Dr. Ming Lu Profile

Dr. Ming Lu

Research Staff at Brookhaven National Lab

SPIE Involvement:

Author

Area of Expertise:

electron beam lithography , nanofabrication , plasma etching , x-ray optics , nanophotonics , OLED

Publications (13)

Proceedings Article | 5 October 2023 Presentation + Paper

A machine-learning-based approach for angular alignment of 2D multilayer Laue lenses for high-resolution hard x-ray microscopy

Wei Xu, Weihe Xu, Nathalie Bouet, Juan Zhou, Hanfei Yan, Xiaojing Huang, Lei Huang, Ming Lu, Maxim Zalalutdinov, Yong Chu, Evgeny Nazaretski

Proceedings Volume 12698, 1269803 (2023) https://doi.org/10.1117/12.2673688

KEYWORDS: Optical alignment, Optical surfaces, Interferometers, X-ray optics, Machine learning, Hard x-rays, Lenses, X-rays, X-ray microscopy, Equipment

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Proceedings Article | 30 April 2023 Presentation

Atomic layer deposition derived organic-inorganic hybrid EUV photoresists

Ashwanth Subramanian, Dan Le, Su Min Hwang, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 1249810 (2023) https://doi.org/10.1117/12.2658685

KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Atomic layer deposition, Photoresist materials, Electron beam lithography, Thin films, Silicon, Resistance, Polymethylmethacrylate, Photoresist processing

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Proceedings Article | 30 April 2023 Presentation

Hybrid positive-tone resist synthesis via vapor phase infiltration for contact-hole patterning

Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 124981A (2023) https://doi.org/10.1117/12.2658659

KEYWORDS: Optical lithography, Oxides, Metals, Polymer thin films, Nanolithography, Nanocomposites, Materials processing, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 11 November 2022 Presentation

EUVL characteristics of indium-oxide-infiltrated PMMA hybrid photoresist synthesized by vapor-phase infiltration

Ashwanth Subramanian, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume PC12292, PC122920L (2022) https://doi.org/10.1117/12.2643226

KEYWORDS: Extreme ultraviolet lithography, Polymethylmethacrylate, Photoresist materials, Silicon, Resistance, Indium oxide, Etching, Electron beam lithography, Dry etching, Plasma

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Proceedings Article | 13 June 2022 Presentation

Infiltration synthesis: paving way for uniquely functional hybrids and direct-writing optoelectronic nanostructures

Nikhil Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Aaron Stein, Chang-Yong Nam

Proceedings Volume PC12054, PC120540G (2022) https://doi.org/10.1117/12.2618064

KEYWORDS: Nanostructures, Optoelectronics, Thin films, Thin film devices, Polymers, Polymer thin films, Photoresist materials, Oxides, Optoelectronic devices, Microelectromechanical systems

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Proceedings Article | 22 February 2021 Presentation + Paper

Hybrid resist synthesis by ex-situ vapor-phase infiltration of metal oxides into conventional organic resists

Nikhil Tiwale, Ashwanth Subramanian, Guillaume Freychet, Eliot Gann, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 11612, 116120A (2021) https://doi.org/10.1117/12.2583908

KEYWORDS: Etching, Oxides, Metals, Extreme ultraviolet, Resistance, Optical lithography, Silicon, Scanning transmission electron microscopy, Plasma etching, Nanolithography

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Proceedings Article | 23 March 2020 Presentation + Paper

Infiltration synthesis of hybrid nanocomposite resists for advanced nanolithography

Nikhil Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Jiyoung Kim, Aaron Stein, Chang-Yong Nam

Proceedings Volume 11326, 113260J (2020) https://doi.org/10.1117/12.2552164

KEYWORDS: Etching, Electron beam lithography, Extreme ultraviolet lithography, Polymethylmethacrylate, Atomic layer deposition

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Proceedings Article | 9 September 2019 Paper

Focusing of hard x-rays with monolithic two-dimensional multilayer Laue lenses: technical challenges and current status

Weihe Xu, Wei Xu, Nathalie Bouet, Juan Zhou, Hanfei Yan, Xiaojing Huang, Ming Lu, Yong Chu, Evgeny Nazaretski

Proceedings Volume 11112, 111120O (2019) https://doi.org/10.1117/12.2527510

KEYWORDS: Lenses, Microelectromechanical systems, Optical alignment, Hard x-rays, X-ray optics, X-rays, X-ray microscopy, Zone plates

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SPIE Journal Paper | 14 September 2017 Open Access

External cavity cascade diode lasers tunable from 3.05 to 3.25 μm

Meng Wang, Takashi Hosoda, Leon Shterengas, Gela Kipshidze, Ming Lu, Aaron Stein, Gregory Belenky

OE, Vol. 57, Issue 01, 011012, (September 2017) https://doi.org/10.1117/12.10.1117/1.OE.57.1.011012

KEYWORDS: Semiconductor lasers, Quantum wells, Laser damage threshold, Quantum cascade lasers, Reflectivity, Waveguide lasers, Heterojunctions, Aluminum, Continuous wave operation, Waveguides

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Proceedings Article | 9 March 2017 Presentation + Paper

SWAD: transient conductivity and pulse-height spectrum

Jann Stavro, Amir Goldan, Ming Lu, Sébastien Léveillé, Wei Zhao

Proceedings Volume 10132, 1013208 (2017) https://doi.org/10.1117/12.2255733

KEYWORDS: Photon counting, Sensors, Monte Carlo methods, Selenium, Crystals, Semiconductors, X-ray imaging, Detector development, X-rays, Signal detection, Breast imaging, Electrodes, Signal attenuation, Prototyping, Luminescence

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SPIE Journal Paper | 24 July 2012

Plasma etch transfer of self-assembled polymer patterns

Danvers Johnston, Ming Lu, Charles Black

JM3, Vol. 11, Issue 3, 031306, (July 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031306

KEYWORDS: Etching, Plasma etching, Polymers, Plasma, Optical lithography, Silicon, Polymethylmethacrylate, Scanning electron microscopy, Thin films, Reactive ion etching

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Proceedings Article | 17 March 2012 Paper

Plasma etch transfer of self-assembled polymer patterns

Danvers Johnston, Ming Lu, Charles Black

Proceedings Volume 8328, 83280A (2012) https://doi.org/10.1117/12.920311

KEYWORDS: Etching, Plasma etching, Polymers, Plasma, Optical lithography, Silicon, Thin films, Polymethylmethacrylate, Oxygen, Image processing

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Proceedings Article | 10 September 2008 Paper

Fabrication of high-aspect-ratio hard x-ray zone plates with HSQ plating molds

Ming Lu, Leonidas Ocola, Ralu Divan, Derrick Mancini

Proceedings Volume 7039, 70390V (2008) https://doi.org/10.1117/12.796839

KEYWORDS: Zone plates, Gold, Electron beam lithography, Plating, Hard x-rays, X-rays, Photoresist processing, Reactive ion etching, Electroplating, Etching

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Showing 5 of 13 publications

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