Mr. David Power Profile

David Power

Principal Engineer at TEL Technology Ctr America LLC

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Author

Publications (6)

SPIE Journal Paper | 22 November 2024

Sub-20-nm tip-to-tip enabled by anti-spacer patterning

Jodi Grzeskowiak, Michael Murphy, David Power, Steven Grzeskowiak, Jacob Dobson, Andrew Weloth, Charlotte Cutler, Eric Liu, David Conklin, Anton Devilliers

JM3, Vol. 24, Issue 01, 011004, (November 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011004

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Proceedings Article | 10 April 2024 Presentation

Breaching high-NA EUV dimensions with 193i anti-spacer multipatterning

Michael Murphy, Jacob Dobson, Jodi Grzeskowiak, David Power, Charlotte Cutler, Andrew Weloth, David Conklin

Proceedings Volume 12957, 1295711 (2024) https://doi.org/10.1117/12.3010447

KEYWORDS: Extreme ultraviolet, Printing, Lithography, Optical lithography, Integrated circuits, Film thickness, Extreme ultraviolet lithography, Etching, Double patterning technology, Chemistry

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Proceedings Article | 9 April 2024 Presentation + Paper

Sub-20nm tip-to-tip enabled by anti-spacer patterning

J. Grzeskowiak, M. Murphy, D. Power, S. Grzeskowiak, E. Liu, D. Conklin, A. deVilliers

Proceedings Volume 12957, 129570U (2024) https://doi.org/10.1117/12.3009982

KEYWORDS: Double patterning technology, Advanced patterning, Photoresist materials, Optical lithography, Etching, Extreme ultraviolet, Design, Extreme ultraviolet lithography, Lithography, Scanning electron microscopy, Printing, Semiconducting wafers

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Proceedings Article | 20 March 2018 Presentation + Paper

Optimization of optical proximity correction to reduce mask write time using genetic algorithm

Gregory Dick, Liang Cao, Abhishek Asthana, Jing Cheng, David Power

Proceedings Volume 10588, 1058806 (2018) https://doi.org/10.1117/12.2297400

KEYWORDS: Optical proximity correction, Genetic algorithms, Optimization (mathematics), Photomasks, Data processing

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Proceedings Article | 16 March 2016 Paper

Wafer hotspot prevention using etch aware OPC correction

Ayman Hamouda, Dave Power, Mohamed Salama, Ao Chen

Proceedings Volume 9781, 978115 (2016) https://doi.org/10.1117/12.2220778

KEYWORDS: Etching, Optical proximity correction, Optical lithography, Semiconducting wafers, Calibration, Photomasks, Bridges, Yield improvement, Computer simulations, Lithography

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Proceedings Article | 15 March 2016 Paper

OPC recipe optimization using genetic algorithm

Abhishek Asthana, Bill Wilkinson, Dave Power

Proceedings Volume 9780, 97800J (2016) https://doi.org/10.1117/12.2219166

KEYWORDS: Inspection, Optical proximity correction, Genetic algorithms, Standards development, Optimization (mathematics), Resolution enhancement technologies, Computational lithography, Metals, Photomasks, Photovoltaics

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Showing 5 of 6 publications

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