Frank Staals
System Engineer
SPIE Involvement:
Author
Area of Expertise:
Lithography , Focus , Imaging
Publications (7)

Proceedings Article | 20 March 2020 Presentation + Paper
Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara
Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246
KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

Proceedings Article | 16 March 2016 Paper
Proceedings Volume 9781, 97810S (2016) https://doi.org/10.1117/12.2219143
KEYWORDS: Scanners, Design for manufacturability, Manufacturing, Product engineering, Reticles, Visualization, Image resolution, Chemical mechanical planarization, Sensors, Time metrology, Data modeling, Semiconducting wafers, Optical lithography, Performance modeling, Photomasks

Proceedings Article | 8 March 2016 Paper
Jiarui Hu, Y. L. Chen, K. H. Chen, Brian Lee, Frankie Tsai, C. M. Ke, C. H. Liao, Desmond Ngo, Benny Gosali, Robin Tijssen, Vincent Huang, Ward Tu, Marc Noot, Maryana Escalante Marun, Christian Leewis, Carlo Luijten, Frank Staals, Martijn Van Veen, Francois Furthner, Stuart Young, Kaustuve Bhattacharyya
Proceedings Volume 9778, 977829 (2016) https://doi.org/10.1117/12.2220373
KEYWORDS: Metrology, Calibration, Scanners, Process control, Interfaces, Optical lithography, Semiconducting wafers, Photoresist materials, Finite element methods, Inspection, Data modeling, Diffraction

Proceedings Article | 4 September 2015 Paper
Proceedings Volume 9661, 96610R (2015) https://doi.org/10.1117/12.2194079
KEYWORDS: Scanners, Semiconducting wafers, Polonium, Logic, Sensors, Printing, Photomasks, Electroluminescent displays, Product engineering, Optical lithography

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9424, 94241C (2015) https://doi.org/10.1117/12.2085283
KEYWORDS: Semiconducting wafers, Scanners, Sensors, Data modeling, Finite element methods, Silicon, Wafer-level optics, Convolution, Photomasks, Chemical mechanical planarization

Showing 5 of 7 publications
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