magnesium fluoride, Diffusion, Annealing, Dielectrics, Chemical species, Photonic integrated circuits, Lithium, Gallium arsenide

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Showing 5 of 6 publications

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