Mr. Mikio Ishikawa Profile

Mikio Ishikawa

at Dai Nippon Printing Co Ltd

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 22 April 2011 Paper

EB resolution capability with CP exposure

Masaki Kurokawa, Hideaki Isobe, Kenji Abe, Yoshihisa Oae, Akio Yamada, Shogo Narukawa, Mikio Ishikawa, Hiroshi Fujita, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 8081, 80810A (2011) https://doi.org/10.1117/12.897272

KEYWORDS: Photomasks, Semiconducting wafers, Sensors, Quartz, Vestigial sideband modulation, Silicon, Signal detection, Image resolution, Resolution enhancement technologies, Electron beams

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Proceedings Article | 30 September 2009 Paper

6-inch circle template fabrication for patterned media using a conventional resist and new chemically amplified resists

Morihisa Hoga, Masaharu Fukuda, Tsuyoshi Chiba, Mikio Ishikawa, Kimio Itoh, Masaaki Kurihara, Nobuhito Toyama, Naoya Hayashi

Proceedings Volume 7488, 74881S (2009) https://doi.org/10.1117/12.833449

KEYWORDS: Silicon, Quartz, Photoresist processing, Nanoimprint lithography, Chemically amplified resists, Etching, Ultraviolet radiation, Photomasks, Thin films, Beam propagation method

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Proceedings Article | 11 May 2009 Paper

Developing quartz wafer mold manufacturing process for patterned media

Tsuyoshi Chiba, Masaharu Fukuda, Mikio Ishikawa, Kimio Itoh, Masaaki Kurihara, Morihisa Hoga

Proceedings Volume 7379, 73792Q (2009) https://doi.org/10.1117/12.824340

KEYWORDS: Quartz, Semiconducting wafers, Manufacturing, Etching, Nanoimprint lithography, Beam propagation method, Reactive ion etching, Semiconductors, Printing, Metrology

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Proceedings Article | 11 May 2009 Paper

Si-mold fabrication for patterned media using high-resolution chemically amplified resist

Masaharu Fukuda, Tsuyoshi Chiba, Mikio Ishikawa, Kimio Itoh, Masaaki Kurihara, Morihisa Hoga

Proceedings Volume 7379, 73790L (2009) https://doi.org/10.1117/12.824262

KEYWORDS: Silicon, Nanoimprint lithography, Adhesives, Chemically amplified resists, Electron beam lithography, Head-mounted displays, Line edge roughness, Scanning electron microscopy, Ultraviolet radiation, Photoresist processing

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Proceedings Article | 15 May 2007 Paper

Hybrid EB-writing technique with a 50 kV-VSB writer and a 100 kV-SB writer for nanoimprint mold fabrication

Mikio Ishikawa, Masashi Sakaki, Naoko Kuwahara, Hiroshi Fujita, Tadahiko Takikawa, Hisatake Sano, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 6607, 66073I (2007) https://doi.org/10.1117/12.729045

KEYWORDS: Double patterning technology, Nanoimprint lithography, Photomasks, Neodymium, Optical alignment, Chromium, Nanolithography, Fabrication, Scanning electron microscopy, Quartz

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Proceedings Article | 6 December 2004 Paper

CD-measurement technique for hole patterns on stencil mask

Mikio Ishikawa, Satoshi Yusa, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.575371

KEYWORDS: Photomasks, Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Charged-particle lithography, Optical lithography, Lithography, Silicon, Holons, Printing

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Proceedings Article | 20 August 2004 Paper

Evaluation of image placement of EPL stencil masks

Satoshi Yusa, Mikio Ishikawa, Yoshinori Kinase, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Houga, Naoya Hayashi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557774

KEYWORDS: Photomasks, Distortion, Semiconducting wafers, Data corrections, Image analysis, Data processing, Electron beams, Electron beam lithography, Projection lithography, Metrology

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Proceedings Article | 20 May 2004 Paper

200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield

Tadahiko Takikawa, Mikio Ishikawa, Satoshi Yusa, Yoshinori Kinase, Hiroshi Fujita, Morihisa Hoga, Naoya Hayashi, Hisatake Sano

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535108

KEYWORDS: Photomasks, Metrology, Distortion, Mask making, Electron beam lithography, Image quality, Electron beams, Projection lithography, Lithography, Optical lithography

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Proceedings Article | 17 December 2003 Paper

200-mm EPL stencil mask fabrication and metrology

Hiroshi Fujita, Tadahiko Takigawa, Mikio Ishikawa, Yu-ki Aritsuka, Satoshi Yusa, Morihisa Hoga, Hisatake Sano

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518034

KEYWORDS: Photomasks, Silicon, Etching, Scanning electron microscopy, Mask making, Optical lithography, Electron beam lithography, Image transmission, Metrology, Projection lithography

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Proceedings Article | 28 August 2003 Paper

Evaluation of a transmission CD-SEM for EB stencil masks

Mikio Ishikawa, Hiroshi Fujita, Morihisa Hoga, Hisatake Sano

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504237

KEYWORDS: Photomasks, Charged-particle lithography, Cadmium, Critical dimension metrology, Electron beam lithography, Projection lithography, Holons, Silicon, Electron beams, Sensors

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Showing 5 of 10 publications

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