Mr. Fen-Shuo Chen Profile

Fen-Shuo Chen

Plant Manager at Tekscend Photomask Chunghwa Inc.

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Author

Publications (7)

Proceedings Article | 11 May 2009 Paper

Reduction of MRC error review time through the simplified and classified MRC result

Casper Lee, Jason Lin, Frank Chen

Proceedings Volume 7379, 73790X (2009) https://doi.org/10.1117/12.824274

KEYWORDS: Error analysis, Photomasks, Databases, Inspection, Current controlled current source, Semiconducting wafers, Cesium, Lithium, Mask making

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Proceedings Article | 11 May 2007 Paper

Influence of environmental components on haze growth

Joseph Gordon, David Chan, Larry Frisa, Colleen Weins, Christian Chovino, John Keagy, Steve Mahoney, Frank Chen, Makoto Kozuma, Kyoko Kuroki, Takahiro Matsuura

Proceedings Volume 6607, 660707 (2007) https://doi.org/10.1117/12.728920

KEYWORDS: Air contamination, Photomasks, Reticles, Pellicles, Atmospheric particles, Sulfur, Gases, Nitrogen, Semiconducting wafers, Semiconductors

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Proceedings Article | 20 October 2006 Paper

Non-chemical cleaning technology for sub-90nm design node photomask manufacturing

Star Hoyeh, Richard Chen, Makoto Kozuma, Joann Kuo, Torey Huang, Frank Chen

Proceedings Volume 6349, 63492U (2006) https://doi.org/10.1117/12.686075

KEYWORDS: Ozone, Scanning probe microscopy, Photomasks, Ions, Hydrogen, Reflectivity, Manufacturing, Particles, Plasma, Photoresist processing

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Proceedings Article | 20 October 2006 Paper

Incoming database verification and management for mask data preparation

Frank Chen, Casper Lee, Jason Lin

Proceedings Volume 6349, 63493U (2006) https://doi.org/10.1117/12.685916

KEYWORDS: Databases, Computing systems, Error control coding, Photomasks, Data storage, Lithium, Computed tomography, Data archive systems, Manufacturing, Data storage servers

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Proceedings Article | 20 October 2006 Paper

Study of chromeless mask quartz defect detection capability for 80-nm post structure

Jerry Lu, Boster Wang, Frank Chen, Orion Wang, Jomarch Chou, Orson Lin, Jackie Cheng, Ellison Chen, Paul Yu

Proceedings Volume 6349, 63493K (2006) https://doi.org/10.1117/12.685660

KEYWORDS: Inspection, Photomasks, Defect detection, Quartz, Semiconducting wafers, Reticles, Lithography, Chromium, Resolution enhancement technologies, Manufacturing

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Proceedings Article | 5 July 2000 Paper

Optical holography used in optical microlithography

Boru Feng, Jin Zhang, Desheng Hou, Fen Chen

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389082

KEYWORDS: Holography, Optical lithography, 3D image reconstruction, Photomasks, Holograms, Image resolution, Imaging systems, Semiconducting wafers, Diffraction, Microelectronics

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Proceedings Article | 5 July 2000 Paper

Simpler attenuated phase-shifting mask

Jin Zhang, Boru Feng, Desheng Hou, Chongxi Zhou, HanMin Yao, Yongkang Guo, Fen Chen, Fang Sun, Ping Su

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388954

KEYWORDS: Phase shifts, Photomasks, Manufacturing, Chromium, Optics manufacturing, Electronics, Transmittance, Etching, Scanning electron microscopy, Mask making

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Showing 5 of 7 publications

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