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Fritjof Hempel
Product Quality Engineer at Olympus Winter & Ibe GmbH
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Author
Publications (2)
Proceedings Article | 24 March 2009 Paper
Scanner matching optimization
Michiel Kupers, Patrick Klingbeil, Joerg Tschischgale, Stefan Buhl, Fritjof Hempel
Proceedings Volume 7272, 72723B (2009) https://doi.org/10.1117/12.813668
KEYWORDS: Scanners, Semiconducting wafers, Overlay metrology, Error analysis, Manufacturing, Switches, Metrology, Feedback loops, Nonlinear control, Extreme ultraviolet lithography
Proceedings Article | 4 April 2007 Paper
Meeting overlay requirements for future technology nodes with in-die overlay metrology
Proceedings Volume 6518, 65180E (2007) https://doi.org/10.1117/12.708471
KEYWORDS: Overlay metrology, Reticles, Semiconducting wafers, Image registration, Photomasks, Data modeling, Pellicles, Scanners, Error analysis, Metrology
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