Mr. Arthur Lin Profile

Arthur Lin

Sr. Applications Development Engineer at KLA Taiwan

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Author

Publications (5)

Proceedings Article | 27 March 2017 Presentation + Paper

A novel methodology for litho-to-etch pattern fidelity correction for SADP process

Shr-Jia Chen, Yu-Cheng Chang, Arthur Lin, Yi-Shiang Chang, Chia-Chi Lin, Jun-Cheng Lai

Proceedings Volume 10146, 101460N (2017) https://doi.org/10.1117/12.2258201

KEYWORDS: Lithography, Photoresist materials, Etching, Optical proximity correction, Resolution enhancement technologies, Photomasks, Semiconductors, Source mask optimization, Double patterning technology, Semiconducting wafers, Radon, Computer simulations

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Proceedings Article | 5 April 2012 Paper

Toward faster and better litho control in high-volume manufacturing

Chui-Fu Chiu, Chun-Yen Huang, Wen-Bin Wu, Chiang-Lin Shih, Healthy Huang, James Manka, DongSub Choi, Arthur Lin, David Tien

Proceedings Volume 8324, 832426 (2012) https://doi.org/10.1117/12.916409

KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Image segmentation, Metrology, Control systems, Lithography, Calibration, High volume manufacturing, Critical dimension metrology

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Proceedings Article | 13 March 2012 Paper

Process requirements for pitch splitting LELE double patterning at advanced logic technology node

R. Peng, I. Huang, H. Liu, H. J. Lee, John Lin, Arthur Lin, Allen Chang, Benjamin Szu-Min Lin, Ivan Lalovic

Proceedings Volume 8326, 83260X (2012) https://doi.org/10.1117/12.916420

KEYWORDS: Double patterning technology, Critical dimension metrology, Etching, Lithography, Optical lithography, Photomasks, Photoresist materials, Logic, Optical simulations, Cadmium

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Proceedings Article | 4 March 2010 Paper

The impact of resist model on mask 3D simulation accuracy beyond 40nm node memory patterns

Kao-Tun Chen, Shin-Shing Yeh, Ya-Hsuan Hsieh, Jun-Cheng Lai, Stewart Robertson, John Biafore, Sanjay Kapasi, Arthur Lin

Proceedings Volume 7640, 76401S (2010) https://doi.org/10.1117/12.846010

KEYWORDS: 3D modeling, Photomasks, Data modeling, Calibration, Performance modeling, 3D image processing, Semiconducting wafers, Seaborgium, Instrument modeling, Optical simulations

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Proceedings Article | 4 March 2010 Paper

Laser spectrum requirements for tight CD control at advanced logic technology nodes

R. C. Peng, H. J. Lee, John Lin, Arthur Lin, Allen Chang, Benjamin Szu-Min Lin

Proceedings Volume 7640, 76402C (2010) https://doi.org/10.1117/12.846516

KEYWORDS: Critical dimension metrology, Optical lithography, Light sources, SRAF, Control systems, Logic, Logic devices, Laser applications, Reticles, Laser scanners

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