Dr. Chang Ho Lee Profile

Dr. Chang Ho Lee

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 27 August 2009 Paper

The technological trends of future AMOLED

Jong hyuk Lee, Hye Dong Kim, Chang Ho Lee, Hyun-Joong Chung, Sung Chul Kim, Sang Soo Kim

Proceedings Volume 7415, 74150O (2009) https://doi.org/10.1117/12.829021

KEYWORDS: Organic light emitting diodes, Glasses, Optical lithography, Oxides, Metals, LCDs, Thin films, Cell phones, Display technology

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Proceedings Article | 8 November 2005 Paper

Mask error enhancement factor variation with pattern density

Hye-Young Kang, Sung-Hyuck Kim, Chang-Ho Lee, Hye-Keun Oh

Proceedings Volume 5992, 599233 (2005) https://doi.org/10.1117/12.632408

KEYWORDS: Photomasks, Critical dimension metrology, Diffusion, Semiconducting wafers, Scattering, Optical proximity correction, Electronics, Chemically amplified resists, Applied physics, Semiconductors

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Proceedings Article | 28 June 2005 Paper

ArF photoresist parameter optimization for mask error enhancement factor reduction

Chang Lee, Seok Han, Kyoung Park, Sangwoong Yoon, Hye Kang, Hyun Oh, Ji Lee, Young Kim, Tae Kim, Hye-Keun Oh

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617210

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist materials, Line edge roughness, Absorbance, Critical dimension metrology, Polymers, Photoresist processing, Diffusion, Optical properties

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Proceedings Article | 4 May 2005 Paper

ArF photoresist parameter optimization for mask error enhancement factor reduction

Chang Ho Lee, Seok Han, Kyung Sil Park, Hye Young Kang, Hyun Wook Oh, Ji Eun Lee, Kyung Me Kim, Young Ho Kim, Tae Sung Kim, Hye-Keun Oh

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600308

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist materials, Line edge roughness, Absorbance, Critical dimension metrology, Polymers, Photoresist processing, Diffusion, Optical properties

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Proceedings Article | 14 May 2004 Paper

Influence of activation energy on LER in chemically amplified KrF photoresists

Jae Hyun Kim, Chang Ho Lee, Seok Bong Park, Won Mi Kim, Sang Sik Moon, Kyung-Mee Kim, Shi Yong Lee, Sangwoong Yoon, Young Ho Kim, Sang-Mun Chon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533880

KEYWORDS: Diffusion, Photoresist materials, Line edge roughness, Polymers, Atomic force microscopy, Temperature metrology, Scanning electron microscopy, Photoresist developing, Lithography, Glasses

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