Dr. Luke Ting Hao Hsu Profile

Dr. Luke Ting Hao Hsu

Inventor at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 12 November 2024 Presentation + Paper

Presentation + Paper

Realize 193nm inspection for EUV mask

S. Ku, Luke T. Hsu, C. Wang, C. Chen, C. Lu, C. Wu, Vincent C. Wen, Cyrus Chen, Yenlin Chen, Jim Wang, Joanne Tsai, Ling-Chuan Tsao, Yu-Chia Chiang, Ya-Chien Chang, Yi-Hui Zhuo, Yu-Chieh Huang, Ying-Hui Chen, Dongsheng Fan, Amo Chen, Dongxue Chen, Mingwei Li

Proceedings Volume 13216, 132160O (2024) https://doi.org/10.1117/12.3034682

KEYWORDS: Inspection, Extreme ultraviolet, Databases, Defect detection, Deep learning

Read Abstract +

Proceedings Article | 18 December 2015 Paper

Paper

Key indexes of the effectiveness of mask surface treatments

Chen-Yang Lin, Chung-Hsuan Liu, Kuan-Wen Lin, Chi-Lun Lu, Luke Hsu, Angus Chin, Anthony Yen

Proceedings Volume 9635, 963519 (2015) https://doi.org/10.1117/12.2197675

KEYWORDS: Chromium, Ruthenium, Particles, Digital watermarking, Plasma, Photomasks, Oxygen, Extreme ultraviolet, Inspection, Quartz

Read Abstract +

SPIE Journal Paper | 16 June 2014

Mask defect management in extreme-ultraviolet lithography

Nai-Ching Chen, Chia-Hao Yu, Ching-Fang Yu, Chi-Lun Lu, James Chu, Luke Hsu, Angus Chin, Anthony Yen

JM3, Vol. 13, Issue 02, 023010, (June 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.2.023010

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Particles, Semiconducting wafers, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Critical dimension metrology, Defect detection

Read Abstract +

Proceedings Article | 28 June 2013 Paper

Paper

Physical force optimization for advanced photomask cleaning

C. W. Shen, K. W. Lin, C. L. Lu, Luke Hsu, Angus Chin, Anthony Yen

Proceedings Volume 8701, 870106 (2013) https://doi.org/10.1117/12.2028484

KEYWORDS: Particles, SRAF, Mask cleaning, Photomasks, Inspection, Binary data, Acoustics, Opacity, Cavitation, Diffractive optical elements

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Paper

Sub-20-nm node photomask cleaning enhancement by controlling zeta potential

Kuan-Wen Lin, Chi-Lun Lu, Chin-Wei Shen, Luke Hsu, Angus Chin, Anthony Yen

Proceedings Volume 8522, 852213 (2012) https://doi.org/10.1117/12.975822

KEYWORDS: Particles, Mask cleaning, Photomasks, Quartz, Chemical analysis, Critical dimension metrology, Semiconductor manufacturing, Silicon, Inspection, Manufacturing

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Paper

Study of critical dimension uniformity (CDU) using a mask inspector

Mei-Chun Lin, Ching-Fang Yu, Mei-Tsu Lai, Luke Hsu, Angus Chin, Anthony Yen

Proceedings Volume 8522, 85220C (2012) https://doi.org/10.1117/12.977944

KEYWORDS: Inspection, Critical dimension metrology, Scanning electron microscopy, Photomasks, Visualization, Opacity, Metrology, Data acquisition, Image analysis, Databases

Read Abstract +

Proceedings Article | 7 April 2011 Paper

Paper

Printability of buried mask defects in extreme UV lithography

Pei-Cheng Hsu, Ming-Jiun Yao, Wen-Chang Hsueh, Chia-Jen Chen, Shin-Chang Lee, Ching-Fang Yu, Luke Hsu, Sheng-Ji Chin, Jimmy Hu, Shu-Hao Chang, Chih-T'sung Shih, Yen-Cheng Lu, Timothy Wu, Shinn-Sheng Yu, Anthony Yen

Proceedings Volume 7969, 79691D (2011) https://doi.org/10.1117/12.881583

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Etching, Extreme ultraviolet, Manufacturing, Deposition processes, Defect inspection, Chromium, Lithography

Read Abstract +

Proceedings Article | 29 September 2010 Paper

Paper

Inspection of advanced computational lithography logic reticles using a 193-nm inspection system

Ching-Fang Yu, Mei-Chun Lin, Mei-Tsu Lai, Luke T.H. Hsu, Angus Chin, S. C. Lee, Anthony Yen, Jim Wang, Ellison Chen, David Wu, William Broadbent, William Huang, Zinggang Zhu

Proceedings Volume 7823, 78232F (2010) https://doi.org/10.1117/12.865604

KEYWORDS: Reticles, Inspection, SRAF, Semiconducting wafers, Computational lithography, Control systems, Defect detection, Databases, Model-based design, Optical proximity correction

Read Abstract +

Proceedings Article | 25 September 2010 Paper

Paper

Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

C. L. Lu, C. H. Yu, W. H. Liu, Luke Hsu, Angus Chin, S. C. Lee, Anthony Yen, Gaston Lee, Peter Dress, Sherjang Singh, Uwe Dietze

Proceedings Volume 7823, 782325 (2010) https://doi.org/10.1117/12.864303

KEYWORDS: Binary data, Particles, Photomasks, SRAF, Nitrogen, Personal digital assistants, Liquids, Quartz, Mask cleaning, Atomic force microscopy

Read Abstract +

Proceedings Article | 29 May 2007 Paper

Paper

High-performance reticle inspection tool for the 65-nm node and beyond

Tung-Yaw Kang, Chia-Hsien Chen, Chia Hui Ho, Luke Hsu, Yao-Ching Ku, Kazuyoshi Nakamura, Hideyuki Moribe, Takeshi Bashomatsu, Kenichi Matsumura, Keiichi Hatta, Hiroyuki Takahashi, Akira Uehara, Takahiro Igeta, Hiroshi Uno, Ryou Igarashi, Hiroaki Matsuda

Proceedings Volume 6607, 660716 (2007) https://doi.org/10.1117/12.728955

KEYWORDS: Inspection, Reticles, Photomasks, Semiconducting wafers, Defect detection, Particles, Defect inspection, Sensors, Deep ultraviolet, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 4 November 2005 Paper

Paper

Improvement in defect classification efficiency by grouping disposition for reticle inspection

Rick Lai, Luke T. Hsu, Peter Chang, C.H. Ho, Frankie Tsai, Garrett Long, Paul Yu, John Miller, Vincent Hsu, Ellison Chen

Proceedings Volume 5992, 59920B (2005) https://doi.org/10.1117/12.632095

KEYWORDS: Photomasks, Inspection, Reticles, Diffractive optical elements, Manufacturing, Optical proximity correction, Semiconductor manufacturing, Lithography, Intelligence systems, Semiconducting wafers

Read Abstract +

Proceedings Article | 4 November 2005 Paper

Paper

Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process

Luke T. Hsu, C.H. Ho, C. C. Lin, Vincent Hsu, Ellison Chen, Paul Yu, Kong Son

Proceedings Volume 5992, 599207 (2005) https://doi.org/10.1117/12.632108

KEYWORDS: Inspection, Contamination, Deep ultraviolet, Ultraviolet radiation, Reticles, Photomask technology, Image resolution, Sensors, Stars, Photomasks

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Paper

Aerial-image-based inspection on subresolution scattering bars

Luke Hsu, C. Lin, Anja Rosenbusch, Yuval Bloomberg, Simon Kurin

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579749

KEYWORDS: Inspection, Photomasks, Scattering, Solids, Semiconducting wafers, Resolution enhancement technologies, Defect detection, Defect inspection, Image enhancement, Light scattering

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Paper

Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool

Rick Lai, Luke Hsu, Chiun Hong Kung, Johnson Hung, Wei Huang, Chue-San Yoo, Yao-Tsu Huang, Vincent Hsu

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518016

KEYWORDS: Inspection, Calibration, Reticles, Photomasks, Defect detection, Image transmission, Manufacturing, SRAF, Lithography, Defect inspection

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Paper

Inspection of aggressive OPC using aerial image-based mask inspection

Luke Hsu, Johnson Hung, Hong-Chang Hsieh, Anja Rosenbusch, Reuven Falah, Yuval Blumberg

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504058

KEYWORDS: Inspection, Optical proximity correction, Heads up displays, Lithium, Imaging systems, Airborne remote sensing

Read Abstract +

Proceedings Article | 1 August 2002 Paper

Paper

Progressive self-learning photomask defect classification

Eric Lynn, Shih-Ying Chen, Tyng-Hao Hsu, Chang-Cheng Hung, Chin-Hsiang Lin

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477012

KEYWORDS: Photomasks, Image processing, Library classification systems, Inspection, Detection and tracking algorithms, Image segmentation, Solids, Feature extraction, Optical proximity correction, Manufacturing

Read Abstract +

Proceedings Article | 11 March 2002 Paper

Paper

Binary mask defect printability for 130-nm ArF lithography

Shu-Chun Lin, Jian-Hong Chen, Tyng-Hao Hsu, C. Hung, Chin-Hsiang Lin

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458363

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Photomasks, Reticles, Lithography, Defect detection, Printing, Binary data, Defect inspection, Inspection

Read Abstract +

Showing 5 of 17 publications

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement