CONFERENCE PROCEEDINGS
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Min Ah Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 21 November 2023 Presentation + Paper
PEC-aware MPC for CD quality improvement
Soeun Shin, Boram Lee, Sukho Lee, Eok bong Kim, Mina Kim, Jin Choi, Sanghee Lee, Yutaro Sato, Ahmad Syukri, Itaru Ono, Yohei Torigoe
Proceedings Volume 12751, 127510V (2023) https://doi.org/10.1117/12.2687866
KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Scattering, Modeling, Mathematical optimization, Algorithm development, Point spread functions, Lithography, Backscatter, Semiconductors
Proceedings Article | 16 September 2022 Paper
Status of curvilinear data format working group
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, Sanghee Lee, Peter Buck, Bhardwaj Durvasula, Sayalee Gharat, Vlad Liubich
Proceedings Volume 12325, 1232508 (2022) https://doi.org/10.1117/12.2641557
KEYWORDS: Photomasks, Optical proximity correction, Extreme ultraviolet, Optical lithography, Mask making
SPIE Journal Paper | 1 November 2021 Open Access
Study on various curvilinear data representations and their impact on mask and wafer manufacturing
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Peter Buck, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, Nageswara Rao, Ravi Pai, Sandeep Koranne, Alexander Tritchkov
JM3, Vol. 20, Issue 04, 041403, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041403
KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Semiconducting wafers, Manufacturing, Extreme ultraviolet, Vestigial sideband modulation, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography
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Proceedings Article | 22 February 2021 Presentation + Paper
Curvilinear data format working group for MBMW era
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Buck Peter, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, Nageswara Rao
Proceedings Volume 11610, 116100S (2021) https://doi.org/10.1117/12.2587109
KEYWORDS: Optical proximity correction, Mask making, Electronic design automation
Proceedings Article | 26 September 2019 Paper
Requirements of data technology for EUV photomask
Proceedings Volume 11148, 111480F (2019) https://doi.org/10.1117/12.2538411
KEYWORDS: Photomasks, Extreme ultraviolet, Data corrections, Extreme ultraviolet lithography, Optical lithography, Lithography, Modulation, Data processing, Ecosystems
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