Mr. Jim McCracken Profile

Jim McCracken

Owner at CenterLink

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 17 December 2003 Paper

Taking advantage of vendor automation with SEMI P10

Mike Behnam, Jim McCracken

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518222

KEYWORDS: Photomasks, Reticles, Human-machine interfaces, Inspection, Standards development, Manufacturing, Software development, Defect inspection, Pellicles, Data modeling

Read Abstract +

Although the first version of the SEMI P10 “Specification of Data Structures for Photomask Orders” was introduced over ten years ago and is supported by all of the major photomask vendors, only a few chip suppliers currently take advantage of this automated order entry infrastructure. This is unfortunate because placing a photomask order by transmitting a P10 file reduces errors and improves throughput time. The hierarchical structure and comprehensive support for fracturing software, writing tools, defect inspection systems, and metrology equipment, allow tapeout groups to define very complex photomask orders in a P10 file. Mix and match reticle sets utilizing multiple steppers, multi-layer reticles, process development reticles with dozens of pattern files per layer, and phase shift reticles can all be defined in a P10 file. However, the extensive capabilities and the scalability of SEMI P10 come at a price. The specification is complicated -- the latest release is over 40 pages in length and defines over 500 record types. Before a software system that automates P10 file writing can be successfully implemented, the P10 spec must be studied from a number of perspectives. These include the user interface requirements, present and future photomask needs, vendor preferences for P10 file structure and content, and process file management. This paper will present a brief overview of the P10 structure and capabilities, describe how Agilent Technologies, Photomask Technology Center (PTC) made the decision to upgrade its reticle order management software with RetBuilder from CenterLink.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years