David R. Cho
Senior Director Operations Central Team
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2015 Paper
Sohan Mehta, Lakshmi Ganta, Vikrant Chauhan, Yixu Wu, Sunil Singh, Chia Ann, Lokesh Subramany, Craig Higgins, Burcin Erenturk, Ravi Srivastava, Paramjit Singh, Hui Peng Koh, David Cho
Proceedings Volume 9425, 94250B (2015) https://doi.org/10.1117/12.2087546
KEYWORDS: Critical dimension metrology, Binary data, Double patterning technology, Etching, Photomasks, Photoresist processing, Nanoimprint lithography, Image processing, Optical lithography, Neodymium

Proceedings Article | 8 October 2014 Paper
Proceedings Volume 9235, 92351I (2014) https://doi.org/10.1117/12.2068466
KEYWORDS: Inspection, Defect detection, Photomasks, Reticles, Particles, Air contamination, Optical proximity correction, Contamination, SRAF, Image analysis

Proceedings Article | 2 April 2014 Paper
Proceedings Volume 9050, 90501U (2014) https://doi.org/10.1117/12.2034206
KEYWORDS: Semiconducting wafers, Reticles, Calibration, Photomasks, Critical dimension metrology, Source mask optimization, Computational modeling, Optical lithography, Wavefronts, Overlay metrology

Proceedings Article | 2 April 2014 Paper
Lokesh Subramany, Michael Hsieh, Chen Li, Hui Peng Koh, David Cho, Anna Golotsvan, Vidya Ramanathan, Ramkumar Karur Shanmugam, Lipkong Yap
Proceedings Volume 9050, 90502Q (2014) https://doi.org/10.1117/12.2046598
KEYWORDS: Overlay metrology, Semiconducting wafers, Chemical mechanical planarization, Optical alignment, Metrology, Image quality, Optical filters, Image processing, Reticles, Scanners

Proceedings Article | 29 March 2013 Paper
Proceedings Volume 8682, 86820O (2013) https://doi.org/10.1117/12.2012331
KEYWORDS: Diffusion, Critical dimension metrology, Polymers, Photoresist processing, Image processing, Manufacturing, Lithography, Optical lithography, Data modeling, Modulation

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