Mr. Marcus Kaestner Profile

Marcus Kaestner

Ph.D Student at Technische Univ Ilmenau

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 19 March 2018 Presentation + Paper

Field-emission scanning probe lithography with self-actuating and self-sensing cantilevers for devices with single digit nanometer dimensions

Ivo Rangelow, Claudia Lenk , Martin Hofmann , Steve Lenk , Tzvetan Ivanov , Ahmad Ahmad , Marcus Kaestner, Elshad Guliyev, Christoph Reuter, Matthias Budden, Jens-Peter Zöllner, Mathias Holz , Alexander Reum, Zahid Durrani, Mervyn Jones, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Michael Kuehnel, Thomas Fröhlich, Roland Fuessl, E. Manske

Proceedings Volume 10584, 1058406 (2018) https://doi.org/10.1117/12.2299955

KEYWORDS: Silicon, Lithography, Etching, Scanning probe lithography, Cryogenics, Optical alignment, Nanoelectronics, Reactive ion etching, Nanolithography, Electron beam lithography

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Proceedings Article | 31 January 2018 Paper

Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices

Ivo Rangelow, Claudia Lenk , Martin Hofmann , Tzvetan Ivanov, Steve Lenk, Elshad Guliyev, Marcus Kaestner, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Onur Ates, Hamdi Torun, Arda Yalcinkaya, Ahmad Ahmad, Alexander Reum, Mathias Holz

Proceedings Volume 10456, 1045621 (2018) https://doi.org/10.1117/12.2282606

KEYWORDS: Lithography, Scanning probe lithography, Cryogenics, Etching, Optics manufacturing, Nanostructures, Nanolithography, Optical lithography, Split ring resonators, Image resolution

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SPIE Journal Paper | 10 June 2015

Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Marcus Kaestner, Cemal Aydogan, Tzvetan Ivanov, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Valentyn Ishchuk, Yana Krivoshapkina, Manuel Hofer, Steve Lenk, Ivaylo Atanasov, Mathias Holz, Ivo Rangelow

JM3, Vol. 14, Issue 03, 031202, (June 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031202

KEYWORDS: Scanning probe lithography, Optical lithography, Lithography, Optical alignment, Semiconducting wafers, Atomic force microscopy, Electron beam lithography, Inspection, Navigation systems, Electrons

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Proceedings Article | 20 March 2015 Paper

Tailored molecular glass resists for scanning probe lithography

Christian Neuber, Hans-Werner Schmidt, Peter Strohriegl, Andreas Ringk, Tristan Kolb, Andreas Schedl, Vincent Fokkema, Marijn G. van Veghel, Mike Cooke, Colin Rawlings, Urs Dürig, Armin Knoll, Jean- François de Marneffe, Ziad el Otell, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo Rangelow

Proceedings Volume 9425, 94250E (2015) https://doi.org/10.1117/12.2085734

KEYWORDS: Glasses, Scanning probe lithography, Etching, Thin films, Optical lithography, Plasma etching, Resistance, Electron beam lithography, Lithography, Crystals

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Proceedings Article | 19 March 2015 Paper

Self-actuated, self-sensing cantilever for fast CD measurement

Ahmad Ahmad, Tzvetan Ivanov, Alexander Reum, Elshad Guliyev, Tihomir Angelov, Andreas Schuh, Marcus Kaestner, Ivaylo Atanasov, Manuel Hofer, Mathias Holz, Ivo Rangelow

Proceedings Volume 9424, 94240P (2015) https://doi.org/10.1117/12.2085760

KEYWORDS: Atomic force microscopy, Silicon, Sensors, Metrology, Lithography, Actuators, Amplifiers, 3D metrology, Semiconducting wafers, Scanners

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Proceedings Article | 17 March 2015 Paper

Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Marcus Kaestner, Cemal Aydogan, Hubert-Seweryn Lipowicz, Tzvetan Ivanov, Steve Lenk, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Valentyn Ishchuk, Ivaylo Atanasov, Yana Krivoshapkina, Manuel Hofer, Mathias Holz, Ivo Rangelow

Proceedings Volume 9423, 94230E (2015) https://doi.org/10.1117/12.2085846

KEYWORDS: Scanning probe lithography, Lithography, Optical lithography, Electron beam lithography, Optical alignment, Semiconducting wafers, Atomic force microscopy, Inspection, Imaging systems, Control systems

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Proceedings Article | 28 March 2014 Paper

Molecular glass resists for scanning probe lithography

Christian Neuber, Andreas Ringk, Tristan Kolb, Florian Wieberger, Peter Strohriegl, Hans-Werner Schmidt, Vincent Fokkema, Mike Cooke, Colin Rawlings, Urs Dürig, Armin Knoll, Jean-Francois de Marneffe, Peter De Schepper, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo Rangelow

Proceedings Volume 9049, 90491V (2014) https://doi.org/10.1117/12.2047108

KEYWORDS: Glasses, Etching, Scanning probe lithography, Lithography, Optical lithography, Silicon, Electron beam lithography, Polymers, Resistance, Photoresist processing

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Proceedings Article | 28 March 2014 Paper

Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever

Marcus Kaestner, Konrad Nieradka, Tzvetan Ivanov, Steve Lenk, Yana Krivoshapkina, Ahmad Ahmad, Tihomir Angelov, Elshad Guliyev, Alexander Reum, Matthias Budden, Tomas Hrasok, Manuel Hofer, Christian Neuber, Ivo Rangelow

Proceedings Volume 9049, 90490C (2014) https://doi.org/10.1117/12.2046973

KEYWORDS: Scanning probe lithography, Lithography, Electron beam lithography, Glasses, Software development, Control systems, Optical lithography, Manufacturing, Actuators, Scanners

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SPIE Journal Paper | 12 August 2013

Nanolithography by scanning probes on calixarene molecular glass resist using mix-and-match lithography

Marcus Kaestner, Manuel Hofer, Ivo Rangelow

JM3, Vol. 12, Issue 03, 031111, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031111

KEYWORDS: Scanning probe lithography, Electron beam lithography, Lithography, Optical lithography, Glasses, Extreme ultraviolet lithography, Nanolithography, Optical alignment, Atomic force microscopy, Inspection

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Proceedings Article | 26 March 2013 Paper

Mix & match electron beam & scanning probe lithography for high throughput sub-10 nm lithography

Marcus Kaestner, Manuel Hofer, Ivo Rangelow

Proceedings Volume 8680, 868019 (2013) https://doi.org/10.1117/12.2011535

KEYWORDS: Electron beam lithography, Scanning probe lithography, Lithography, Extreme ultraviolet lithography, Optical alignment, Inspection, Electron beams, Feedback loops, Glasses, Scanning electron microscopy

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Proceedings Article | 26 March 2013 Paper

0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography

Nataliya Vorbringer-Doroshovets, Felix Balzer, Roland Fuessl, Eberhard Manske, Marcus Kaestner, Andreas Schuh, Jens-Peter Zoellner, Manuel Hofer, Elshad Guliyev, Ahmad Ahmad, Tzvetan Ivanov , Ivo Rangelow

Proceedings Volume 8680, 868018 (2013) https://doi.org/10.1117/12.2012324

KEYWORDS: Scanning probe lithography, Lithography, Atomic force microscopy, Nanoelectronics, Optical lithography, Silicon, Inspection, Scanners, Optical alignment, Photomasks

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Proceedings Article | 26 March 2013 Paper

Scanning probe lithography approach for beyond CMOS devices

Zahid Durrani, Mervyn Jones, Marcus Kaestner, Manuel Hofer, Elshad Guliyev, Ahmad Ahmad, Tzvetan Ivanov, Jens-Peter Zoellner, Ivo Rangelow

Proceedings Volume 8680, 868017 (2013) https://doi.org/10.1117/12.2012199

KEYWORDS: Lithography, Silicon, Scanning probe lithography, Electrons, CMOS technology, CMOS devices, Nanoelectronics, Nanotechnology, Nanolithography, Nanocrystals

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Proceedings Article | 21 March 2012 Paper

Multi-step Scanning Probe Lithography (SPL) on calixarene with overlay alignment

M. Kaestner, I. Rangelow

Proceedings Volume 8323, 83231G (2012) https://doi.org/10.1117/12.916263

KEYWORDS: Lithography, Scanning probe lithography, Optical lithography, Optical alignment, Electron beam lithography, Inspection, Nanolithography, Feedback loops, Atomic force microscopy, Scanning tunneling microscopy

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Showing 5 of 13 publications

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