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Deanna Soucie
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Publications (1)
Proceedings Article | 18 April 2017 Presentation + Paper
Double-deprotected chemically amplified photoresists (DD-CAMP): higher-order lithography
William Earley, Deanna Soucie, Kenji Hosoi, Arata Takahashi, Takashi Aoki, Brian Cardineau, Koichi Miyauchi, Jay Chun, Michael O'Sullivan, Robert Brainard
Proceedings Volume 10146, 101460H (2017) https://doi.org/10.1117/12.2258324
KEYWORDS: Photoresist materials, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Polymers, Line width roughness, Solids, Polymerization, Sodium, Glasses
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