Dr. Jost Goettert Profile

Dr. Jost Goettert

Director for Microfabrication at Louisiana State Univ

SPIE Involvement:

Author

Publications (23)

Proceedings Article | 16 April 2011 Paper

SUEX process optimization for ultra-thick high-aspect ratio LIGA imaging

Donald Johnson, Jost Goettert, Varshni Singh, Dawit Yemane

Proceedings Volume 7972, 79722U (2011) https://doi.org/10.1117/12.882872

KEYWORDS: Semiconducting wafers, X-rays, Silicon, Photoresist processing, Photomasks, Plating, Skin, Neodymium, X-ray lithography, Microelectromechanical systems

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The focus of this paper is on the use of SUEX Thick Dry Film Sheet (TDFS) laminates which DJ DevCorp is developing as a thick resist material in optical and X-ray lithography. Preliminary thick dry film sheets up to 1mm thickness were successfully prepared and patterned at the CAMD X-ray beamlines and presented at HARMST 2007. Recently, new results have been published using SUEX resist sheets in UV lithography showing great market potential including plating molds for metal microparts, polymer MEMS, multilayer microfluidics structures, BioMEMS, medical devices, wafer level packaging processes, and displays. The SUEX TDFS are available in a range of thicknesses from 100μm to 1mm or more and are pre-cut into a number of standard wafer sizes. This new material is a modified epoxy formulation containing an antimony-free photo acid generator (PAG) prepared under a highly controlled solvent-less process which provides uniform coatings between two throw-away layers of protective polyester film. As part of our initial studies resist layers of 250, 500 and 1000μm were laminated onto regular silicon wafers using a hot roll laminator at a speed of 1ft/min at 75°C. The entire substrate preparation takes about 1 hour and with practice users can prepare up to 10 substrates in this time which are typically ready to use within 2 hours. In our efforts to develop a commercially viable product we have conducted experiments using standard equipment available at CAMD (Quintel UV aligner and CAMD XRLM 1 and 4 beamline). Initial X-ray exposure tests were done with a bottom dose ranging between 100 and 400 J/cm³ and a top/bottom dose ratio of less than 3 for sheets up to 2mm in thickness. Exposure time for typical conditions of the CAMD storage ring (ring current ranging between 100 and 160mA, beam lifetime of about 10hrs at 100mA ring current) is about 10-15min for a 4' wafer. After exposure the samples were immediately post exposure baked between 70°C and 110°C using a convection oven, taken out and cooled to RT then relaxed up to 3 days before development to reduce stress. Development was done in PGMEA for up to 3 hours for the 1000μm thick samples followed by a short IPA rinse and drying in air. Very high aspect ratios of 100 or more have been routinely patterned with nearly perfectly straight sidewalls (~1-1.5μm deviation for a 1mm tall structure) and excellent image fidelity.

Proceedings Article | 23 January 2006 Paper

Polymeric waveguides for orthogonal near surface fluorescent excitation

Proyag Datta, Feng Xu, Sitanshu Gurung, Steven Soper, Jost Goettert

Proceedings Volume 6112, 611208 (2006) https://doi.org/10.1117/12.647014

KEYWORDS: Waveguides, Microfluidics, Polymers, Luminescence, Polymer multimode waveguides, Polymethylmethacrylate, Interfaces, Refractive index, Optical fibers, Cladding

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Proceedings Article | 23 January 2006 Paper

An injection micromixer fabricated by improved SU-8 processing for biochemical microfluidic systems

Changgeng Liu, Zhong-geng Ling, Kun Lian, Jost Goettert, Josef Hormes

Proceedings Volume 6112, 61120G (2006) https://doi.org/10.1117/12.646049

KEYWORDS: Microfluidics, Liquids, Coating, Polymethylmethacrylate, Manufacturing, Silicon, Photoresist materials, Resistance, Diffusion, Biosensors

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Proceedings Article | 22 January 2005 Paper

Fluorescence calibration research of microspheres in a microfluidic chip

Lin Wang, Kun Lian, Jost Goettert

Proceedings Volume 5718, (2005) https://doi.org/10.1117/12.591610

KEYWORDS: Luminescence, Calibration, Microfluidics, Microscopes, Fluorescence spectroscopy, Particles, Optical spheres, Magnetism, Glasses, Manufacturing

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Proceedings Article | 22 January 2005 Paper

Interconnected multilevel microfluidic channels fabricated using low-temperature bonding of SU-8 and multilayer lithography

Zheng-Chun Peng, Zhong-Geng Ling, Jost Goettert, Josef Hormes, Kun Lian

Proceedings Volume 5718, (2005) https://doi.org/10.1117/12.592244

KEYWORDS: Microfluidics, Lithography, Semiconducting wafers, Photomasks, Silicon, Neodymium, Polymers, Liquids, Ultraviolet radiation, Wafer bonding

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SPIE Journal Paper | 1 July 2004

High-resolution x-ray masks for high aspect ratio microelectromechanical systems applications

Lin Wang, Todd Christenson, Yohannes Desta, Rainer Fettig, Jost Goettert

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1753271

KEYWORDS: Photomasks, X-rays, Gold, Silicon, X-ray lithography, Electron beam lithography, Etching, Photoresist processing, Electroplating, Anisotropic etching

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Proceedings Article | 30 December 2003 Paper

Fabrication of large-area x-rays masks for UDXRL on beryllium using thin film UV lithography and x-ray backside exposure

Josef Kouba, Zhong-Geng Ling, Lin Wang, Yohannes Desta, Jost Goettert

Proceedings Volume 5342, (2003) https://doi.org/10.1117/12.531598

KEYWORDS: Gold, X-rays, Photomasks, X-ray lithography, Beryllium, Plating, Ultraviolet radiation, Lithography, Photoresist materials, Photoresist processing

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Proceedings Article | 16 June 2003 Paper

High-resolution x-ray masks for the application of high-aspect-ratio microelectromechanical systems (HARMS)

Lin Wang, Yohannes Desta, Jost Goettert, F. Xian

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504555

KEYWORDS: X-rays, Photomasks, X-ray lithography, Silicon, Electron beam lithography, Gold, Mask making, Polymethylmethacrylate, Plating, Etching

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Proceedings Article | 24 April 2003 Paper

Cost-effective masks for deep x-ray lithography

Heinz-Ulrich Scheunemann, Bernd Loechel, Linke Jian, Daniel Schondelmaier, Yohannes Desta, Jost Goettert

Proceedings Volume 5116, (2003) https://doi.org/10.1117/12.498986

KEYWORDS: Photomasks, X-rays, X-ray lithography, Carbon, Silicon carbide, Beryllium, Transparency, Silicon, Polishing, Glasses

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Proceedings Article | 17 January 2003 Paper

Molded multilevel modular microfluidic devices

Flavio Aristone, Proyag Datta, Yohannes Desta, Alexey Espindola, Jost Goettert

Proceedings Volume 4982, (2003) https://doi.org/10.1117/12.472890

KEYWORDS: Liquids, Nickel, Electroplating, Polymethylmethacrylate, Microfluidics, Photomasks, Plating, Optical alignment, X-rays, Biological research

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Proceedings Article | 17 January 2003 Paper

Polymer-based microfluidic devices for biomedical applications

Mateusz Hupert, Malgorzata Witek, Yun Wang, Michael Mitchell, Xuezhu Liu, Yannick Bejat, Dimitris Nikitopoulos, Jost Goettert, Michael Murphy, Steven Soper

Proceedings Volume 4982, (2003) https://doi.org/10.1117/12.480771

KEYWORDS: Polymethylmethacrylate, Microfluidics, Polymers, Luminescence, Glasses, Chemistry, Microfabrication, Annealing, Photoresist materials, Biomedical optics

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Proceedings Article | 15 January 2003 Paper

High-resolution x-ray masks for high-aspect-ratio microelectromechanical systems (HARMS)

Lin Wang, Flavio Aristone, Jost Goettert, Jong Ren Kong, Keith Bradshaw, Todd Christenson, Yohannes Desta, Yoonyoung Jin

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478268

KEYWORDS: Photomasks, X-rays, Gold, X-ray lithography, Plating, Silicon, Polymethylmethacrylate, Electroplating, Electron beam lithography, Mirrors

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Proceedings Article | 15 January 2003 Paper

Borosilicate-glass-based x-ray masks for LIGA microfabrication

Yohannes Desta, Martin Bednarzik, Michael Bryant, Jost Goettert, Linke Jian, Yoonyoung Jin, Daejong Kim, Sanghoon Lee, Bernd Loechel, Hans-Ulrich Scheunemann, Zhengchun Peng

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478258

KEYWORDS: Photomasks, X-rays, Glasses, Gold, Polymethylmethacrylate, Borosilicate glass, X-ray lithography, Surface roughness, Lithography, Electroplating

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Proceedings Article | 15 January 2003 Paper

SU-8-based deep x-ray lithography/LIGA

Linke Jian, Yohannes Desta, Jost Goettert, Martin Bednarzik, Bernd Loechel, Yoonyoung Jin, Georg Aigeldinger, Varshni Singh, Gisela Ahrens, Gabi Gruetzner, Ralf Ruhmann, Reinhard Degen

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478246

KEYWORDS: X-ray lithography, X-rays, Polymethylmethacrylate, Ultraviolet radiation, Lithography, Microelectromechanical systems, Photoresist processing, Nickel, 3D microstructuring, Electroplating

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Proceedings Article | 28 September 2001 Paper

Multilevel microstructures and mold inserts fabricated with planar and oblique x-ray lithography of SU-8 negative photoresist

Linke Jian, Yohannes Desta, Jost Goettert

Proceedings Volume 4557, (2001) https://doi.org/10.1117/12.442979

KEYWORDS: X-ray lithography, X-rays, Nickel, Photomasks, Electroplating, Ultraviolet radiation, Optical lithography, Lithography, Polymethylmethacrylate, Photoresist materials

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Proceedings Article | 28 September 2001 Paper

Stacked ultradeep x-ray lithography exposures: preliminary results

Georg Aigeldinger, Yohannes Desta, Jost Goettert, Franz Pantenburg

Proceedings Volume 4557, (2001) https://doi.org/10.1117/12.442985

KEYWORDS: Polymethylmethacrylate, X-ray lithography, Scanners, Photomasks, Beryllium, X-rays, Optical lithography, Scanning electron microscopy, Temperature metrology, Surface roughness

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Proceedings Article | 11 August 2000 Paper

Fabrication of graphite masks for deep and ultradeep x-ray lithography

Yohannes Desta, Georg Aigeldinger, Kevin Zanca, Philip Coane, Jost Goettert, Michael Murphy

Proceedings Volume 4175, (2000) https://doi.org/10.1117/12.395599

KEYWORDS: Photomasks, X-rays, Gold, X-ray lithography, Polymethylmethacrylate, Optical lithography, Silicon, Photoresist processing, Titanium, Nickel

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Proceedings Article | 11 August 2000 Paper

Passive alignment and its application in multilevel x-ray lithography

Zhong Ling, Kun Lian, Jost Goettert

Proceedings Volume 4175, (2000) https://doi.org/10.1117/12.395611

KEYWORDS: Photomasks, Optical alignment, X-ray lithography, X-ray optics, X-rays, Semiconducting wafers, Glasses, Quartz, Error analysis, Silicon

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Proceedings Article | 10 April 2000 Paper

Preliminary results at the ultradeep x-ray lithography beamline at CAMD

Georg Aigeldinger, Philip Coane, Benjamin Craft, Jost Goettert, Sam Ledger, Zhong Ling, Harish Manohara, Louis Rupp

Proceedings Volume 4019, (2000) https://doi.org/10.1117/12.382294

KEYWORDS: Photomasks, Polymethylmethacrylate, X-ray lithography, X-rays, Gold, Beryllium, Optical filters, Scanning electron microscopy, Teeth, Microfabrication

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Proceedings Article | 11 April 1997 Paper

Micro-optical and optomechanical systems fabricated by the LIGA technique

Juergen Mohr, Jost Goettert, Andre Mueller, Patrick Ruther, Klaus Wengeling

Proceedings Volume 3008, (1997) https://doi.org/10.1117/12.271424

KEYWORDS: Optical fibers, Optical benches, Optical components, Fabrication, Mirrors, Lenses, Actuators, Optical alignment, Free space optics, Switches

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Proceedings Article | 26 August 1996 Paper

Micro-optical devices based on free-space optics with LIGA micro-optical benches: examples and perspectives

Juergen Mohr, Jost Goettert, Andre Mueller

Proceedings Volume 2783, (1996) https://doi.org/10.1117/12.248509

KEYWORDS: Lenses, Optical benches, Optical components, Optical fabrication, Optical fibers, Free space optics, Switches, Fabrication, Silicon, Transceivers

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Proceedings Article | 12 July 1993 Paper

Micro-optical setup with microlenses and microprisms based on refractive optics

Karl-Heinz Brenner, Michael Frank, Maria Kufner, Stefan Kufner, Joerg Moisel, A. Mueller, Stefan Sinzinger, Markus Testorf, Jost Goettert, Juergen Mohr

Proceedings Volume 1806, (1993) https://doi.org/10.1117/12.147834

KEYWORDS: Prisms, Microlens, Lithography, Image acquisition, Optical computing, Polymethylmethacrylate, Imaging systems, Glasses, Etching, Optical imaging

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Proceedings Article | 1 August 1991 Paper

Characterization of micro-optical components fabricated by deep-etch x-ray lithography

Jost Goettert, Juergen Mohr

Proceedings Volume 1506, (1991) https://doi.org/10.1117/12.45972

KEYWORDS: X-ray lithography, Structured optical fibers, X-rays, Polymethylmethacrylate, Micro optics, Beam splitters, Lenses, Multimode fibers, Interferometry, Helium neon lasers

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Showing 5 of 23 publications

Conference Committee Involvement (1)

Design and Microfabrication of Novel X-Ray Optics

3 August 2000 | San Diego, CA, United States

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