Dr. John E. Goldsmith Profile

Dr. John E. Goldsmith

Manager of Nanolithography Dept at Sandia National Labs California

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 16 June 2003 Paper

Lithographic characterization of improved projection optics in the EUVL engineering test stand

Donna O'Connell, Sang Hun Lee, William Ballard, Daniel Tichenor, Louis Bernardez, Steven Haney, Terry Johnson, Pamela Barr, Alvin Leung, Karen Jefferson, William Replogle, John Goldsmith, Henry Chapman, Patrick Naulleau, Stefan Wurm, Eric Panning

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484967

KEYWORDS: Projection systems, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Line edge roughness, Reticles, Wavefronts

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Proceedings Article | 1 July 2002 Paper

Performance upgrades in the EUV engineering test stand

Daniel Tichenor, William Replogle, Sang Hun Lee, William Ballard, Alvin Leung, Glenn Kubiak, Leonard Klebanoff, Samual Graham, John Goldsmith, Karen Jefferson, John Wronosky, Tony Smith, Terry Johnson, Harry Shields, Layton Hale, Henry Chapman, John Taylor, Donald Sweeney, James Folta, Gary Sommargren, Kenneth Goldberg, Patrick Naulleau, David Attwood, Eric Gullikson

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472328

KEYWORDS: Semiconducting wafers, Sensors, Extreme ultraviolet, Reticles, Projection systems, Extreme ultraviolet lithography, Printing, Lithography, Fiber optic illuminators, Wavefronts

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Proceedings Article | 1 July 2002 Paper

Lithographic evaluation of the EUV engineering test stand

Sang Hun Lee, Daniel Tichenor, William Ballard, Luis Bernardez, John Goldsmith, Steven Haney, Karen Jefferson, Terry Johnson, Alvin Leung, Donna O'Connell, William Replogle, John Wronosky, Kenneth Blaedel, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Henry Chapman, Stefan Wurm, Eric Panning, Pei-yang Yan, Guojing Zhang, John Bjorkholm, Glenn Kubiak, Donald Sweeney, David Attwood, Charles Gwyn

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472300

KEYWORDS: Extreme ultraviolet, Lithography, Projection systems, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Reticles, Printing, Point spread functions, Image resolution

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Proceedings Article | 21 July 2000 Paper

Development of an electric capillary discharge source

Neal Fornaciari, Jim Chang, Daniel Folk, Steven Gianoulakis, John Goldsmith, Glenn Kubiak, Bruce Long, Donna O'Connell, Gregory Shimkaveg, William Silfvast, Kenneth Stewart

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390047

KEYWORDS: Capillaries, Extreme ultraviolet, Electrodes, Plasma, Fiber optic illuminators, Thermal modeling, Extreme ultraviolet lithography, Reflectivity, Semiconducting wafers, Lithography

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Proceedings Article | 30 December 1999 Paper

Comparison of at-wavelenth inspection, printability, and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography (EUVL)

Gregory Cardinale, John Goldsmith, Avijit Ray-Chaudhuri, Aaron Fisher, Scott Hector, Pawitter Mangat, Zorian Masnyj, David Mancini, Bill Wilkinson, Jeffrey Bokor, Seongtae Jeong, Scott Burkhart, Charles Cerjan, Christopher Walton, Cindy Larson, Pei-yang Yan, Guojing Zhang

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373339

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Inspection, Chromium, Scanning electron microscopy, Reticles, Silicon films, Printing

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Proceedings Article | 25 June 1999 Paper

Sub-100-nm lithographic imaging with an EUV 10X microstepper

John Goldsmith, Kurt Berger, Dan Bozman, Gregory Cardinale, Daniel Folk, Craig Henderson, Donna O'Connell, Avijit Ray-Chaudhuri, Kenneth Stewart, Daniel Tichenor, Henry Chapman, Richard Gaughan, Russell Hudyma, Claude Montcalm, Eberhard Spiller, John Taylor, Jeffrey Williams, Kenneth Goldberg, Eric Gullikson, Patrick Naulleau, Jonathan Cobb

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351097

KEYWORDS: Cameras, Extreme ultraviolet, Imaging systems, Lithography, Extreme ultraviolet lithography, Projection systems, Photoresist developing, Photomasks, Wavefronts, Photoresist materials

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Proceedings Article | 25 June 1999 Paper

EUV scattering and flare of 10X projection cameras

Eric Gullikson, Sherry Baker, John Bjorkholm, Jeffrey Bokor, Kenneth Goldberg, John Goldsmith, Claude Montcalm, Patrick Naulleau, Eberhard Spiller, Daniel Stearns, John Taylor, James Underwood

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351162

KEYWORDS: Scattering, Cameras, Mirrors, Extreme ultraviolet, Spatial frequencies, Point spread functions, Light scattering, Multilayers, Laser scattering, Coating

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Proceedings Article | 25 June 1999 Paper

Direct comparison of EUV and visible-light interferometries

Kenneth Goldberg, Patrick Naulleau, Sang Hun Lee, Chang-Hasnain Chang, Cynthia Bresloff, Richard Gaughan, Henry Chapman, John Goldsmith, Jeffrey Bokor

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351138

KEYWORDS: Extreme ultraviolet, Wavefronts, Cameras, Interferometry, Interferometers, Optical coatings, Monochromatic aberrations, Multilayers, Contamination, Lithography

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Proceedings Article | 5 June 1998 Paper

Recent advances in the Sandia EUV 10x microstepper

John Goldsmith, Pamela Barr, Kurt Berger, Luis Bernardez, Gregory Cardinale, Joel Darnold, Daniel Folk, Steven Haney, Craig Henderson, Karen Jefferson, Kevin Krenz, Glenn Kubiak, Rodney Nissen, Donna O'Connell, Yon Perras, Avijit Ray-Chaudhuri, Tony Smith, Richard Stulen, Daniel Tichenor, Alfred Ver Berkmoes, John Wronosky

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309570

KEYWORDS: Extreme ultraviolet, Cameras, Imaging systems, Projection systems, Semiconducting wafers, Wavefronts, Extreme ultraviolet lithography, Photomasks, Xenon, Interferometry

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Proceedings Article | 5 June 1998 Paper

Top-surface imaging resists for EUV lithography

Craig Henderson, David Wheeler, Tim Pollagi, Donna O'Connell, John Goldsmith, Aaron Fisher, Gregory Cardinale, John Hutchinson, Veena Rao

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309590

KEYWORDS: Extreme ultraviolet lithography, Etching, Digital micromirror devices, Line edge roughness, Photomasks, Photoresist processing, Silicon, Extreme ultraviolet, Photoresist materials, Image processing

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Showing 5 of 10 publications

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