Mr. An-Shun Liu Profile

An-Shun Liu

at Industrial Technology Research Institute

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 5 April 2007 Paper

Through-focus technique for overlay metrology

An-Shun Liu, Yi-Sha Ku, Nigel Smith

Proceedings Volume 6518, 65182X (2007) https://doi.org/10.1117/12.712030

KEYWORDS: Overlay metrology, Image sensors, Metrology, Algorithm development, Optical imaging, Error analysis, Optical design, Image analysis, Detection and tracking algorithms, Silicon

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SPIE Journal Paper | 1 December 2006

Through-focus technique for grating linewidth analysis with nanometer sensitivity

Yi-Sha Ku, An-Shun Liu, Nigel Smith

OE, Vol. 45, Issue 12, 123602, (December 2006) https://doi.org/10.1117/12.10.1117/1.2404959

KEYWORDS: Critical dimension metrology, Data modeling, Optical engineering, Detection and tracking algorithms, Systems modeling, Semiconducting wafers, Overlay metrology, Metrology, Image quality, Imaging systems

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Proceedings Article | 24 March 2006 Paper

Image-based nanoscale dimensional metrology

An-Shun Liu, Yi-Sha Ku, Nigel Smith

Proceedings Volume 6152, 61522G (2006) https://doi.org/10.1117/12.655932

KEYWORDS: Critical dimension metrology, Metrology, Detection and tracking algorithms, Image sensors, Optical imaging, Optical metrology, Dimensional metrology, Data modeling, Silicon, Objectives

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Proceedings Article | 10 September 2005 Paper

Through-focus algorithm to improve overlay tool performance

An-Shun Liu, Yi-Sha Ku, Nigel Smith

Proceedings Volume 5908, 59081E (2005) https://doi.org/10.1117/12.616422

KEYWORDS: Overlay metrology, Critical dimension metrology, Detection and tracking algorithms, Optical design, Computer aided design, Metrology, Charge-coupled devices, Algorithm development, Objectives, Optical filters

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Proceedings Article | 10 May 2005 Paper

A study of novel overlay targets designs

Yi-Sha Ku, An-Shan Liu, Nigel Smith

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598373

KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Detection and tracking algorithms, Optical design, Wafer testing, Silicon, Diffraction gratings, Wafer-level optics, Process control

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Proceedings Article | 10 May 2005 Paper

Improved thin film model for overlay metrology

Chi-Hong Tung, Yi-Sha Ku, An-Shun Liu, Nigel Smith

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599274

KEYWORDS: Overlay metrology, Thin films, Silicon, Silicon films, 3D modeling, Optical simulations, Diffraction gratings, Reflectivity, Diffraction, Optical filters

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Showing 5 of 6 publications

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