Ion beam sputtering enables high laser damage threshold mirrors to be manufactured. Oxygen partial pressure was found
to have significant influence on the microstructure and optical properties of HfO2 thin films deposited by ion beam
sputtering (IBS). Atomic force microscopy studies have shown that the surface of single HfO2 films is clearly
characterized by deep holes. When oxygen is excessive, the RMS roughness of the surface increases with the presence of
the holes, and the transmittance of the single HfO2 layers reduces evidently in the shortwave spectral region. The
laser-induced damage threshold (LIDT) of HfO2/SiO2 multilayer stacks was investigated with a diode pump laser at 1064
nm under a certain repetition frequency. The laser-induced damage morphology of DPL thin films were observed by the
optical microscope. SiO2 overcoats increase the damage threshold and modify the damage morphology of IBS coatings.
The LIDT of the cavity mirrors is > 1 GW/cm2 at 1064 nm (80 ns, 10 KHz).
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