Dr. Chandra Saru Saravanan Profile

Dr. Chandra Saru Saravanan

Principal Scientist at Onto Innovation Inc

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Author

Publications (5)

Proceedings Article | 1 April 2008 Paper

Extending scatterometry to the measurements of sub 40 nm features, double patterning structures, and 3D OPC patterns

Oleg Kritsun, Bruno La Fontaine, Yongdong Liu, Chandra Saravanan

Proceedings Volume 6924, 69241M (2008) https://doi.org/10.1117/12.776783

KEYWORDS: Scatterometry, Double patterning technology, Optical proximity correction, 3D modeling, 3D metrology, Lithography, Critical dimension metrology, Scatter measurement, Overlay metrology, Metrology

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Proceedings Article | 26 March 2008 Paper

Diffraction based overlay metrology for alpha-carbon applications

Chandra Saru Saravanan, Asher Tan, Prasad Dasari, Gary Goelzer, Nigel Smith, Seouk-Hoon Woo, Jang Ho Shin, Hyun Jae Kang, Ho Chul Kim

Proceedings Volume 6922, 69222W (2008) https://doi.org/10.1117/12.775811

KEYWORDS: Semiconducting wafers, Overlay metrology, Diffraction, Scatterometry, Spectroscopy, Diffraction gratings, Photomasks, Silicon, Reflectivity, Optical alignment

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Proceedings Article | 22 March 2008 Paper

Evaluating diffraction based overlay metrology for double patterning technologies

Chandra Saru Saravanan, Yongdong Liu, Prasad Dasari, Oleg Kritsun, Catherine Volkman, Alden Acheta, Bruno La Fontaine

Proceedings Volume 6922, 69220C (2008) https://doi.org/10.1117/12.774736

KEYWORDS: Overlay metrology, Double patterning technology, Silicon, Scatterometry, Optical lithography, Diffraction, Spectroscopy, Critical dimension metrology, Photoresist materials, Metrology

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Proceedings Article | 4 April 2007 Paper

Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Chandra Saru Saravanan, Srinivasan Nirmalgandhi, Oleg Kritsun, Alden Acheta, Richard Sandberg, Bruno La Fontaine, Harry Levinson, Kevin Lensing, Mircea Dusa, Jan Hauschild, Anita Pici

Proceedings Volume 6518, 651806 (2007) https://doi.org/10.1117/12.712470

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanners, Scatterometry, Finite element methods, Monochromatic aberrations, Reticles, Cadmium, Fused deposition modeling, Mathematical modeling

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Proceedings Article | 26 March 2007 Paper

Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

Oleg Kritsun, Bruno La Fontaine, Richard Sandberg, Alden Acheta, Harry Levinson, Kevin Lensing, Mircea Dusa, Jan Hauschild, Anita Pici, Chandra Saravanan, Kunie Primak, Rahul Korlahalli, Srinivasan Nirmalgandhi

Proceedings Volume 6520, 65200L (2007) https://doi.org/10.1117/12.715971

KEYWORDS: Semiconducting wafers, Scanners, Scatterometry, Critical dimension metrology, Metrology, Lithography, Modulation transfer functions, Cadmium, Spatial frequencies, Immersion lithography

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