Dr. Antje Laessig Profile

Dr. Antje Laessig

at Qimonda Dresden GmbH & Co OHG

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Author

Publications (3)

Proceedings Article | 2 April 2007 Paper

Performance of chemically amplified resists at half-pitch of 45 nm and below

Yayi Wei, Markus Bender, Wolf-Dieter Domke, Antje Laessig, Michael Sebald, Sven Trogisch, David Back

Proceedings Volume 6519, 65190R (2007) https://doi.org/10.1117/12.706887

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Lithography, Image processing, Chemically amplified resists, EUV optics, 193nm lithography, Image resolution

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SPIE Journal Paper | 1 July 2006

Evaluation of 193-nm immersion resist without topcoat

Yayi Wei, Nickolay Stepanenko, Antje Laessig, Lars Voelkel, Michael Sebald

JM3, Vol. 5, Issue 03, 033002, (July 2006) https://doi.org/10.1117/12.10.1117/1.2358128

KEYWORDS: Semiconducting wafers, Photoresist processing, Photomasks, Contamination, Lithography, Scanners, Line edge roughness, Binary data, Head, Critical dimension metrology

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Proceedings Article | 29 March 2006 Paper

Evaluation of 193nm immersion resist without topcoat

Yayi Wei, N. Stepanenko, A. Laessig, L. Voelkel, M. Sebald

Proceedings Volume 6153, 615305 (2006) https://doi.org/10.1117/12.655664

KEYWORDS: Semiconducting wafers, Photoresist processing, Photomasks, Binary data, Contamination, Scanners, Line edge roughness, Head, Lithography, Astatine

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