Ms. Juliet A. Rubinstein Profile

Juliet A. Rubinstein

at Univ of California Berkeley

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Author

Publications (12)

Proceedings Article | 19 May 2011 Paper

Collaborative research on emerging technologies and design

Andrew Neureuther, Juliet Rubinstein, Marshal Miller, Kenji Yamazoe, Eric Chin, Cooper Levy, Lynn Wang, Nuo Xu, Costas Spanos, Kun Qian, Kameshwar Poolla, Justin Ghan, Anand Subramanian, Tsu-Jae King Liu, Xin Sun, Kwangok Jeong, Puneet Gupta, Abde Kaqalwalla, Rani Ghaida, Tuck Boon Chan

Proceedings Volume 8081, 80810N (2011) https://doi.org/10.1117/12.899394

KEYWORDS: Photomasks, Double patterning technology, Lithography, Image processing, Line edge roughness, Algorithm development, Reticles, Inspection, Design for manufacturing, Device simulation

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Proceedings Article | 16 March 2009 Paper

Through-focus pattern matching applied to double patterning

Juliet Rubinstein, Andrew Neureuther

Proceedings Volume 7274, 72741A (2009) https://doi.org/10.1117/12.814190

KEYWORDS: Double patterning technology, Optical proximity correction, Monochromatic aberrations, Data modeling, Convolution, Point spread functions, Logic, Optical simulations, Fourier transforms, Zernike polynomials

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Proceedings Article | 13 March 2009 Paper

Tiny footprint programmable electrical defocus monitors

Wojtek Poppe, Patrick Au, Darshana Jayasuriya, Juliet Rubinstein, Andrew Neureuther

Proceedings Volume 7275, 727507 (2009) https://doi.org/10.1117/12.814448

KEYWORDS: Etching, Semiconducting wafers, Resistance, Design for manufacturing, Lithography, Process control, Photomasks, Structural design, Metrology, Calibration

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Proceedings Article | 12 March 2008 Paper

Post-decomposition assessment of double patterning layout

Juliet Rubinstein, Andrew Neureuther

Proceedings Volume 6924, 69240O (2008) https://doi.org/10.1117/12.772891

KEYWORDS: Monochromatic aberrations, Optical proximity correction, Double patterning technology, Lithography, Photomasks, Fourier transforms, Phase shifts, Data modeling, Etching, Image quality standards

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Proceedings Article | 30 October 2007 Paper

Images in photoresist for self-interferometric electrical image monitors

Juliet Rubinstein, Andrew Neureuther

Proceedings Volume 6730, 673039 (2007) https://doi.org/10.1117/12.746728

KEYWORDS: Photomasks, Photoresist materials, Scanning electron microscopy, Semiconducting wafers, Metals, Double patterning technology, Phase shifts, Printing, Neck, Image processing

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Proceedings Article | 28 March 2007 Paper

Transistor-based electrical test structures for lithography and process characterization

Wojtek Poppe, Juliet Holwill, Liang-Teck Pang, Paul Friedberg, Qingguo Liu, Louis Alarcon, Andrew Neureuther

Proceedings Volume 6520, 65203N (2007) https://doi.org/10.1117/12.711613

KEYWORDS: Transistors, Line width roughness, Lithography, Critical dimension metrology, Databases, Semiconducting wafers, Structural design, Cryogenics, Photomasks, Metals

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Proceedings Article | 28 March 2007 Open Access

Collaborative platform, tool-kit, and physical models for DfM

Andy Neureuther, Wojtek Poppe, Juliet Holwill, Eric Chin, Lynn Wang, Jae-Seok Yang, Marshal Miller, Dan Ceperley, Chris Clifford, Koji Kikuchi, Jihong Choi, Dave Dornfeld, Paul Friedberg, Costas Spanos, John Hoang, Jane Chang, Jerry Hsu, David Graves, Alan Wu, Mike Lieberman

Proceedings Volume 6521, 652104 (2007) https://doi.org/10.1117/12.721199

KEYWORDS: Design for manufacturing, Photomasks, Device simulation, Computer aided design, Process modeling, Etching, Monochromatic aberrations, Manufacturing, Lithography, Chemical mechanical planarization

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Proceedings Article | 21 March 2007 Paper

Statistical analysis of gate CD variation for yield optimization

Juliet Holwill, Jongwook Kye, Yi Zou

Proceedings Volume 6521, 65211P (2007) https://doi.org/10.1117/12.712178

KEYWORDS: Critical dimension metrology, Transistors, Statistical analysis, Cadmium, Optical proximity correction, Data modeling, MATLAB, Stochastic processes, Visualization, Optimization (mathematics)

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Proceedings Article | 21 March 2007 Paper

DRC and mask friendly pattern and probe aberration monitors

Juliet Holwill, Andrew Neureuther

Proceedings Volume 6521, 65211U (2007) https://doi.org/10.1117/12.712383

KEYWORDS: Photomasks, Manufacturing, Calibration, Scanning electron microscopy, Photoresist materials, Mask making, Lithography, Zernike polynomials, Spherical lenses, Design for manufacturability

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Proceedings Article | 21 March 2007 Paper

Prediction of interconnect delay variations using pattern matching

Eric Chin, Juliet Holwill, Andrew Neureuther

Proceedings Volume 6521, 65210I (2007) https://doi.org/10.1117/12.712257

KEYWORDS: Capacitance, Resistance, Lithography, Monochromatic aberrations, Metals, Process modeling, Etching, Chemical mechanical planarization, Critical dimension metrology, Inspection

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Proceedings Article | 24 March 2006 Paper

Self-interferometric electrical image monitors

Juliet Holwill, Andrew Neureuther

Proceedings Volume 6152, 615215 (2006) https://doi.org/10.1117/12.656745

KEYWORDS: Photoresist materials, Double patterning technology, Printing, Image enhancement, Device simulation, Scanning electron microscopy, Semiconducting wafers, Metrology, Manufacturing, Interferometry

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Proceedings Article | 20 March 2006 Paper

Layout 'hot spots' for advancing optical technologies

Juliet Holwill, Gregory McIntyre, Wojtek Poppe, Andrew Neureuther

Proceedings Volume 6154, 61543M (2006) https://doi.org/10.1117/12.656819

KEYWORDS: Optical proximity correction, Polarization, Monochromatic aberrations, Photomasks, Printing, Phase shifts, Double patterning technology, Lithographic illumination, Optical lithography, Fourier transforms

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Showing 5 of 12 publications

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