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Dr. Matthew Hankinson
Lithography Programs Mktg Mgr at KLA Corp
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 24 May 2004 Paper
Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.538009
KEYWORDS: Scatterometry, Semiconducting wafers, Scatter measurement, Scanning electron microscopy, Critical dimension metrology, Metrology, Manufacturing, Electrodes, Data modeling, Capacitance
Proceedings Article | 29 April 2004 Paper
Yield loss in lithographic patterning at the 65nm node and beyond
Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.537349
KEYWORDS: Critical dimension metrology, Lithography, Semiconducting wafers, Process control, Spectroscopic ellipsometry, Metrology, Manufacturing, Overlay metrology, Photomasks, Resolution enhancement technologies
Proceedings Article | 16 July 2002 Paper
Microeconomics of advanced process window control for 50-nm gates
Kevin Monahan, Xuemei Chen, Georges Falessi, Craig Garvin, Matt Hankinson, Amir Lev, Ady Levy, Michael Slessor
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473503
KEYWORDS: Semiconducting wafers, Process control, Manufacturing, Information operations, Critical dimension metrology, Process modeling, Metrology, Etching, Lithography, Adaptive optics
Proceedings Article | 16 July 2002 Paper
Advanced process control of overlay with optimal sampling
Craig Garvin, Xuemei Chen, Matt Hankinson
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473528
KEYWORDS: Overlay metrology, Process modeling, Process control, Metrology, Error analysis, Statistical modeling, Statistical analysis, Control systems, Device simulation, Semiconducting wafers
Proceedings Article | 5 July 2000 Paper
Understanding the impact of full-field mask error factor
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389047
KEYWORDS: Reticles, Photomasks, Optical proximity correction, Binary data, Critical dimension metrology, Photoresist materials, Manufacturing, Deep ultraviolet, 193nm lithography, Optical lithography
Proceedings Volume Editor (1)
SPIE Conference Volume | 1 July 2003
Advanced Process Control and Automation
Conference Committee Involvement (4)
Data Analysis and Modeling for Patterning Control III
23 February 2006 | San Jose, California, United States
Data Analysis and Modeling for Process Control II
3 March 2005 | San Jose, California, United States
Data Analysis and Modeling for Process Control
26 February 2004 | Santa Clara, California, United States
Advanced Process Control and Automation
27 February 2003 | Santa Clara, CA, United States
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