Mr. Katsumi Ohira Profile

Katsumi Ohira

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Publications (7)

Proceedings Article | 19 May 2006 Paper

Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond

Nobutaka Kikuiri, Shingo Murakami, Hideo Tsuchiya, Motonari Tateno, Kenichi Takahara, Shinichi Imai, Ryoichi Hirano, Ikunao Isomura, Yoshitake Tsuji, Yukio Tamura, Kenichi Matsumura, Kinya Usuda, Masao Otaki, Osamu Suga, Katsumi Ohira

Proceedings Volume 6283, 62830Y (2006) https://doi.org/10.1117/12.683579

KEYWORDS: Inspection, Photomasks, Image transmission, Laser optics, Optical inspection, Lithography, Defect detection, Sensors, Objectives, Image sensors

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Proceedings Article | 6 December 2004 Paper

Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era

Dong-Hoon Chung, Katsumi Ohira, Nobuyuki Yoshioka, Kenichi Matsumura, Toru Tojo, Masao Otaki

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578592

KEYWORDS: Photomasks, Inspection, Optical proximity correction, Lithography, Optical lithography, Resolution enhancement technologies, Defect detection, Defect inspection, SRAF, Optical inspection

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Proceedings Article | 6 December 2004 Paper

Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance

Toru Tojo, Ryoich Hirano, Hideo Tsuchiya, Junji Oaki, Takeshi Nishizaka, Yasushi Sanada, Kazuto Matsuki, Ikunao Isomura, Riki Ogawa, Noboru Kobayashi, Kazuhiro Nakashima, Shinji Sugihara, Hiromu Inoue, Shinichi Imai, Hitoshi Suzuki, Akihiko Sekine, Makoto Taya, Akemi Miwa, Nobuyuki Yoshioka, Katsumi Ohira, Dong-Hoon Chung, Masao Otaki

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579133

KEYWORDS: Inspection, Photomasks, Sensors, Image sensors, Defect detection, Algorithm development, Speckle, Modulation transfer functions, Image processing, Optical inspection

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Proceedings Article | 20 August 2004 Paper

Optical mask inspection strategy for 65-nm node and beyond

Dong-Hoon Chung, Katsumi Ohira, Nobuyuki Yoshioka, Kenichi Matsumura, Toru Tojo, Masao Otaki

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557726

KEYWORDS: Photomasks, Inspection, Lithography, Optical proximity correction, SRAF, Defect inspection, Optical lithography, Optical inspection, Defect detection, Resolution enhancement technologies

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Proceedings Article | 20 August 2004 Paper

Photomask quality assessment solution for 90-nm technology node

Katsumi Ohira, Dong Hoon Chung, Yoshioka Nobuyuki, Motonari Tateno, Kenichi Matsumura, Jiunn-Hung Chen, Gerard Luk-Pat, Norio Fukui, Yoshio Tanaka

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557734

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Computer simulations, Image processing, Image quality, Classification systems, Defect inspection, Resolution enhancement technologies, Deep ultraviolet

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Proceedings Article | 17 December 2003 Paper

DUV inspection capability for 90-nm node mask in ArF lithography

Katsumi Ohira, Byung Gook Kim, Keishi Tanaka, Nobuyuki Yoshioka, Motonari Tateno, Naohisa Takayama, Shingo Murakami, Keiichi Hatta, Shinji Akima, Fuyuhiko Matsuo, Masao Otaki

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518293

KEYWORDS: Inspection, Photomasks, Lithography, Optical proximity correction, Deep ultraviolet, Semiconducting wafers, Binary data, Phase shifts, Chromium, Point spread functions

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Proceedings Article | 14 August 2003 Paper

Waveguide interleaving filters

Takafumi Chiba, Hideaki Arai, Hideki Nounen, Katsumi Ohira

Proceedings Volume 5246, (2003) https://doi.org/10.1117/12.514003

KEYWORDS: Wavelength division multiplexing, Optical filters, Waveguides, Optical circuits, Photonic integrated circuits, Dispersion, Optical fibers, Transmittance, Dense wavelength division multiplexing, Electronic filtering

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Showing 5 of 7 publications

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