Ken Ozawa
Principal Engineer at Magnescale Co., Ltd.
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 11 May 2007 Paper
Yosuke Kojima, Masanori Shirasaki, Kazuaki Chiba, Tsuyoshi Tanaka, Yukio Inazuki, Hiroki Yoshikawa, Satoshi Okazaki, Kazuya Iwase, Kiichi Ishikawa, Ken Ozawa
Proceedings Volume 6607, 66070C (2007) https://doi.org/10.1117/12.728925
KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Printing, Etching, Binary data, Resolution enhancement technologies, Reflectivity, Scanning electron microscopy, Image enhancement

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634951 (2006) https://doi.org/10.1117/12.685360
KEYWORDS: Birefringence, Photomasks, Polarization, Cadmium sulfide, Tolerancing, Electroluminescence, Lithography, Critical dimension metrology, Lawrencium, Wave plates

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 628337 (2006) https://doi.org/10.1117/12.681826
KEYWORDS: Photomasks, Tolerancing, Polarization, Immersion lithography, Electroluminescence, Lithography, Error analysis, Lithographic illumination, Birefringence, Fiber optic illuminators

Proceedings Article | 29 March 2006 Paper
Nobuyuki Matsuzawa, Boontarika Thunnakart, Ken Ozawa, Yuko Yamaguchi, Hiroyuki Nakano, Hiroichi Kawahira
Proceedings Volume 6153, 61531J (2006) https://doi.org/10.1117/12.651563
KEYWORDS: Silicon, Reflectivity, Oxides, Refractive index, Immersion lithography, Photoresist materials, Lithography, Optimization (mathematics), Polarization, Semiconductors

Proceedings Article | 15 March 2006 Paper
Ken Ozawa, Boontarika Thunnakart, Tokihisa Kaneguchi, Isao Mita, Atsushi Someya, Toshiharu Nakashima, Hisashi Nishinaga, Yasushi Mizuno, Tomoyuki Matsuyama, Masato Hamatani
Proceedings Volume 6154, 61540C (2006) https://doi.org/10.1117/12.656242
KEYWORDS: Lithographic illumination, Lithography, Line edge roughness, SRAF, Polarization, Photomasks, Imaging devices, Optical proximity correction, Manufacturing, Logic

Showing 5 of 14 publications
Conference Committee Involvement (2)
Optical Microlithography XXII
24 February 2009 | San Jose, California, United States
Optical Microlithography XXI
26 February 2008 | San Jose, California, United States
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