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Gerhard Gross
Chief Executive Officer at IMS Nanofabrication GmbH
SPIE Involvement:
Author
Publications (6)
Proceedings Article | 17 October 2008 Paper
Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET)
Elmar Platzgummer, Hans Loeschner, Gerhard Gross
Proceedings Volume 7122, 71220L (2008) https://doi.org/10.1117/12.801441
KEYWORDS: Ions, Photomasks, Ion beams, Hydrogen, Nanotechnology, Line edge roughness, Electrodes, Silicon, Particles, Resolution enhancement technologies
Proceedings Article | 28 March 2008 Paper
MAGIC: a European program to push the insertion of maskless lithography
L. Pain, B. Icard, S. Tedesco, B. Kampherbeek, G. Gross, C. Klein, H. Loeschner, E. Platzgummer, R. Morgan, S. Manakli, J. Kretz, C. Holhe, K.-H. Choi, F. Thrum, E. Kassel, W. Pilz, K. Keil, J. Butschke, M. Irmscher, F. Letzkus, P. Hudek, A. Paraskevopoulos, P. Ramm, J. Weber
Proceedings Volume 6921, 69211S (2008) https://doi.org/10.1117/12.772472
KEYWORDS: Semiconducting wafers, Lithography, Photomasks, Manufacturing, Electron beams, Electron beam lithography, Nanofabrication, Computed tomography, Prototyping, Maskless lithography
Proceedings Article | 20 March 2008 Paper
Projection maskless lithography (PML2): proof-of-concept setup and first experimental results
C. Klein, E. Platzgummer, H. Loeschner, G. Gross, P. Dolezel, M. Tmej, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz
Proceedings Volume 6921, 69211O (2008) https://doi.org/10.1117/12.772726
KEYWORDS: Semiconducting wafers, Lithography, Electron beams, Silicon, Electrodes, Polymethylmethacrylate, Maskless lithography, Electron beam lithography, Wafer-level optics, Nanofabrication
Proceedings Article | 30 October 2007 Paper
Projection maskless patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates
Elmar Platzgummer, Hans Loeschner, Gerhard Gross
Proceedings Volume 6730, 673033 (2007) https://doi.org/10.1117/12.746363
KEYWORDS: Ions, Optical lithography, Argon, Ion beams, Sputter deposition, Silicon, Chromium, Electron beam lithography, Gallium arsenide, Particles
SPIE Journal Paper | 1 January 2003
Large-field particle beam optics for projection and proximity printing and for maskless lithography
Hans Loeschner, Gerhard Stengl, Herbert Buschbeck, A. Chalupka, Gertraud Lammer, Elmar Platzgummer, Herbert Vonach, Patrick de Jager, Rainer Kaesmaier, Albrecht Ehrmann, Stefan Hirscher, Andreas Wolter, Andreas Dietzel, Ruediger Berger, Hubert Grimm, Bruce Terris, Wilhelm Bruenger, Gerhard Gross, Olaf Fortagne, Dieter Adam, Michael Boehm, Hans Eichhorn, Reinhard Springer, Joerg Butschke, Florian Letzkus, Paul Ruchhoeft, John Wolfe
JM3, Vol. 2, Issue 01, (January 2003) https://doi.org/10.1117/12.10.1117/1.1528946
KEYWORDS: Ions, Ion beams, Photomasks, Particle beams, Photodynamic therapy, Maskless lithography, Magnetism, Lithography, Semiconducting wafers, Charged particle optics
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Conference Committee Involvement (2)
Photomask Technology
9 September 2003 | Monterey, California, United States
Photomask Technology
1 October 2002 | Monterey, CA, United States
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