Dr. Ina Mitra Profile

Dr. Ina Mitra

at SCHOTT AG

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Author

Publications (6)

Proceedings Article | 23 August 2024 Poster + Paper

ZERODUR glass-ceramic thermal and mechanical trades for the next generation of space telescopes

Janina Krieg, Ina Mitra, Ralf Jedamzik, Clemens Kunisch, Tony Hull, Thomas Westerhoff

Proceedings Volume 13092, 1309240 (2024) https://doi.org/10.1117/12.3018655

KEYWORDS: Zerodur, Glass ceramics, Temperature metrology, Thermal stability, Materials properties, Space telescopes, Mirrors, Telescopes, Design, Thermal modeling

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Proceedings Article | 2 June 2004 Paper

Production challenges of making an EUV mask blank

Lutz Aschke, Hans Becker, Falk Friemel, Thomas Leutbecher, Nathalie Olschewski, Markus Renno, Frauke Rueggeberg, Mario Schiffler, Frank Schmidt, Frank Sobel, Kurt Walter, Guenter Hess, Frank Lenzen, Konrad Knapp, Jochen Alkemper, Hrabanus Hack, Klaus Megges, Ina Mitra, Rolf Mueller, Uwe Nolte, Joerg Schumacher, Wolfgang Pannhorst

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568007

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Zerodur, Reflectivity, Polishing, Temperature metrology, Surface finishing, Glasses

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Proceedings Article | 20 May 2004 Paper

Optimized glass-ceramic substrate materials for EUVL applications

Ina Mitra, Jochen Alkemper, Rolf Mueller, Uwe Nolte, Axel Engel, Hrabanus Hack, Heiko Kohlmann, Volker Wittmer, Wolfgang Pannhorst, Mark Davis, Lutz Aschke, Konrad Knapp

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535193

KEYWORDS: Zerodur, Surface roughness, Temperature metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Glasses, Metrology, Surface finishing, Refractive index, Crystals

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EUV substrate materials have to meet enhanced requirements with respect to extreme low thermal expansion, high homogeneity and superior surface quality. A SCHOTT R&D program aims at the development of advanced materials covering these various aspects. The glass-ceramic Zerodur (registered trademark) of SCHOTT represents a substrate material currently used for EUV masks and optics of first generation tools due to its extremely low coefficient of thermal expansion (CTE) and its excellent homogeneity. Zerodur(registered trademark) even allows continuous shifting of the position of zero crossing of the CTE-slope to control the thermal expansion behavior according to varying customer requirements: As a result of specifically adjusted process parameters, samples of Zerodur (registered trademark) exhibit a coefficient of thermal expansion CTE < 5 ppb/K corresponding to the lowest expansion class of the SEMI standard P37 (19 to 25°C) for EUV mask blanks. By further variation of process parameters, the position of zero crossing, e.g. at 22.5°C or 30°C, can be varied, revealing an attractive attribute feature of Zerodur (registered trademark). A new dilatometer type reveals an improved reproducibility of ~ 1ppb/K in the temperature range of 0 to 50°C. A series of CTE(0;50°C) measurements with a test-cube of Zerodur (registered trademark) provides information on CTE homogeneity on a cm-scale: no CTE variation was observed within the error of measurements (1ppb/K) for a block exhibiting ± 3.5*10^-6 variation in refractive index. CTE variation can cause surface deformations during changing temperature conditions. A Fizeau-Interferometer was used to record surface roughness at two different temperatures. This non- destructive metrology is regarded as a method to distinguish CTE variation < 1ppb/K. The surface deformation of Zerodur (registered trademark) due to elevated temperature was determined to be lower than the resolution. Both methods to analyze the CTE homogeneity of Zerodur (registered trademark) lead to the result of CTE variation below 1 ppb/K. Surface treatment of glass-ceramic material is a major challenge as final finishing of EUV substrates may increase roughness of super-polished surfaces significantly. Improved new glass-ceramic materials demonstrate optimization of glass-ceramic compositions to nearly meeting the specification of surface roughness after a standard finishing process. Recent achievements of material development reveal CTE-performance of this new glass-ceramic to also be adjustable to varying customer needs as already known for Zerodur (registered trademark). These results are regarded as a promising milestone to develop an optimized glass-ceramic material, because the features of the modified New-Glass Ceramic now better match the key requirements of EUVL substrate materials.

Proceedings Article | 16 June 2003 Paper

Improved materials meeting the demands for EUV substrates

Ina Mitra, Jochen Alkemper, Uwe Nolte, Axel Engel, Rolf Mueller, Simone Ritter, Hrabanus Hack, Klaus Megges, Heiko Kohlmann, Wolfgang Pannhorst, Mark Davis, Lutz Aschke, Konrad Knapp

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484728

KEYWORDS: Zerodur, Surface roughness, Temperature metrology, Extreme ultraviolet, Metrology, Glasses, Standards development, Extreme ultraviolet lithography, Surface finishing, Crystals

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The enhanced demands for substrate materials for next-generation optics and masks have initiated detailed investigations on Zerodur as a proposed EUVL substrate material with focus on thermal expansion behavior and surface roughness. As a result of specifically adjusted process parameters, the coefficient of thermal expansion (CTE) was tailored to be a minimum at 22.5°C. Laboratory samples of Zerodur exhibit a CTE < 5 ppb/K corresponding to the lowest expasnion class of the SEMI standard P37 (19 to 25°C) for EUV mask blanks. By further variation of process parameters, the position of zero crossing, e.g. at 30°C, can be varied, revealing an attractive attribute feature of Zerodur. A new dilatometer type was mounted in 2002 with first operatinoal results revealing an improved reproducibility of ~1ppb/K in the temperature range of 0 to 50°C. A series of CTE measurements with a small block of Zerodur provides information on CTE homogeneity on a cm-scale: No CTE variation was observed within the error of measurements for a block exhibiting ± 3.5*10^-6 vairtion in refractinve index. CTE variation can cause surface deformations during changing temperature conditions. A first setup of Fizeau-Interferometer with a current resolution of 0.3 nm rms was used to record surface deformation of Zerodur due to elevated temperature was determined to be lower than the current resolution. Both methods to analyze the CTE homogeneity of Zerodur lead to the result of CTE variation below 1 ppb/K, still identifying today's need to improve metrology further. Final finishing of EUV substrates may increase roughness of super-polished surfaces significantly. Using appropriate processes a to surface roughness < 0.25 nm rms under production conditions can be achieved after final finishing of Zerodur. As an improved Zerodur-type material, recent achievements of material development demonstrate the optimization of glass-ceramic composition to nearly meeting the specification of surface roughness after a standard finishing process. These results are regarded as a promising milestone to develop an optimized glass-ceramic material providnig adjusted thermal expansion behavior and surface processability according to the specific demands of EUV technology.

Proceedings Article | 1 July 2002 Paper

Thermal expansion behavior of proposed EUVL substrate materials

Ina Mitra, Mark Davis, Jochen Alkemper, Rolf Mueller, Heiko Kohlmann, Lutz Aschke, Ewald Moersen, Simone Ritter, Hrabanus Hack, Wolfgang Pannhorst

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472322

KEYWORDS: Zerodur, Temperature metrology, Glasses, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Solids, Refractive index, Crystals, Photomasks

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Proceedings Article | 2 November 2001 Paper

Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur

Mark Davis, Alexander Marker, Lutz Aschke, Fredi Schubert, Ewald Moersen, Heiko Kohlmann, Ina Mitra, Jochen Alkemper, Rudolf Mueller, John Taylor, Kenneth Blaedel, Scott Hector

Proceedings Volume 4452, (2001) https://doi.org/10.1117/12.446884

KEYWORDS: Zerodur, Extreme ultraviolet lithography, Temperature metrology, Refractive index, Photomasks, Glasses, Polishing, Error analysis, Projection systems, Interferometers

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