Mr. Jun Hatakeyama Profile

Jun Hatakeyama

Chief Engineer at Shin-Etsu Chemical Co Ltd

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Author

Publications (4)

Proceedings Article | 26 March 2010 Paper

Inactivation technology for pitch doubling lithography

Jun Hatakeyama, Masaki Ohashi, Youichi Ohsawa, Kazuhiro Katayama, Yoshio Kawai

Proceedings Volume 7639, 76392U (2010) https://doi.org/10.1117/12.849211

KEYWORDS: Double patterning technology, Optical lithography, Second-harmonic generation, Lithography, Photoresist processing, Thin film coatings, Polarization, Photomasks, Manufacturing, Etching

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Proceedings Article | 1 April 2009 Paper

0.30k1 CH delineation with novel image reversal materials

J. Hatakeyama, K. Katayama, T. Yoshihara, Y. Kawai, T. Ishihara

Proceedings Volume 7273, 72730L (2009) https://doi.org/10.1117/12.816084

KEYWORDS: Image processing, Photomasks, Polymers, Polarization, Lithography, Polymer thin films, Image enhancement, Optical lithography, Immersion lithography, Switches

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Proceedings Article | 12 June 2003 Paper

Newly developed alternating-copolymer-based silicon-containing resists for sub-100-nm pattern fabrication

Jun Hatakeyama, Takanobu Takeda, Takeshi Kinsho, Yoshio Kawai, Toshinobu Ishihara

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483775

KEYWORDS: Silicon, Etching, Polymers, Lithography, 193nm lithography, Resistance, Silicon films, Oxygen, Line edge roughness, Thin films

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Proceedings Article | 29 June 1998 Paper

Discrimination enchancement in polysilsesquioxane-based positive resists for ArF lithography

Jun Hatakeyama, M. Nakashima, I. Kaneko, Shigehiro Nagura, Toshinobu Ishihara

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312454

KEYWORDS: Polymers, Transmittance, Lithography, Silicon, Tolerancing, Polymer thin films, Standards development, Semiconducting wafers, Transparency, Image processing

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