Mr. Gaby Bélot Profile

Gaby Bélot

at STMicroelectronics (Grenoble 2) SAS

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Publications (5)

Proceedings Article | 18 September 2024 Paper

Training dataset optimization for deep learning freeform grayscale photolithography mask design

Merlin Moreau, Jean-Baptiste Henry, Gaby Bélot, Stéphane Bonnet

Proceedings Volume 13273, 1327305 (2024) https://doi.org/10.1117/12.3026880

KEYWORDS: Inverse problems, Convolutional neural networks, Grayscale lithography, Optical lithography, 3D modeling, Data modeling, Deep learning, Neural networks, Design

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Proceedings Article | 18 September 2024 Paper

3D structures sidewalls tuning using smart grayscale photolithography mask strategies

Gaby Bélot, Aurélien Fay, Élodie Sungauer, Merlin Moreau, Sébastien Bérard-Bergery, Cécile Gourgon

Proceedings Volume 13273, 132730A (2024) https://doi.org/10.1117/12.3028461

KEYWORDS: Optical lithography, Chromium, Tunable filters, 3D mask effects, Simulations, Photomasks, Multispectral imaging, Image filtering, Fabry Perot interferometers, Optical filters

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Proceedings Article | 26 August 2024 Paper

Rethinking mask strategies for high vertical resolution grayscale lithography

Gaby Bélot, Aurélien Fay, Elodie Sungauer, Ujwol Palanchoke, Sébastien Bérard-Bergery, Cécile Gourgon

Proceedings Volume 13177, 131770D (2024) https://doi.org/10.1117/12.3032088

KEYWORDS: Design, 3D mask effects, Chromium, Data modeling, Photoresist materials, Tunable filters, Optical lithography, Electron beam lithography, Modulation, Grayscale lithography

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Proceedings Article | 10 April 2024 Poster

Impact of process parameters on grayscale MEEF

Ujwol Palanchoke, Florian Tomaso, Yorrick Exbrayat, Gaby Bélot, Marie-Line Pourteau, Ivanie Mendes, Juline Saugnier, Aurélien Fay, Sébastien Bérard-Bergery, Elodie Sungauer, Charlotte Beylier, Rémi Coquand, Arthur Bernadac

Proceedings Volume PC12956, PC129560Y (2024) https://doi.org/10.1117/12.3010850

KEYWORDS: 3D mask effects, Grayscale lithography, 3D modeling, Data modeling, 3D microstructuring, 3D acquisition, Semiconductors, Profilometers, Process control, Photoresist processing

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Proceedings Article | 1 May 2023 Presentation + Paper

Mask errors impact on grayscale lithography patterning

Ujwol Palanchoke, Gaby Bélot, Sébastien Bérard-Bergery, Juline Saugnier, Elodie Sungauer, Charlotte Beylier, Florian Tomaso, Marie-Line Pourteau, Ivanie Mendes, Rémi Coquand, Arthur Bernadac

Proceedings Volume 12497, 124970N (2023) https://doi.org/10.1117/12.2657600

KEYWORDS: Critical dimension metrology, 3D mask effects, Microlens, Design and modelling, Cadmium, Scanning electron microscopy, Semiconducting wafers, Error analysis, 3D acquisition, Grayscale lithography

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