Mr. Guojing Zhang Profile

Guojing Zhang

Leader of EUV Mask Pilot and Module Processes at Intel Corp

SPIE Involvement:

Author

Publications (43)

SPIE Journal Paper | 20 August 2024

Zone plate-based extreme ultraviolet mask microscope with through-pellicle imaging capability

Markus Benk, Dmytro Zaytsev, Chris Orman, Brandon Vollmer, Daniel Santos, Jeffrey Gamsby, Jeremy Mentz, Farhad Salmassi, Arnaud Allezy, Senajith Rekawa, Ryan Miyakawa, Weilun Chao, Eric Gullikson, Scott Chegwidden, Guojing Zhang, Patrick Naulleau, Bruno La Fontaine

JM3, Vol. 23, Issue 04, 041404, (August 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041404

KEYWORDS: Microscopes, Extreme ultraviolet, Pellicles, Photomasks, Mirrors, Zone plates, Modulation, Imaging systems, Nanoimprint lithography, Microelectromechanical systems

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Proceedings Article | 23 March 2020 Paper

Paper

EUV mask infrastructure and actinic pattern mask inspection

Ted Liang, Yoshihiro Tezuka, Marieke Jager, Kishore Chakravorty, Safak Sayan, Eric Frendberg, Srinath Satyanarayana, Firoz Ghadiali, Guojing Zhang, Frank Abboud

Proceedings Volume 11323, 1132310 (2020) https://doi.org/10.1117/12.2554496

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Defect detection, Optical inspection, Semiconducting wafers, Deep ultraviolet, EUV optics

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Proceedings Article | 18 March 2016 Open Access

Open Access

Paper

EUV progress toward HVM readiness

Britt Turkot, Steven Carson, Anna Lio, Ted Liang, Mark Phillips, Brian McCool, Eric Stenehjem, Tim Crimmins, Guojing Zhang, Sam Sivakumar

Proceedings Volume 9776, 977602 (2016) https://doi.org/10.1117/12.2225014

KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement

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Proceedings Article | 11 November 2015 Paper

Paper

EUV mask infrastructure readiness and gaps for TD and HVM

Ted Liang, John Magana, Kishore Chakravorty, Eric Panning, Guojing Zhang

Proceedings Volume 9635, 963509 (2015) https://doi.org/10.1117/12.2202724

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Particles, Scanners, Semiconducting wafers, Deep ultraviolet, Defect inspection

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Proceedings Article | 16 March 2015 Paper

Paper

Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement

Pei-Yang Yan, Guojing Zhang, Eric Gullikson, Ken Goldberg, Markus Benk

Proceedings Volume 9422, 94220J (2015) https://doi.org/10.1117/12.2087041

KEYWORDS: Surface roughness, Line width roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Atomic force microscopy, Chromium, Semiconducting wafers, Image quality, Reflectivity

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Proceedings Article | 9 September 2013 Paper

Paper

Measurement of EUV absorber and resist CD using spectroscopic ellipsometer

Kyung Lee, Malahat Tavassoli, Pei-yang Yan, Guojing Zhang

Proceedings Volume 8880, 88800Q (2013) https://doi.org/10.1117/12.2027231

KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Scanning electron microscopy, Scatterometry, Photomasks, Lithography, Spectroscopy, Metrology, Cadmium, Line edge roughness

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Proceedings Article | 23 March 2012 Paper

Paper

EUVL multilayer mask blank defect mitigation for defect-free EUVL mask fabrication

Pei-Yang Yan, Yan Liu, Marilyn Kamna, Guojing Zhang, Robert Chen, Fabian Martinez

Proceedings Volume 8322, 83220Z (2012) https://doi.org/10.1117/12.927018

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Scanning electron microscopy, Defect inspection, Electron beam lithography, Precision measurement, Silica, Optical alignment, Inspection, Atomic force microscopy

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Proceedings Article | 14 October 2011 Paper

Paper

Phase-shifting effect of thin-absorber EUV masks

Hiroyoshi Tanabe, Tetsunori Murachi, Sang H. Lee, Manish Chandhok, Seh-Jin Park, Guojing Zhang, Tsukasa Abe, Taichi Ogase, Naoya Hayashi

Proceedings Volume 8166, 816618 (2011) https://doi.org/10.1117/12.895149

KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Reflectivity, Phase shifting, Semiconducting wafers, Refractive index, Lithography, Binary data, Extreme ultraviolet lithography

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SPIE Journal Paper | 1 July 2011

Extreme ultraviolet-embedded phase-shift mask

Pei-yang Yan, Michael Leeson, Sang Lee, Guojing Zhang, Eric Gullikson, Farhad Salmassi

JM3, Vol. 10, Issue 03, 033011, (July 2011) https://doi.org/10.1117/12.10.1117/1.3616060

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Reflectivity, Tin, Binary data, Etching, Semiconducting wafers, Reflection, Signal attenuation

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Proceedings Article | 8 April 2011 Paper

Paper

EUVL dark-field exposure impact on CDs using thick and thin absorber masks

Sang Lee, Todd Younkin, Michael Leeson, Manish Chandhok, Guojing Zhang, John Magana, Hiroyoshi Tanabe, Steve Carson

Proceedings Volume 7969, 79691R (2011) https://doi.org/10.1117/12.879428

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Cadmium sulfide, Extreme ultraviolet, Line width roughness, Lithography, Reflection, Electroluminescence, Phase shifting, Semiconducting wafers

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Proceedings Article | 5 April 2011 Paper

Paper

EUVL alternating phase shift mask

Pei-Yang Yan, Alan Myers, Yashesh Shroff, Manish Chandhok, Guojing Zhang, Eric Gullikson, Farhad Salmassi

Proceedings Volume 7969, 79690G (2011) https://doi.org/10.1117/12.884790

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Binary data, Etching, Semiconducting wafers, Line width roughness, Phase shifts, Optical lithography, Printing, Image resolution

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Proceedings Article | 11 May 2009 Paper

Paper

Improvement of EUVL mask blank inspection capability at Intel

Andy Ma, Ted Liang, Seh-Jin Park, Guojing Zhang, Tomoya Tamura, Kazunori Omata, Yuta Sato, Hal Kusunose

Proceedings Volume 7379, 73790I (2009) https://doi.org/10.1117/12.824259

KEYWORDS: Inspection, Quartz, Silica, Photomasks, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection, Surface roughness, Defect inspection

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Proceedings Article | 18 March 2009 Paper

Paper

Demonstration of full-field patterning of 32 nm test chips using EUVL

Gilroy Vandentop, Manish Chandhok, Ernisse Putna, Todd Younkin, James Clarke, Steven Carson, Alan Myers, Michael Leeson, Guojing Zhang, Ted Liang, Tetsunori Murachi

Proceedings Volume 7271, 727116 (2009) https://doi.org/10.1117/12.814436

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

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Proceedings Article | 18 March 2009 Paper

Paper

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Manish Chandhok, Sanjay Goyal, Steven Carson, Seh-Jin Park, Guojing Zhang, Alan Myers, Michael Leeson, Marilyn Kamna, Fabian Martinez, Alan Stivers, Gian Lorusso, Jan Hermans, Eric Hendrickx, Sanjay Govindjee, Gerd Brandstetter, Tod Laursen

Proceedings Volume 7271, 72710G (2009) https://doi.org/10.1117/12.814428

KEYWORDS: Extreme ultraviolet, Photomasks, Finite element methods, Reticles, Error analysis, Thin films, Photovoltaics, Data modeling, Distortion, Image registration

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Proceedings Article | 17 October 2008 Paper

Paper

Pattern placement correction due to bending in EUVL masks

Seh-Jin Park, Chandhok Manish, Marilyn Kamna, Chuan Hu, Guojing Zhang, Fabian Martinez, Nathan Wilcox, Kamgmin Hsia, Alan Stivers

Proceedings Volume 7122, 71222C (2008) https://doi.org/10.1117/12.801542

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Metrology, Thin films, Personal protective equipment, Distortion, Image registration, Thin film deposition, Extreme ultraviolet, Reticles

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Proceedings Article | 29 May 2007 Paper

Paper

Progress on EUV mask fabrication for 32-nm technology node and beyond

Guojing Zhang, Pei-Yang Yan, Ted Liang, Seh-jin Park, Peter Sanchez, Emily Shu, Erdem Ultanir, Sven Henrichs, Alan Stivers, Gilroy Vandentop, Barry Lieberman, Ping Qu

Proceedings Volume 6607, 66070R (2007) https://doi.org/10.1117/12.728941

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Inspection, Extreme ultraviolet, Multilayers, Reflectivity, Etching, Mask making, Metrology, Defect inspection

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Proceedings Article | 20 May 2006 Paper

Paper

EUV mask pattern defect printability

Ted Liang, Guojing Zhang, Patrick Naulleau, Alan Myers, Seh-Jin Park, Alan Stivers, Gilroy Vandentop

Proceedings Volume 6283, 62830K (2006) https://doi.org/10.1117/12.681844

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Cadmium, Photomicroscopy, Semiconducting wafers, Optical lithography

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Proceedings Article | 20 May 2006 Paper

Paper

TaN-based EUV mask absorber etch study

Yan Du, Chang Ju Choi, Guojing Zhang, Seh-Jin Park, Pei-Yang Yan, Ki-Ho Baik

Proceedings Volume 6283, 62833D (2006) https://doi.org/10.1117/12.681832

KEYWORDS: Etching, Chemistry, Photomasks, Ruthenium, Extreme ultraviolet, Reactive ion etching, Critical dimension metrology, Chlorine, Diffractive optical elements, Extreme ultraviolet lithography

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Proceedings Article | 20 May 2006 Paper

Paper

EUV mask process development and integration

Guojing Zhang, Pei-Yang Yan, Ted Liang, Yan Du, Peter Sanchez, Seh-jin Park, Eric Lanzendorf, Chang Ju Choi, Emily Shu, Alan Stivers, Jeff Farnsworth, Kangmin Hsia, Manish Chandhok, Michael Leeson, Gilroy Vandentop

Proceedings Volume 6283, 62830G (2006) https://doi.org/10.1117/12.681839

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Reflectivity, Defect inspection, Extreme ultraviolet lithography, Inspection, Ruthenium, Image processing, Optical lithography

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Proceedings Article | 10 May 2005 Paper

Paper

Understanding and reduction of defects on finished EUV masks

Ted Liang, Peter Sanchez, Guojing Zhang, Emily Shu, Rajesh Nagpal, Alan Stivers

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.604717

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Deep ultraviolet, Scanning electron microscopy, Atomic force microscopy, Contamination, Defect inspection, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 6 May 2005 Paper

Paper

One small step: world's first integrated EUVL process line

Jeanette Roberts, Terence Bacuita, Robert Bristol, Heidi Cao, Manish Chandhok, Sang Lee, Eric Panning, Melissa Shell, Guojing Zhang, Bryan Rice

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600259

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Reflectivity, Reticles, Mirrors, Light sources, Plasma, Mask making

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Proceedings Article | 6 December 2004 Paper

Paper

EUV mask pilot line at Intel Corporation

Alan Stivers, Pei-Yang Yan, Guojing Zhang, Ted Liang, Emily Shu, Edita Tejnil, Barry Lieberman, Rajesh Nagpal, Kangmin Hsia, Michael Penn, Fu-Chang Lo

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569176

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Reflectivity, Metrology, Lithography, Optical lithography, Standards development, Mask making

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Proceedings Article | 6 December 2004 Paper

Paper

EUVL mask patterning with blanks from commercial suppliers

Pei-Yang Yan, Guojing Zhang, Rajesh Nagpal, Emily Shu, Chaoyang Li, Ping Qu, Frederick Chen

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569329

KEYWORDS: Extreme ultraviolet lithography, Reflectivity, Photomasks, Optical lithography, Ruthenium, Etching, Inspection, Chromium, Coating, Scanning electron microscopy

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Proceedings Article | 20 August 2004 Paper

Paper

Ru-capped EUVL ML mask blank performance

Pei-Yang Yan, Guojing Zhang, Eberhard Spiller, Paul Mirkarimi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557816

KEYWORDS: Ruthenium, Reflectivity, Photomasks, Etching, Extreme ultraviolet lithography, Silicon, Optical lithography, Surface roughness, Oxides, Oxidation

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Proceedings Article | 20 May 2004 Paper

Paper

Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems

Manish Chandhok, Sang Lee, Christof Krautschik, Guojing Zhang, Bryan Rice, Michael Goldstein, Eric Panning, Robert Bristol, Alan Stivers, Melissa Shell

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535995

KEYWORDS: Point spread functions, Modulation transfer functions, Mirrors, Extreme ultraviolet lithography, Critical dimension metrology, Spatial frequencies, Extreme ultraviolet, Optical proximity correction, Fourier transforms, Deep ultraviolet

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Proceedings Article | 17 December 2003 Paper

Paper

EUVL mask with Ru ML capping

Pei-Yang Yan, Guojing Zhang, Scott Chegwidden, Eberhard Spiller, Paul Mirkarimi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.520024

KEYWORDS: Ruthenium, Etching, Reflectivity, Silicon, Photomasks, Extreme ultraviolet lithography, Optical lithography, Oxides, Extreme ultraviolet, Electron beam lithography

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Proceedings Article | 16 June 2003 Paper

Paper

Implementing flare compensation for EUV masks through localized mask CD resizing

Christof Krautschik, Manish Chandhok, Guojing Zhang, Sang Hun Lee, Michael Goldstein, Eric Panning, Bryan Rice, Robert Bristol, Vivek Singh

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482344

KEYWORDS: Photomasks, Critical dimension metrology, Point spread functions, Chromium, Cadmium, Optical proximity correction, Extreme ultraviolet, Extreme ultraviolet lithography, Convolution, Mirrors

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Proceedings Article | 16 June 2003 Paper

Paper

Static EUV micro-exposures using the ETS Set-2 optics

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, Jeffrey Bokor, Bruce Harteneck, Keith Jackson, Deirdre Olynick, Farhad Salmassi, Sherry Baker, Paul Mirkarimi, Eberhard Spiller, Christopher Walton, Donna O'Connell, Pei-Yang Yan, Guojing Zhang

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490129

KEYWORDS: Lithography, Extreme ultraviolet, Printing, Photomasks, EUV optics, Wafer-level optics, Semiconducting wafers, Extreme ultraviolet lithography, Mirrors, Fiber optic illuminators

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Proceedings Article | 27 December 2002 Paper

Paper

Cr and TaN absorber mask etch CD performance study for extreme-ultraviolet lithography

Guojing Zhang, Pei-yang Yan

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468213

KEYWORDS: Etching, Chromium, Extreme ultraviolet lithography, Photomasks, Critical dimension metrology, Semiconducting wafers, Silicon, Extreme ultraviolet, Plasma etching, Scanning electron microscopy

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Proceedings Article | 1 July 2002 Paper

Paper

Lithographic evaluation of the EUV engineering test stand

Sang Hun Lee, Daniel Tichenor, William Ballard, Luis Bernardez, John Goldsmith, Steven Haney, Karen Jefferson, Terry Johnson, Alvin Leung, Donna O'Connell, William Replogle, John Wronosky, Kenneth Blaedel, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Henry Chapman, Stefan Wurm, Eric Panning, Pei-yang Yan, Guojing Zhang, John Bjorkholm, Glenn Kubiak, Donald Sweeney, David Attwood, Charles Gwyn

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472300

KEYWORDS: Extreme ultraviolet, Lithography, Projection systems, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Reticles, Printing, Point spread functions, Image resolution

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Proceedings Article | 1 July 2002 Paper

Paper

Static microfield printing at the advanced light source with the ETS Set-2 optic

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, David Attwood, Phillip Batson, Jeffrey Bokor, Paul Denham, Eric Gullikson, Bruce Harteneck, Brian Hoef, Keith Jackson, Deirdre Olynick, Senajith Rekawa, Farhad Salmassi, Kenneth Blaedel, Henry Chapman, Layton Hale, Regina Soufli, Eberhard Spiller, Donald Sweeney, John Taylor, Christopher Walton, Avijit Ray-Chaudhuri, Donna O'Connell, Richard Stulen, Daniel Tichenor, Charles Gwyn, Pei-yang Yan, Guojing Zhang

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472318

KEYWORDS: Printing, Extreme ultraviolet, Lithography, Fiber optic illuminators, Interferometry, Mirrors, Reticles, Modulation transfer functions, Wavefronts, Critical dimension metrology

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Proceedings Article | 11 March 2002 Paper

Paper

Enhanced optical inspectability of patterned EUVL mask

Ted Liang, Alan Stivers, Pei-yang Yan, Edita Tejnil, Guojing Zhang

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458303

KEYWORDS: Inspection, Reflectivity, Extreme ultraviolet lithography, Photomasks, Deep ultraviolet, Chromium, Image transmission, Optical inspection, Image enhancement, Ruthenium

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Proceedings Article | 20 August 2001 Paper

Paper

TaN EUVL mask fabrication and characterization

Pei-yang Yan, Guojing Zhang, Andy Ma, Ted Liang

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436668

KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Metals, Reflectivity, Extreme ultraviolet lithography, Optical lithography, Chromium, Tin, Oxides

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Proceedings Article | 22 January 2001 Paper

Paper

Cr absorber mask for extreme-ultraviolet lithography

Guojing Zhang, Pei-yang Yan, Ted Liang

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410675

KEYWORDS: Chromium, Photomasks, Etching, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers, Inspection, Silicon, Semiconducting wafers

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Proceedings Article | 21 July 2000 Paper

Paper

EUVL printing results of a low-thermal expansion material (LTEM) mask

William Tong, John Taylor, Scott Hector, Melissa Shell, Guojing Zhang, Patrick Kearney, Christopher Walton, Cindy Larson, James Wasson, Pawitter Mangat, Donna O'Connell, Daniel Folk

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390038

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Silicon, Manufacturing, Printing, Distortion, Lithography, Extreme ultraviolet, Reflectivity

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Proceedings Article | 19 July 2000 Paper

Paper

EUV mask absorber characterization and selection

Pei-yang Yan, Guojing Zhang, Patrick Kofron, Jeffrey Powers, Mark Tran, Ted Liang, Alan Stivers, Fu-Chang Lo

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392025

KEYWORDS: Etching, Metals, Photomasks, Oxides, Inspection, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Tantalum, Chromium

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Proceedings Article | 30 December 1999 Paper

Paper

Experimental study of mask line edge roughness transfer in DUV and EUV lithography patterning process

Pei-yang Yan, Guojing Zhang

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373302

KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Semiconducting wafers, Wafer-level optics, Deep ultraviolet, Extreme ultraviolet lithography, EUV optics, Critical dimension metrology, Lithography

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Proceedings Article | 30 December 1999 Paper

Paper

Comparison of at-wavelenth inspection, printability, and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography (EUVL)

Gregory Cardinale, John Goldsmith, Avijit Ray-Chaudhuri, Aaron Fisher, Scott Hector, Pawitter Mangat, Zorian Masnyj, David Mancini, Bill Wilkinson, Jeffrey Bokor, Seongtae Jeong, Scott Burkhart, Charles Cerjan, Christopher Walton, Cindy Larson, Pei-yang Yan, Guojing Zhang

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373339

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Inspection, Chromium, Scanning electron microscopy, Reticles, Silicon films, Printing

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Proceedings Article | 25 June 1999 Paper

Paper

EUV mask patterning approaches

Pei-yang Yan, Guojing Zhang, Patrick Kofron, Jenn Chow, Alan Stivers, Edita Tejnil, Gregory Cardinale, Patrick Kearney

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351102

KEYWORDS: Photomasks, Extreme ultraviolet, Silicon, Metals, Extreme ultraviolet lithography, Optical lithography, Mask making, Reflectivity, Etching, Opacity

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Proceedings Article | 18 December 1998 Paper

Paper

EUV mask absorber defect repair with focused ion beam

Pei-yang Yan, Souping Yan, Guojing Zhang, Patrick Kearney, John Richards, Patrick Kofron, Jenn Chow

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332828

KEYWORDS: Oxides, Gallium, Extreme ultraviolet, Opacity, Metals, Etching, Photomasks, Reflectivity, Contamination, Ion beams

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Proceedings Article | 29 June 1998 Paper

Paper

Progress in 193-nm top-surface imaging process development

John Hutchinson, Veena Rao, Guojing Zhang, Adam Pawloski, Carlos Fonseca, Janet Chambers, Susan Holl, Siddhartha Das, Craig Henderson, David Wheeler

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312405

KEYWORDS: Line edge roughness, Etching, Photoresist processing, Chemically amplified resists, Chemistry, Plasma etching, Silicon, Image processing, Plasma, Optical lithography

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Proceedings Article | 5 June 1998 Paper

Paper

EUV mask absorber defect size requirement at 100-nm design rules

Pei-yang Yan, Guojing Zhang, Jenn Chow, Patrick Kofron, Joseph Langston, Harun Solak, Patrick Kearney, Gregory Cardinale, Kurt Berger, Craig Henderson

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309627

KEYWORDS: Photomasks, Critical dimension metrology, Opacity, Semiconducting wafers, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Scanning electron microscopy, Metals

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Proceedings Article | 16 May 1994 Paper

Paper

Liquid phase silylation process for 248 nm lithography using EL IR photoresist

Guojing Zhang, Bruce Smith, Lynn Fuller

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175365

KEYWORDS: Liquids, Electroluminescence, Photoresist materials, Etching, Photoresist processing, Lithography, Silicon, Deep ultraviolet, Semiconducting wafers, Plasma

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Showing 5 of 43 publications

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