Chih-Hao Huang
Inventor at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 10 April 2024 Poster + Paper
Onur Demirer, Robin Maximilian Zech, Chao-Jen Tsou, W. Wang, C. Huang, Elvis Yang, Afu Chiu, Alexander Muehle, Holger Bald, Clemens Utzny, Scott Eitapence, Boris Habets
Proceedings Volume 12955, 1295527 (2024) https://doi.org/10.1117/12.3009830
KEYWORDS: Semiconducting wafers, Overlay metrology, Control systems, Simulations, Scanners, Metrology, Lithography, Advanced process control, High volume manufacturing

Proceedings Article | 28 April 2023 Poster + Paper
Syed Naime Mohammad, Chao-Jen Tsou, Afu Chiu, Norman Birnstein, Erick deGouw, Clemens Utzny, Philip Groeger, Stefan Buhl, W. Wang, C. Huang, Elvis Yang, T. Yang, K. Chen
Proceedings Volume 12494, 1249415 (2023) https://doi.org/10.1117/12.2657965
KEYWORDS: Semiconducting wafers, Scanners, Contamination, High volume manufacturing, Particles, Neodymium, Tunable filters, Defense systems, Sensors, Image enhancement

Proceedings Article | 26 May 2022 Poster + Paper
Masahiro Yoshida, W. H. Wang, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Yosuke Takarada, Yoshiki Sakamoto, Shin-ichi Egashira, Ken Otani, Tsukasa Saito, Shoshi Katayama, Seiya Miura, Douglas Shelton
Proceedings Volume 12053, 120531L (2022) https://doi.org/10.1117/12.2611020
KEYWORDS: Data modeling, Semiconducting wafers, Overlay metrology, Machine learning, 3D modeling, Lithography, Data acquisition, Wafer testing, Target detection, Process modeling

Proceedings Article | 26 May 2022 Poster + Paper
W. H. Wang, Irina Brinster, Mohsen Maniat, Fatima Anis, Yen-Hui Lee, Sven Boese, C. F. Tseng, Wei-Yuan Chu, Boris Habets, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen
Proceedings Volume 12053, 120531Q (2022) https://doi.org/10.1117/12.2613202
KEYWORDS: Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Optical parametric oscillators, Performance modeling, Process modeling, Machine learning, Semiconductor manufacturing, Data processing

Proceedings Article | 27 March 2017 Paper
C. J. Tu, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen
Proceedings Volume 10146, 101461P (2017) https://doi.org/10.1117/12.2256653
KEYWORDS: Process control, Antireflective coatings, Interfaces, Capillaries, Photoresist developing, Photoresist materials, Back end of line, Metals, Optical lithography, Copper, Semiconducting wafers, Coating

Showing 5 of 12 publications
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