Ms. Min Bai Profile

Min Bai

Senior R&D Engineer at Synopsys Inc

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Publications (7)

Proceedings Article | 15 March 2006 Paper

Hyper-NA model validation for the 45-nm node

Shane Palmer, Min Bai, Paul J. van Adrichem

Proceedings Volume 6155, 615505 (2006) https://doi.org/10.1117/12.656059

KEYWORDS: Data modeling, Optical proximity correction, Photomasks, Polarization, Semiconducting wafers, Fiber optic illuminators, Lithography, Silicon, Immersion lithography, Mathematical modeling

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Proceedings Article | 28 June 2005 Paper

A study for polarized illumination effects in photo resist

Junjiang Lei, Min Bai, Jim Shiely, Lin Zhang

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617220

KEYWORDS: Light sources, Lithographic illumination, Semiconducting wafers, Photomasks, Polarization, Thin films, Light, Fourier transforms, Lithography, Space operations

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Proceedings Article | 28 June 2005 Paper

Efficient modeling of immersion lithography in an aggressive RET mask synthesis flow

Min Bai, Junjiang Lei, Lin Zhang, James Shiely

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617228

KEYWORDS: Thin films, Semiconducting wafers, Resolution enhancement technologies, Optical proximity correction, Polarization, Immersion lithography, Photomasks, Light wave propagation, Lithography, Magnetism

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Proceedings Article | 12 May 2005 Paper

Hopkins equation in Hilbert space and its application in polarized illumination modeling

Junjiang Lei, Min Bai, Jim Shiely, Lin Zhang

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601196

KEYWORDS: Light sources, Lithography, Lithographic illumination, Optical lithography, Thin films, Fourier transforms, Polarization, Photomasks, Light, Semiconducting wafers

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Proceedings Article | 12 May 2005 Paper

Simulations of immersion lithography

Min Bai, Junjiang Lei, Lin Zhang, James Shiely

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601497

KEYWORDS: Thin films, Semiconducting wafers, Optical proximity correction, Polarization, Immersion lithography, Computer simulations, Reflection, Wafer-level optics, Process modeling, Optical lithography

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Proceedings Article | 6 May 2005 Paper

Approximation of three dimensional mask effects with two dimensional features

Min Bai, Lawrence Melvin, Qiliang Yan, James Shiely, Bradley Falch, Chong-Cheng Fu, Ruoping Wang

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600547

KEYWORDS: 3D modeling, Photomasks, Optical proximity correction, Calibration, Data modeling, Transmittance, Phase shifts, Reticles, Lithography, 3D metrology

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Proceedings Article | 18 December 1998 Paper

Resist charging in electron-beam lithography

Min Bai, Daniel Pickard, Corina Tanasa, Mark McCord, C. Neil Berglund, Roger Fabian Pease

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332874

KEYWORDS: Electron beams, Lithography, Optical spheres, Diffusion, Semiconducting wafers, Photomasks, Silicon, Electron beam lithography, Solids, Scattering

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Showing 5 of 7 publications

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