Mr. Dong-Seok Nam Profile

Dong-Seok Nam

Senior Engineer at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (26)

Proceedings Article | 25 September 2010 Paper

Plasma monitoring of chrome dry etching for mask making

Sung-Won Kwon, Dong-Chan Kim, Dong-Seok Nam, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 7823, 78230F (2010) https://doi.org/10.1117/12.866828

KEYWORDS: Etching, Dry etching, Chromium, Oxygen, Emission spectroscopy, Photomasks, Plasma etching, Mask making, Chlorine, Plasma

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Proceedings Article | 11 May 2009 Paper

E-beam shot count estimation at 32 nm HP and beyond

Jin Choi, Sang Hee Lee, Dongseok Nam, Byung Gook Kim, Sang-Gyun Woo, Han Ku Cho

Proceedings Volume 7379, 737917 (2009) https://doi.org/10.1117/12.824284

KEYWORDS: Lithography, Electron beam lithography, Image processing, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation, Edge roughness

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Proceedings Article | 19 May 2008 Paper

Image placement error of photomask due to pattern loading effect: analysis and correction technique for sub-45 nm node

Jin Choi, Sang Hee Lee, Dongseok Nam, Byung Gook Kim, Sang-Gyun Woo, Han Ku Cho

Proceedings Volume 7028, 70281X (2008) https://doi.org/10.1117/12.793074

KEYWORDS: Lithography, Electron beam lithography, Etching, Image processing, Error analysis, Electrons, Image registration, Finite element methods, Photomasks, Critical dimension metrology

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Proceedings Article | 30 October 2007 Paper

Improvement of mask CD uniformity for below 45-nm node technology

Hojune Lee, Seokjong Bae, Junghoon Park, Dongseok Nam, Byunggook Kim, Sang-Gyun Woo, HanKu Cho

Proceedings Volume 6730, 67302Z (2007) https://doi.org/10.1117/12.746810

KEYWORDS: Electron beams, Curium, Etching, Ions, Chromium, Photomasks, Plasma etching, Critical dimension metrology, Photoresist processing, Information operations

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Proceedings Article | 15 May 2007 Paper

New PEC optimization for the mask fabrication of sub-50-nm memory device

Sanghee Lee, Dongguk Ryu, Junghoon Park, Dongseok Nam, Heebom Kim, Byunggook Kim, Sanggyun Woo, Hanku Cho

Proceedings Volume 6607, 660725 (2007) https://doi.org/10.1117/12.728988

KEYWORDS: Electron beam lithography, Electron beams, Backscatter, Scattering, Laser scattering, Control systems, Monte Carlo methods, Photomasks, Optical proximity correction, Mask making

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Proceedings Article | 20 October 2006 Paper

Required mask specification for mass production devices below 65-nm design node

Dongseok Nam, Soohan Choi, Jonggul Doh, Young-hwa Noh, Hojune Lee, Yu-jeung Sin, Bo-hye Kim, Man-kyu Kang, Byunggook Kim, Seong-woon Choi, Woosung Han

Proceedings Volume 6349, 634928 (2006) https://doi.org/10.1117/12.686534

KEYWORDS: Semiconductors, Manufacturing, Computer simulations, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Tolerancing

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Proceedings Article | 20 May 2006 Paper

Mask fabrication results using new laser writing system: Sigma7300

Ho-June Lee, Dong-Suk Nam, Sang-Hee Lee, Hyun-Soo Kim, Jung-Hoon Lee, Hak-Seung Han, Byung-Gook Kim, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6283, 62831J (2006) https://doi.org/10.1117/12.681744

KEYWORDS: Light sources, Particles, Inspection, Printing, Photomasks, Optical simulations, SRAF, Mask making, Semiconducting wafers, Laser systems engineering

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Proceedings Article | 24 March 2006 Paper

Improved scatterometry method of critical dimension measurements and its application for control of development process

Irina Pundaleva, Dongseok Nam, Hakseung Han, Donggun Lee, Woosung Han

Proceedings Volume 6152, 61520G (2006) https://doi.org/10.1117/12.657324

KEYWORDS: Diffraction, Sensors, Spectroscopy, In situ metrology, Scatterometry, Time metrology, Process control, Photomasks, Critical dimension metrology, Diffraction gratings

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Proceedings Article | 24 March 2006 Paper

Investigation on polarization monitoring mask: pattern design and experimental verification

Chan Hwang, Dong-Woon Park, Jang-Ho Shin, Dong-Seok Nam, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6152, 61521M (2006) https://doi.org/10.1117/12.657054

KEYWORDS: Diffraction, Reticles, Optical lithography, Lithographic illumination, Polarization, Polarizers, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 9 November 2005 Paper

Improved modeling of fogging and loading effect correction

Sanghee Lee, Byunggook Kim, Hakseung Han, Dongseok Nam, Seongyong Moon, Seongwoon Choi, Woosung Han

Proceedings Volume 5992, 59924U (2005) https://doi.org/10.1117/12.632078

KEYWORDS: Electron beam lithography, Electron beams, Data modeling, Modulation, Backscatter, Etching, Dry etching, Photomasks, Critical dimension metrology, System on a chip

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Proceedings Article | 8 November 2005 Paper

How large MEEF is acceptable for the low-k₁ lithography?

Dongseok Nam, Dong-Gun Lee, Byunggook Kim, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 59922W (2005) https://doi.org/10.1117/12.632066

KEYWORDS: Semiconductors, Lithography, Optical testing, Scanning electron microscopy, Data processing, Photomasks, Mask making, Critical dimension metrology, Semiconducting wafers, Tolerancing

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Proceedings Article | 12 May 2005 Paper

Experimental investigation of solid immersion lens lithography

Tao Chen, Tom Milster, Dongseok Nam, Seung Yang

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600065

KEYWORDS: Lithography, Microscopes, Polarization, Semiconductor lasers, Collimation, Solids, Objectives, Photomasks, Semiconducting wafers, Near field optics

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Proceedings Article | 12 May 2005 Paper

Potential of solid immersion lithography using I-line and KrF light source

Dongseok Nam, Tom Milster, Tao Chen

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600082

KEYWORDS: Lithography, Refractive index, Light sources, Optical lithography, Polarization, Photoresist materials, Near field, Solids, Immersion lithography, Near field optics

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Proceedings Article | 6 December 2004 Paper

Maskless lithography with the solid immersion lens nanoprobes

Tom Milster, Tao Chen, Dongseok Nam, Tuviah Schlesinger

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569328

KEYWORDS: Lithography, Dielectrics, Photoresist materials, Near field, Transducers, Solids, Photomasks, Maskless lithography, Semiconducting wafers, Near field optics

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Proceedings Article | 28 May 2004 Paper

Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Ho-Chul Kim, Dong-Seok Nam, Gi-Sung Yeo, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533373

KEYWORDS: Lithography, Electronics, Optical lithography, Scattering, Light scattering, Chromium, Optical testing, Optical proximity correction, Critical dimension metrology, Stray light

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Proceedings Article | 28 May 2004 Paper

Layer-specific illumination for low k1 periodic and semiperiodic DRAM cell patterns: design procedure and application

Chan Hwang, Dong-Seok Nam, Jin-Hong Park, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536362

KEYWORDS: Light sources, Genetic algorithms, Optical lithography, Computing systems, Computer simulations, Optical resolution, Image enhancement, Optical proximity correction, Optimization (mathematics), Resolution enhancement technologies

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Proceedings Article | 26 June 2003 Paper

Evaluation of ArF CLM in the sub-100-nm DRAM cell

Ju-Hyung Lee, Dong-Hoon Chung, Ho-Chul Kim, Dong-Seok Nam, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485406

KEYWORDS: Lithography, Quartz, Scanners, Manufacturing, Scanning electron microscopy, Photomasks, Nanoimprint lithography, Chlorine, Semiconducting wafers, Phase shifts

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Proceedings Article | 26 June 2003 Paper

Layer-specific illumination optimization by Monte Carlo method

Ho-Chul Kim, Dong-Seok Nam, Chan Hwang, Young Kang, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485383

KEYWORDS: Lithography, Spectrum analysis, Electronics, Lithographic illumination, Scanners, Monte Carlo methods, Image enhancement, Double patterning technology, Critical dimension metrology, Resolution enhancement technologies

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Proceedings Article | 26 June 2003 Paper

Flare-induced CD variation correction using transmittance controlled mask

Dong-Seok Nam, Gi-Sung Yeo, Jong Rak Park, Sung-Woon Choi, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485409

KEYWORDS: Semiconductors, Optical lithography, Contamination, Cadmium, Quartz, Control systems, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 26 June 2003 Paper

Process latitude extension in low-k1 DRAM lithography using specific layer-oriented illumination design

Young Kang, Dong-Seok Nam, Chan Hwang, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485384

KEYWORDS: Lithography, Diffraction, Optical lithography, Lithographic illumination, Image processing, Monte Carlo methods, Double patterning technology, Image storage, Semiconducting wafers, Resolution enhancement technologies

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Proceedings Article | 27 December 2002 Paper

Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell

Ju-Hyung Lee, Dong-Hoon Chung, Dong-Ho Cha, Ho-Chul Kim, Joon-Soo Park, Dong-Seok Nam, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467504

KEYWORDS: Lithography, Surface plasmons, Quartz, Scanners, Manufacturing, Scanning electron microscopy, Photomasks, Nanoimprint lithography, Semiconducting wafers, Phase shifts

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Proceedings Article | 30 July 2002 Paper

Effectiveness and confirmation of local area flare measurement method in various pattern layouts

Dongseok Nam, Eunmi Lee, Sung-gon Jung, Young Kang, Gisung Yeo, Junghyun Lee, Hanku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474608

KEYWORDS: Semiconductors, Reticles, Optical lithography, Contamination, Scattering, Light scattering, Projection systems, Photomasks, Critical dimension metrology, Standards development

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Proceedings Article | 24 July 2002 Paper

Implementation of the ArF resists based on VEMA for sub-100-nm device

Hyun-Woo Kim, Sook Lee, Sang-Jun Choi, Sung-Ho Lee, Yool Kang, Sang-Gyun Woo, Dongseok Nam, Yun-Sook Chae, Jisoo Kim, Joo-Tae Moon, Robert Kavanagh, George Barclay

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474253

KEYWORDS: Lithography, Etching, Dry etching, Polymers, Scanners, Chemistry, Manufacturing, Resistance, Scanning electron microscopy, Line edge roughness

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Proceedings Article | 5 July 2000 Paper

Pattern asymmetry correction using assist patterns

Manhyoung Ryoo, Dongseok Nam, Hanku Cho, Joo-Tae Moon, Sangin Lee

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389019

KEYWORDS: Lithography, Monochromatic aberrations, Metrology, Optical lithography, Scanning electron microscopy, Photomasks, Logic devices, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 5 July 2000 Paper

Patterning 220-nm pitch DRAM patterns by using double mask exposure

Dongseok Nam, Nakgeuon Seong, Hanku Cho, Joo-Tae Moon, Sangin Lee

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389017

KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Domes, Photomasks, Double patterning technology, Optical alignment, Critical dimension metrology, Semiconducting wafers, Photoresist developing

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Proceedings Article | 29 June 1998 Paper

Lithography of 180-nm design rule for 1-Gb DRAM

Dongseok Nam, Junghyun Lee, Chang-Hwan Kim, Seong-Woon Choi, Hoyoung Kang, Joo-Tae Moon

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310727

KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Control systems, Photoresist materials, Photomasks, Critical dimension metrology, Photoresist processing, Photoresist developing, 193nm lithography

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Showing 5 of 26 publications

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