Jingjing Li
at GIICS
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12495, 124950C (2023) https://doi.org/10.1117/12.2658126
KEYWORDS: Double patterning technology, Optical lithography, Extreme ultraviolet, Logic, Critical dimension metrology, Source mask optimization, Overlay metrology, Design and modelling

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