Mr. Kwangok Jeong Profile

Kwangok Jeong

Principle Engineer at Univ of California San Diego

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 14 October 2011 Paper

Performance and variability driven guidelines for BEOL layout decomposition with LELE double patterning

Tuck Boon Chan, Kwangok Jeong, Andrew Kahng

Proceedings Volume 8166, 81663O (2011) https://doi.org/10.1117/12.899553

KEYWORDS: Capacitance, Cesium, Scanning probe lithography, Double patterning technology, Critical dimension metrology, Lithography, Back end of line, Resistance, Transistors, Monte Carlo methods

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SPIE Journal Paper | 1 July 2011

Cost-driven mask strategies considering parametric yield, defectivity, and production volume

Kwangok Jeong, Andrew Kahng, Christopher Progler

JM3, Vol. 10, Issue 03, 033021, (July 2011) https://doi.org/10.1117/12.10.1117/1.3633246

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet lithography, Manufacturing, Lithography, Inspection, Extreme ultraviolet, Data modeling

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Proceedings Article | 19 May 2011 Paper

Collaborative research on emerging technologies and design

Andrew Neureuther, Juliet Rubinstein, Marshal Miller, Kenji Yamazoe, Eric Chin, Cooper Levy, Lynn Wang, Nuo Xu, Costas Spanos, Kun Qian, Kameshwar Poolla, Justin Ghan, Anand Subramanian, Tsu-Jae King Liu, Xin Sun, Kwangok Jeong, Puneet Gupta, Abde Kaqalwalla, Rani Ghaida, Tuck Boon Chan

Proceedings Volume 8081, 80810N (2011) https://doi.org/10.1117/12.899394

KEYWORDS: Photomasks, Double patterning technology, Lithography, Image processing, Line edge roughness, Algorithm development, Reticles, Inspection, Design for manufacturing, Device simulation

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Proceedings Article | 19 May 2011 Paper

New yield-aware mask strategies

Kwangok Jeong, Andrew Kahng, Christopher Progler

Proceedings Volume 8081, 80810P (2011) https://doi.org/10.1117/12.899295

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Extreme ultraviolet lithography, Manufacturing, Lithography, Critical dimension metrology, Inspection, Data modeling, Multilayers

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SPIE Journal Paper | 1 April 2010

Electrical assessment of lithographic gate line-end patterning

Puneet Gupta, Kwangok Jeong, Andrew Kahng, Chul-Hong Park

JM3, Vol. 9, Issue 02, 023014, (April 2010) https://doi.org/10.1117/12.10.1117/1.3452319

KEYWORDS: Capacitance, Lithography, Optical proximity correction, Optical lithography, 3D modeling, Transistors, Nano opto mechanical systems, Logic, Diffusion, TCAD

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Proceedings Article | 18 March 2009 Paper

Interference assisted lithography for patterning of 1D gridded design

Robert Greenway, Rudolf Hendel, Kwangok Jeong, Andrew Kahng, John Petersen, Zhilong Rao, Michael Smayling

Proceedings Volume 7271, 72712U (2009) https://doi.org/10.1117/12.812033

KEYWORDS: Lithography, Diffusion, Photomasks, Critical dimension metrology, Optical lithography, 193nm lithography, Double patterning technology, Logic, Metals, Electron beam lithography

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Proceedings Article | 17 October 2008 Paper

32nm 1-D regular pitch SRAM bitcell design for interference-assisted lithography

Robert Greenway, Kwangok Jeong, Andrew Kahng, Chul-Hong Park, John Petersen

Proceedings Volume 7122, 71221L (2008) https://doi.org/10.1117/12.801883

KEYWORDS: Lithography, Transistors, Photomasks, Critical dimension metrology, Optical lithography, Device simulation, Metals, Diffusion, Projection lithography, Double patterning technology

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Proceedings Article | 19 May 2008 Paper

Electrical metrics for lithographic line-end tapering

Puneet Gupta, Kwangok Jeong, Andrew Kahng, Chul-Hong Park

Proceedings Volume 7028, 70283A (2008) https://doi.org/10.1117/12.793117

KEYWORDS: Information operations, Ions, Capacitance, Lithium, Diffusion, Lithography, Optical lithography, TCAD, Instrument modeling, 3D modeling

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Showing 5 of 8 publications

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