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Feng Qian
Senior Development Engineer at Photronics Inc
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Publications (1)
Proceedings Article | 11 March 2002 Paper
Photomask blank shelf-life study on e-beam chemically amplified resists
Feng Qian, David Chan, Masahiko Ishizuka, Akira Kurabayashi, Takumi Ogawa, Ryoichi Kobayashi, Takaei Sasaki
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458337
KEYWORDS: Photomasks, Packaging, Compact discs, Critical dimension metrology, Chemically amplified resists, Thin film coatings, Scanning electron microscopy, Environmental sensing, Polymers, Control systems
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