Dr. Carolin Müller Profile

Dr. Carolin Müller

at Carl Zeiss SMT GmbH

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Author

Publications (3)

Proceedings Article | 22 November 2023 Presentation

ZEISS AIMS EUV high-NA for actinic mask review for the next EUV scanner generation

Klaus Gwosch, Renzo Capelli, Matthias Roesch, Robert Nicholls, Bruno Langbehn, Michael Mohn, Andreas Verch, Maximilian Albert, Grizelda Kersteen, Alexander Winkler, Carolin Müller, Sven Krannich

Proceedings Volume PC12750, PC127500O (2023) https://doi.org/10.1117/12.2687495

KEYWORDS: Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Imaging systems, Semiconducting wafers, Printing, Photomasks, Metrology, Lithography, Light sources and illumination

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Proceedings Article | 5 October 2023 Paper

Actinic EUV mask qualification for next generation lithography

Matthias Roesch, Renzo Capelli, Lukas Fischer, Klaus Gwosch, Grizelda Kersteen, Carolin Mueller, Robert Nicholls, Andreas Verch, Alexander Winkler

Proceedings Volume 12802, 128020L (2023) https://doi.org/10.1117/12.2681647

KEYWORDS: Metrology, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks, Reticles, Lithography, EUV optics

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Proceedings Article | 1 December 2022 Presentation + Paper

The power of algorithmic employed in a metrology system: AIMS EUV Digital Flex Illu

Renzo Capelli, Klaus Gwosch, Grizelda Kersteen, Matthias Roesch, Carolin Müller, Alexander Winkler, Andreas Verch

Proceedings Volume 12292, 122920N (2022) https://doi.org/10.1117/12.2641531

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Photomasks, Metrology, Image processing, Imaging systems, Image acquisition, Digital image processing, Defect inspection

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