Dr. Mohammad Ramezani Profile

Dr. Mohammad Ramezani

at TeraNova BV

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 4 October 2024 Presentation

Superior quality NIL wafer scale patterning using SCIL technology

Marc Verschuuren, Bradley Williams, Mohammad Mohammad Ramezani, Gert-Jan Hurxkens, Jeroen Visser, Marta Martinez Moro, Rob Voorkamp

Proceedings Volume PC13116, PC1311608 (2024) https://doi.org/10.1117/12.3028244

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Optical lithography, Optical alignment, Etching, Ultraviolet radiation, Sol gels, Quantum processes, Nanostructures, Composites

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Proceedings Article | 10 April 2024 Presentation

The FabSCIL platform: 200 and 300mm full wafer NIL for nanophotonics

Marc Verschuuren, Bradley Williams, Mohammad Ramezani, Robert van de Laar, Jeroen Visser, Gert-Jan Hurxkens, Rob Voorkamp

Proceedings Volume PC12956, PC1295609 (2024) https://doi.org/10.1117/12.3003683

KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Nanophotonics, Wafer-level optics, Scatterometry, Refractive index, Optical alignment, Metalenses, Etching, Reproducibility

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Proceedings Article | 30 April 2023 Presentation

The FabSCIL platform: 200 and 300mm double side full wafer NIL

Marc Verschuuren, Rob Voorkamp, Mohammad Ramezani, Gert-Jan Hurxkens, Jeroen Visser

Proceedings Volume PC12497, PC1249709 (2023) https://doi.org/10.1117/12.2658052

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Refractive index, Wafer-level optics, Optical lithography, Objectives, Materials processing, Diffraction, 3D modeling, Waveguides

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Proceedings Article | 16 March 2023 Presentation + Paper

SCIL nanoimprint solutions, turning your surfaces into functions: direct patterning of nano-photonics

Marc Verschuuren, Rob Voorkamp, Jeroen Visser, Mohammad Ramezani

Proceedings Volume 12449, 124490A (2023) https://doi.org/10.1117/12.2655366

KEYWORDS: Optical gratings, Semiconducting wafers, Refractive index, Nanoimprint lithography, Nanophotonics, Scatterometry, Sol gels, Optical lithography, Metalenses

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Nano-photonic applications are on the brink of disrupting the optics we know. Examples are augmented reality glasses based on diffractive waveguide combiners (DWC) using surface relief gratings and meta-lenses consisting of high aspect ratio pillars. The challenge will be fabricating 100’s of millions of these large area devices with high yield and low cost. In this paper we will demonstrate the direct replication of nano-photonic patterns using a nanoimprint method in combination with inorganic functional optical resist materials. SCIL Nanoimprint solutions always developed the materials, processes and nanoimprint hardware as an integral system for optimal results. The same imprint technology scales from 100mm up to 300mm wafers. A unique approach of SCIL is to directly pattern inorganic materials with single-nm precision and keep this accuracy for over the full stamp lifetime. For nanophotonic applications the direct replication of nano-patterning in materials with a high refractive index (1.7 – 2.0) is highly desired. With this slow and expensive process steps such as optical- and hard mask layer deposition and reactive ion etching of these materials after the lithography step can be omitted. As another example augmented reality glasses with a high efficiency require 3 slanted gratings with varying orientations, resulting in 2 additional lithography and etching steps. We will show the direct nanoimprint patterning of slanted gratings in all orientations with a refractive index up to n=1.92 (@550nm). For these nano-photonic devices to work within specification, the absolute size of the patterns needs to be within 1-5nm variation and the refractive index to be controlled to the 3rd decimal (depending on the application). To verify the full nanoimprint production process in a close-coupled manner a fast non-destructive test method based on Fourier imaging scatterometry will be introduced. This method can determine the relevant sub-micron feature sizes with single nmprecision.

Proceedings Article | 15 March 2023 Poster + Paper

Large-area scatterometry for nanoscale metrology

Jaime Gómez Rivas, Mohammad Ramezani, Marc Verschuuren, Gabriel Castellanos

Proceedings Volume 12433, 124330I (2023) https://doi.org/10.1117/12.2649342

KEYWORDS: Optical gratings, Scatterometry, Polarization gratings, Diffraction gratings, Nanoimprint lithography, Optical microscopes, Metrology, Data modeling

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Proceedings Article | 1 August 2021 Presentation

Exciton-Polaritons with magnetic and electric character in all-dielectric metasurfaces

Gabriel Castellanos, Shunsuke Murai, T.V. Raziman, Mohammad Ramezani, Shaojun Wang, Alberto Curto, Jaime Gómez Rivas

Proceedings Volume 11795, 117951R (2021) https://doi.org/10.1117/12.2595779

KEYWORDS: Magnetism, Nanoparticles, Dielectrics, Excitons, Silicon, Refractive index, Quasiparticles, Optical resonators, Natural surfaces, Molecules

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Proceedings Article | 5 March 2021 Presentation + Paper

SCIL wafer scale direct nanoimprint for nanophotonic components and fast optical quality inspection with single nm resolution

Marc Verschuuren, Teun Nevels, Mohammad Ramezani, Jeroen Visser, Rob Voorkamp

Proceedings Volume 11696, 116960U (2021) https://doi.org/10.1117/12.2577310

KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Inspection, Wafer-level optics, Nanophotonics, Optical inspection, Silicon, Objectives, Sol-gels, Silica

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Proceedings Article | 22 February 2021 Presentation

SCIL nanoimprint: wafer scale overlay alignment and single nm reproductibility by Fourrier scatterometry

Marc Verschuuren, Teun Nevels, Mohammad Ramezani, Jeroen Visser, Rob Voorkamp

Proceedings Volume 11610, 1161009 (2021) https://doi.org/10.1117/12.2583654

KEYWORDS: Semiconducting wafers, Optical alignment, Nanoimprint lithography, Scatterometry, Overlay metrology, Silicon, Silica, Objectives, Nanophotonics, Inspection

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Showing 5 of 8 publications

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