Mr. Martin Bloecker Profile

Martin Bloecker

at Advanced Mask Technology Ctr GmbH Co KG

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 25 September 2010 Paper

Multi-shaped e-beam technology for mask writing

Juergen Gramss, Arnd Stoeckel, Ulf Weidenmueller, Hans-Joachim Doering, Martin Bloecker, Martin Sczyrba, Michael Finken, Timo Wandel, Detlef Melzer

Proceedings Volume 7823, 782309 (2010) https://doi.org/10.1117/12.865708

KEYWORDS: Photomasks, Vestigial sideband modulation, Beam shaping, Metals, Lithography, Electron beam lithography, Optical proximity correction, Source mask optimization, Computational lithography, Integrated optics

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Metrics to assess fracture quality for variable shaped beam lithography

M. Bloecker, R. Gladhill, P. Buck, M. Kempf, D. Aguilar, R. Cinque

Proceedings Volume 6349, 63490Z (2006) https://doi.org/10.1117/12.686713

KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Beam shaping, Vestigial sideband modulation, Manufacturing, Electronic design automation, Optical proximity correction, Control systems, Electron beam lithography

Read Abstract +

Proceedings Article | 21 June 2006 Paper

Mask data volume: historical perspective and future requirements

Chris Spence, Scott Goad, Peter Buck, Richard Gladhill, Russell Cinque, Jürgen Preuninger, Üwe Griesinger, Martin Blöcker

Proceedings Volume 6281, 62810H (2006) https://doi.org/10.1117/12.692639

KEYWORDS: Optical proximity correction, Photomasks, Vestigial sideband modulation, Logic, SRAF, Reticles, Resolution enhancement technologies, Manufacturing, Metals, Data storage

Read Abstract +

Proceedings Article | 28 May 2003 Paper

Compensation of long-range process effects on photomasks by design data correction

Martin Bloecker, Gerd Ballhorn, Jens Schneider, Nikola Belic, Hans Eisenmann, Danny Keogan

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515122

KEYWORDS: Critical dimension metrology, Etching, Photomasks, Data corrections, Data modeling, Dry etching, Convolution, Chromium, Plasma etching, Chlorine

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Compensation of long-range process effects on photomasks by design data correction

Jens Schneider, Martin Bloecker, Gerd Ballhorn, Nikola Belic, Hans Eisenmann, Danny Keogan

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467572

KEYWORDS: Critical dimension metrology, Etching, Data corrections, Photomasks, Dry etching, Data modeling, Convolution, Plasma etching, Chromium, Computed tomography

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Advanced and highly reliably distributed computing in a fully automated environment

Gerd Ballhorn, Martin Bloecker, Danny Keogan, Peter Moberts

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467917

KEYWORDS: Computed tomography, Sun, Vestigial sideband modulation, Control systems, Explosives, Data processing, Computer aided design, Beam shaping, Data conversion, Distributed computing

Read Abstract +

Proceedings Article | 1 August 2002 Paper

Design flow automation for variable-shaped beam pattern generators

Martin Bloecker, Gerd Ballhorn

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476937

KEYWORDS: Computed tomography, Beam shaping, Raster graphics, Data conversion, Photomasks, Silver, Vestigial sideband modulation, Sun, Optical proximity correction, Electron beams

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years