Dr. Igor A. Ivonin Profile

Dr. Igor A. Ivonin

VP of Engineering at Nano-Optic Devices

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Publications (10)

Proceedings Article | 28 March 2018 Paper

Overlay of multiframe SEM images including nonlinear field distortions

S. Babin, S. Borisov, I. Ivonin, S. Nakazawa, Y. Yamazaki

Proceedings Volume 10585, 105852B (2018) https://doi.org/10.1117/12.2299847

KEYWORDS: Scanning electron microscopy, Signal to noise ratio, Image quality, Imaging systems, Optical resolution, Semiconducting wafers, Interference (communication), Image display

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Proceedings Article | 19 March 2018 Presentation

Extraction of CDs and side wall angles from top down SEM images of double layered structures (Conference Presentation)

Sergey Babin, Leia Guo, Igor Ivonin, Yi Huang

Proceedings Volume 10585, 105850K (2018) https://doi.org/10.1117/12.2298389

KEYWORDS: Cadmium sulfide, Scanning electron microscopy, Etching, Transmission electron microscopy, Metrology, Semiconductor manufacturing, Critical dimension metrology, Image processing, Software development

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Proceedings Article | 19 March 2018 Presentation

High repeatability CD-SEM metrology of disk drive writer and extraction of SWA (Conference Presentation)

Narender Rana, Anhhuy Ngo, Chester Chien, Sergey Babin, Igor Ivonin

Proceedings Volume 10585, 1058516 (2018) https://doi.org/10.1117/12.2301328

KEYWORDS: Metrology, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Image processing software, Semiconductor manufacturing, 3D metrology, Process control, Transmission electron microscopy, Manufacturing

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In contrast to semiconductor manufacturing where features are mostly lines or contact holes, the disk drive reader has a complex, nonlinear 3D geometry. Metrology of such geometries is challenging; especially with regard to repeatability of measurements. New methods were needed to keep up with production requirements for metrology regarding uncertainty of critical dimensions (CD). We report a new method developed for CD metrology of the disk drive writer pole. The method demonstrated improved uncertainties compared to the regularly used CD-SEM algorithms and also has capability for side wall angle (SWA) metrology for process control. The method utilizes multiple steps: a) extract contours from SEM images, b) identify exact locations on a curvilinear feature where CD should be measured, and c) provide CD measurements at these locations. SEM images from a variety of production wafers were used for evaluation of the developed method. Multiple series of SEM images were processed using a software utilizing advanced algorithms without using regular brightness threshold CD-SEM methodologies. It was found that CD repeatability was improved by a factor of three compared to the results of the regular threshold based CD-SEM method. TEM imaging is used to measure side wall angle; it takes a lot of efforts for sample preparation and the feedback is slow. If extraction of SWA is possible from top down SEM images it would provide instant feedback to manufacturing and reduce cost. Monte Carlo simulations were used to understand the sensitivity of SWA to the trench CD and depth. Height of features was measured using AFM. A method to extract SWA from top down images was developed. Numerous SEM images were processed; results were compared to experiment and analyzed. It was shown that the 3-sigma repeatability of SWA measurement was 0.15 degree. It was also found that the left and the right SWA were different on multiple wafers, the results were very consistent from one image series to another one, at the same time the SWA difference between the left and right walls was considerably larger than the uncertainty of SWA measurement.

Proceedings Article | 21 February 2011 Paper

Suppression of lateral modes in wide aperture laser diodes by digital planar holograms

V. Svetikov, I. Ivonin, A. Koshelev, L. Velikov, Yu. Vorobiev, A. Goltsov, V. Yankov

Proceedings Volume 7918, 79180P (2011) https://doi.org/10.1117/12.876354

KEYWORDS: Holograms, Semiconductor lasers, Digital holography, Optical design, Binary data, Fiber lasers, Holography, Mirrors, Cladding, Semiconducting wafers

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Proceedings Article | 27 March 2007 Paper

Optimal solutions for the illuminator and final lens pupil coupled distributions beyond the axial symmetry

Igor Ivonin, Tor Sandstrom

Proceedings Volume 6520, 652038 (2007) https://doi.org/10.1117/12.712053

KEYWORDS: Fiber optic illuminators, Critical dimension metrology, Printing, Imaging systems, Diffraction, Optical filters, Resolution enhancement technologies, Promethium, Optical lithography, Photomasks

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Proceedings Article | 21 March 2006 Paper

SLM lithography: printing down to k₁=0.30 without previous OPC processing

Tor Sandstrom, Igor Ivonin

Proceedings Volume 6154, 61541Y (2006) https://doi.org/10.1117/12.657019

KEYWORDS: Photomasks, Optical proximity correction, Spatial light modulators, Mirrors, Raster graphics, Image processing, Printing, Fiber optic illuminators, Lithography, Modulators

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Proceedings Article | 20 March 2006 Paper

Pupil and illuminator optimization in partially coherent imaging systems

Igor Ivonin, Tor Sandstrom

Proceedings Volume 6154, 61543U (2006) https://doi.org/10.1117/12.656357

KEYWORDS: Fiber optic illuminators, Printing, Imaging systems, Critical dimension metrology, Polarization, Transparency, Optimization (mathematics), Coherence imaging, Promethium, Geometrical optics

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Proceedings Article | 12 May 2005 Paper

Pupil optimization of incoherent imaging systems for improved CD linearity

Igor Ivonin, Torbjorn Sandstrom

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599789

KEYWORDS: Critical dimension metrology, Apodization, Imaging systems, Geometrical optics, Optical lithography, Computing systems, Gaussian beams, Systems modeling, Polarization, Optical imaging

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Proceedings Article | 14 August 2003 Paper

Digital planar holography and multiplexer/demultiplexer with discrete dispersion

Vladimir Yankov, Sergey Babin, Igor Ivonin, Alexander Goltsov, Anatolii Morozov, Leonid Polonskiy, Michael Spector, Andrei Talapov, Ernst Kley, Holger Schmidt, Robert Dahlgren

Proceedings Volume 5246, (2003) https://doi.org/10.1117/12.511426

KEYWORDS: Holograms, Digital holography, Planar waveguides, Dispersion, Holography, Photonics, Photonic integrated circuits, Refractive index, Photonic crystals, Volume holography

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Proceedings Article | 17 June 2003 Paper

Photonic bandgap quasi-crystals for integrated WDM devices

Vladimir Yankov, Sergey Babin, Igor Ivonin, Alexander Goltsov, Anatolii Morozov, Leonid Polonskiy, Michael Spector, Andrei Talapov, Ernst-Bernhard Kley, Holger Schmidt, Robert Dahlgren

Proceedings Volume 4989, (2003) https://doi.org/10.1117/12.488214

KEYWORDS: Planar waveguides, Fiber Bragg gratings, Wavelength division multiplexing, Mirrors, Manufacturing, Infrared cameras, Superposition, Volume holography, Lithography, Binary data

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Showing 5 of 10 publications

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