Dr. John Sheil Profile

Dr. John Sheil

at Advanced Research Ctr for Nanolithography

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Author

Publications (3)

Proceedings Article | 28 April 2023 Poster + Paper

Kinetic simulations of plasma dynamics in the EUV sources

Kirill Lezhnin, Samuel Totorica, Abdullah Hyder, John Sheil, Oscar Versolato, Ahmed Diallo, William Fox

Proceedings Volume 12494, 1249418 (2023) https://doi.org/10.1117/12.2658454

KEYWORDS: Simulations, Plasma, Ions, Extreme ultraviolet, Laser radiation, Pulsed laser operation, Electrons, Tin, Extreme ultraviolet lithography, Solids

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Proceedings Article | 28 April 2023 Poster + Paper

Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography

Diko Hemminga, Lucas Poirier, Javier Hernandez-Rueda, Bo Liu, Adam Lassise, Ronnie Hoekstra, John Sheil, Oscar Versolato

Proceedings Volume 12494, 124941B (2023) https://doi.org/10.1117/12.2657496

KEYWORDS: Plasmas, Ions, Tin, Extreme ultraviolet, Simulations, Fluid dynamics, Nanolithography, Light absorption, Laser radiation, Deformation

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Proceedings Article | 11 November 2022 Presentation

Two-micrometer-wavelength laser-produced tin plasma EUV sources

Lars Behnke, Yahia Mostafa, Zoi Bouza, Adam Lassise, Lucas Poirier, John Sheil, Wim Ubachs, Oscar Versolato

Proceedings Volume PC12292, PC122920D (2022) https://doi.org/10.1117/12.2642234

KEYWORDS: Plasma, Extreme ultraviolet, Tin, Surface plasmons, Solid state lasers, Oscillators, Nanolithography, Mid-IR, Laser systems engineering, Cerium

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