Mr. Keundo Ban Profile

Keundo Ban

at SK Hynix Inc

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 23 March 2012 Paper

Comparison study for 3x-nm contact hole CD uniformity between EUV lithography and ArF immersion double patterning

Keundo Ban, Junggun Heo, Hyunkyung Shim, Minkyung Park, Kilyoung Lee, Sunyoung Koo, Jaeheon Kim, Cheolkyu Bok, Myoungsoo Kim, Hyosang Kang

Proceedings Volume 8322, 83221A (2012) https://doi.org/10.1117/12.916119

KEYWORDS: Double patterning technology, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Line width roughness, Photomasks, Optical lithography, Etching, Metrology, Edge roughness

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Proceedings Article | 8 April 2011 Paper

Comparison between ADT and PPT for 2X DRAM patterning

Sunyoung Koo, Jun-Taek Park, Yoonsuk Hyun, Keundo Ban, Seokkyun Kim, Chang-Moon Lim, Donggyu Yim, Sungki Park

Proceedings Volume 7969, 79691N (2011) https://doi.org/10.1117/12.879450

KEYWORDS: Extreme ultraviolet lithography, Nanoimprint lithography, Optical lithography, Extreme ultraviolet, Photomasks, Lithography, Lithographic illumination, Line width roughness, High volume manufacturing, Scanners

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Proceedings Article | 20 March 2010 Paper

Feasibility of EUVL thin absorber mask for minimization of mask shadowing effect

Yoonsuk Hyun, Juntaek Park, Sunyoung Koo, Yongdae Kim, Keundo Ban, Seokkyun Kim, Changmoon Lim, Donggyu Yim, Hyeongsoo Kim, Sungki Park

Proceedings Volume 7636, 763614 (2010) https://doi.org/10.1117/12.846506

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Nanoimprint lithography, Critical dimension metrology, Extreme ultraviolet, Printing, Reflectivity, Silicon, Ruthenium

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Proceedings Article | 18 March 2009 Paper

EUV-patterning characterization using a 3D mask simulation and field EUV scanner

Jun-Taek Park, Yoon-Suk Hyun, Chang-Moon Lim, Tae-Seung Eom, Sunyoung Koo, Sarohan Park, Suk-Kyun Kim, Keun-Do Ban, Hyun-Jo Yang, Chang-Il Oh, Byung-Ho Nam, Chang-Reol Kim, HyeongSoo Kim, Seung-Chan Moon, Sungki Park

Proceedings Volume 7271, 72711G (2009) https://doi.org/10.1117/12.814407

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Scanners, Critical dimension metrology, Extreme ultraviolet, Silicon, Optical lithography, Deep ultraviolet, Semiconducting wafers, Laser scanners

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Proceedings Article | 3 April 2007 Paper

Modified polymer architecture for immersion lithography

Sang Soo Kim, Jeong Woo Kim, Jung Youl Lee, Seung Keun Oh, Sang Hyang Lee, Jung Woo Kim, Jae Woo Lee, Deog bae Kim, Jaehyun Kim, Keun Do Ban, Cheol Kyu Bok, Seoung-Chan Moon

Proceedings Volume 6519, 65191W (2007) https://doi.org/10.1117/12.711657

KEYWORDS: Polymers, Polymerization, Line width roughness, Immersion lithography, Palladium, Line edge roughness, Photoresist processing, Promethium, Polymer thin films, Semiconducting wafers

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Proceedings Article | 2 April 2007 Paper

Study on the reduction of defects in immersion lithography

Keundo Ban, Sarohan Park, Cheolkyu Bok, Heeyoul Lim, Junggun Heo, Hyunsook Chun, Junghyun Kang, Seungchan Moon

Proceedings Volume 6519, 65191V (2007) https://doi.org/10.1117/12.712029

KEYWORDS: Bridges, Semiconducting wafers, Immersion lithography, Molecular bridges, Particles, Thin film coatings, Photoresist processing, Coating, Lithography, Metrology

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Proceedings Article | 30 March 2007 Paper

Optimization of material and process parameter for minimizing defect in implementation of MFHM process

Kilyoung Lee, Junggun Heo, Keundo Ban, Hyungsuk Seo, Geunsu Lee, Wonkyu Kim, Junhee Cho, Junhyeub Sun, Sungkwon Lee, Cheolkyu Bok, Seungchan Moon, Jinwoong Kim

Proceedings Volume 6519, 65192Y (2007) https://doi.org/10.1117/12.712406

KEYWORDS: Etching, System on a chip, Silicon, Coating, Lithography, Materials processing, Carbon, Particles, Photoresist processing, Photomasks

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Proceedings Article | 23 March 2007 Paper

Polymer structure modifications for immersion leaching control

Sang Hyang Lee, Jung Woo Kim, Jeong Woo Kim, Seung Keun Oh, Chan Sik Park, Jung Youl Lee, Sang Soo Kim, Jae Woo Lee, Deogbae Kim, Jaehyun Kim, Keun Do Ban, Cheol Kyu Bok, Seung Chan Moon

Proceedings Volume 6519, 651925 (2007) https://doi.org/10.1117/12.711889

KEYWORDS: Polymers, Semiconducting wafers, Fluorine, Immersion lithography, Semiconductors, Polymer thin films, Photoresist materials, Lithography, Manufacturing, Silicon

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Proceedings Article | 29 March 2006 Paper

Resolution enhanced top anti reflective coating materials for ArF immersion lithography

Jae-Chang Jung, Sung-Koo Lee, Keun-Do Ban, Cheolkyu Bok, Hyeong-Soo Kim, Seung-Chan Moon, Jinwoong Kim

Proceedings Volume 6153, 61531Z (2006) https://doi.org/10.1117/12.657093

KEYWORDS: Immersion lithography, Fluorine, Antireflective coatings, Resolution enhancement technologies, Semiconducting wafers, Bridges, Lithography, Photoresist materials, Polymers, Liquids

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Proceedings Article | 24 March 2006 Paper

Application of scatterometry to measure organic material profile

Sunyoung Koo, Keundo Ban, Chang-moon Lim, Cheolkyu Bok, Seung-Chan Moon, Jinwoong Kim

Proceedings Volume 6152, 61522T (2006) https://doi.org/10.1117/12.656847

KEYWORDS: Critical dimension metrology, Scatterometry, Semiconducting wafers, Scanning electron microscopy, Etching, Metrology, Silicon, Scatter measurement, Tungsten, Organic materials

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Proceedings Article | 24 March 2006 Paper

Improvement of alignment and overlay accuracy on amorphous carbon layers

Young-Sun Hwang, Eung-kil Kang, Ki-lyoung Lee, Keun-Do Ban, Cheol-Kyu Bok, Chang-Moon Lim, Hyeong-Soo Kim, Seung-Chan Moon

Proceedings Volume 6152, 615222 (2006) https://doi.org/10.1117/12.656416

KEYWORDS: Optical alignment, Etching, Carbon, Absorption, Photomasks, Reflection, Lithography, Resolution enhancement technologies, Photoresist processing, Optical lithography

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Proceedings Article | 15 March 2006 Paper

Positive and negative tone double patterning lithography for 50-nm flash memory

Chang-Moon Lim, Seo-Min Kim, Young-Sun Hwang, Jae-Seung Choi, Keun-Do Ban, Sung-Yoon Cho, Jin-Ki Jung, Eung-Kil Kang, Hee-Youl Lim, Hyeong-Soo Kim, Seung-Chan Moon

Proceedings Volume 6154, 615410 (2006) https://doi.org/10.1117/12.656187

KEYWORDS: Double patterning technology, Lithography, Photomasks, Optical lithography, Neodymium, Etching, Critical dimension metrology, Overlay metrology, Photoresist processing, Semiconducting wafers

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Proceedings Article | 4 May 2005 Paper

Top antireflective coating process for immersion lithography

Jae Chang Jung, Sung Koo Lee, Keun Do Ban, Seo Min Kim, Cheolkyu Bok, Chang Moon Lim, Seung Chan Moon

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599280

KEYWORDS: Coating, Lithography, Particles, Immersion lithography, Semiconducting wafers, Antireflective coatings, Optical lithography, Light sources, Resolution enhancement technologies, Photoresist processing

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Proceedings Article | 4 May 2005 Paper

Studies on leaching of photoresist components by water

Seung Keun Oh, Jong Yong Kim, Young Ho Jung, Jae Woo Lee, Deog Bae Kim, Jaehyun Kim, Geun Su Lee, Sung Koo Lee, Keun Do Ban, Jae Chang Jung, Cheol Kyu Bok, Seung Chan Moon

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598618

KEYWORDS: Polymers, Water, Photoresist materials, Immersion lithography, Polymer thin films, Diffusion, Liquids, Photoresist processing, Refractive index, Optical lithography

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Proceedings Article | 4 May 2005 Paper

Diffusion contributions to line end shortening in 193-nm photolithography

Eun-Kyung Son, Jung-Woo Kim, Sang-Hyang Lee, Chan-Sik Park, Jae-Woo Lee, Jaehyun Kim, Geun-Su Lee, Sung-Koo Lee, Keun-Do Ban, Jae-Chang Jung, Cheol Kyu Bok, Seung-Chan Moon

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598615

KEYWORDS: Diffusion, Polymers, Photoresist materials, Optical lithography, Electrodes, Lithography, Semiconducting wafers, Resistance, Optical proximity correction, Quenching (fluorescence)

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Proceedings Article | 14 May 2004 Paper

Novel rinse process for reducing pattern collapse in 0.30-k1 ArF lithography

Geunsu Lee, Young Sun Hwang, Keun Do Ban, Cheol Kyu Bok, Seung Chan Moon, Ki Soo Shin

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537193

KEYWORDS: Lithography, Line width roughness, Metals, Critical dimension metrology, Electroluminescence, Scanning electron microscopy, Semiconducting wafers, Interfaces, Scanners, Inspection

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Proceedings Article | 14 May 2004 Paper

High etch rate ArF BARC composed of polyester

Young Sun Hwang, Jae Chang Jung, Keun Do Ban, Sarohan Park, Cheol Kyu Bok, Seung Chan Moon, Ki Soo Shin

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534763

KEYWORDS: Etching, Coating, Semiconducting wafers, Lithography, Photoresist processing, Bottom antireflective coatings, Line edge roughness, Light sources, Optical lithography, Sun

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Showing 5 of 17 publications

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