This work systematically reports on the preparation of Nd3 + -doped silicate glass (NDSG) and its waveguide structure, as well as the optimization effects of annealing procedures on the waveguide performances. The NDSG was synthesized by the melt-quenching technique. Its absorption spectrum and photoluminescence properties were recorded by a JASCO V-570 spectrophotometer and an Edinburgh FLS920P fluorescence spectrometer, respectively. A planar optical waveguide was fabricated in the NDSG using 0.4-MeV proton implantation at a fluence of 8 × 1016 ions cm − 2. Its optical properties were optimized by 1-h stepwise annealing treatments with the temperature range of 260°C to 410°C. The distribution of the refractive index and the profile of near-field intensity were investigated by the prism-coupling equipment and the end-face coupling system, respectively. The obtained results show the prospects for using NDSG waveguides in planar photonic devices.
With the shrinking feature sizes of semiconductor devices, manufacturing challenges increase dramatically. Among these challenges, lithography hotspot stands out as a prominent ramification of the growing gap between design and manufacturing. Practically, a hotspot refers to the failure in printing desired patterns in lithography. As lithography hotspots have significant impacts on manufacturing yield, the detection of hotspots in the early design stage is desired to achieve fast design closure. We propose a lithography hotspot detection framework using a double inception module structure. This structure performs better in both accuracy and false alarms by widening the conventional stacked structure to benefit feature extraction and using global average pooling to keep the spatial information. Experimental results show that the proposed structure achieves better performance than existing methods.
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