High Performance Single Nanometer Lithography (SNL) is an enabling technology for beyond CMOS and future
nanoelectronics. To keep on with scaling down nanoelectronic components, novel instrumentation for nanometer precise
placement, overlay alignment and measurement are an essential pre-requirement to realize Next Generation Lithography
(NGL) systems. In particular, scanning probe based methods for surface modification and lithography are an emerging
method for producing sub-10 nm features. In this study, we demonstrate nano-scale lithography using a scanning probe
based method in combination with a Nanopositioning and Nanomeasuring Machine. The latter one has a measuring
range of 25 mm x 25 mm x 5 mm, 0.1 nanometer resolution and outstanding nanometer accuracy. The basic concept
consists of a special arrangement allowing Abbe error free measurements in all axes over the total scan range.
Furthermore, the Nanopositioning and Nanomeasuring Machine is able to store the exact location that can be found again
with an accuracy of less than 2.5 nanometers. This system is also predestinated for critical dimension, quality and
overlay control. The integrated scanning probe lithography is based on electric-field-induced patterning of calixarene. As
a result, repeated step response tests are presented in this paper.
Dimensional measurements of microstructures with uncertainties below 50nm require both nanopositioning and
nanomeasuring machines (NPMMs) as well as appropriate microprobes. This paper introduces a novel 3-D tactile
microprobe system developed at the Ilmenau University of Technology, Institute of Process Measurement and
Sensor Technology, and contains an analysis of its metrological characteristics.
This microprobe system uses a silicon membrane to induce the measurement force and to operate as the
damping system for the stylus. This damping is entirely brought about by internal friction. An optical detection
system measures the deflection of the membrane and thus of the stylus. The optical detection system uses a
single laser beam, focused on the backside of the silicon membrane. The reflected beam is split, with one part
being used to measure the tilt about the x- and y-axes and the other part being fed back into an interferometer
for deflection measurement in the z-direction. Thus, the deflection of the membrane can be measured with
sub-nanometre resolution.
An NPMM was used to analyse the metrological characteristics of the microprobe system and to calibrate
it. This paper focuses on a detailed analysis of the three-dimensional reproducibility for point measurements
by obtaining and evaluating a directional response pattern. This pattern is then compared to the behaviour of
other microprobe systems. Furthermore, the work shows that the microprobe system can be applied successfully
to scanning measurements and satisfactory results obtained. These results indicate that the microprobe system
is well-suited for universal measurement tasks in dimensional metrology.
A proprietary metrological scanning probe microscope (SPM) with an interferometer, developed by the Institute of
Process Measurement and Sensor Technology at the Ilmenau University of Technology (IPMS), is used as a stationary
probe system in the nanomeasuring and nanopositioning machine (NPMM). Due to the movements of the NPMM, the
total microscope measuring range is 25mm × 25mm × 5mm with a positioning resolution of less than 0.1nm. Examples
for specimens are step height standards and one-dimensional gratings. The repeatability has been determined at less than
0.5nm for measurements on calibrated step height standards and less than 0.2nm for the gratings. The measurement
results of these samples are always directly related to the corresponding measurement uncertainty, which can be
calculated using an uncertainty budget. A new traceable method has been developed using a vectorial modular model.
With this approach, it is possible to quickly insert new sub-models and to individually analyze their effects on the total
measurement uncertainty. The analysis of these effects with regard to their uncertainties is done by Monte Carlo
Simulation (MCS), because some models have partially or fully nonlinear character of which one example is the
interferometer model of the metrological SPM. The complete development and analysis of these models is presented for
one specific measurement task. The measurement results and the corresponding measurement uncertainty were obtained
by Monte Carlo Simulation. Comparisons with the GUM have shown that the proposed procedure is a good alternative to
achieve reasonable measurement results with uncertainty estimation.
This paper presents measurements of calibrated step height and pitch standards using a homodyne interferometer-based
metrological scanning probe microscope (SPM) and a nanopositioning and nanomeasuring machine (NPM machine).
These devices were developed at the Institute of Process Measurement and Sensor Technology of the Technische
Universität Ilmenau. Together these devices are capable of highly exact dimensional and traceable long-range
positioning and measurement with a resolution of 0.1 nm over the positioning and measurement range of
25 mm × 25 mm × 5 mm.
Measurements of different calibrated step height and pitch standards were completed in order to test the
repeatability and accuracy of the metrological SPM. The deviations between the calibrated and measured values were
smaller than the uncertainty values determined by the Physikalisch-Technische Bundesanstalt (PTB) calibration. The
extended uncertainty of the measurement results (step height or mean pitch value) was less than 1 nm.
Precision mechatronics is defined in the paper as the science and engineering of a new generation of high precision systems and machines. Nanomeasuring and nanopositioning engineering represents important fields of precision mechatronics. The nanometrology is described as the today's limit of the precision engineering. The problem, how to design nanopositioning machines with uncertainties as small as possible will be discussed. The integration of several optical and tactile nanoprobes makes the 3D-nanopositioning machine suitable for various tasks, such as long range scanning probe microscopy, mask and wafer inspection, nanotribology, nanoindentation, free form surface measurement as well as measurement of microoptics, precision molds, microgears, ring gauges and small holes.
The paper describes traceable nanometrology based on a nanopositioning machine with integrated nanoprobes. The operation of a high-precision long range three-dimensional nanopositioning and nanomeasuring machine (NPM-Machine) having a resolution of 0,1 nm over the positioning and measuring range of 25 mm x 25 mm x 5 mm is explained. An Abbe offset-free design of three miniature plan mirror interferometers and applying a new concept for compensating systematic errors resulting from mechanical guide systems provide very small uncertainties of measurement. The NPM-Machine has been developed by the Institute of Process Measurement and Sensor Technology of the Technische Universitaet Ilmenau and manufactured by the SIOS Messtechnik GmbH Ilmenau. The machines are operating successfully in several German and foreign research institutes including the Physikalisch-Technische Bundesanstalt (PTB), Germany. The integration of several, optical and tactile probe systems and nanotools makes the NPM-Machine suitable for various tasks, such as large-area scanning probe microscopy, mask and wafer inspection, nanostructuring, biotechnology and genetic engineering as well as measuring mechanical precision workpieces, precision treatment and for engineering new material. Various developed probe systems have been integrated into the NPM-Machine. The measurement results of a focus sensor, metrological AFM, white light sensor, tactile stylus probe and of a 3D-micro-touch-probe are presented. Single beam-, double beam- and triple beam interferometers built in the NPM-Machine for six degrees of freedom measurements are described.
Many scanning probe microscopes (SPMs) are used as image acquisition tools in such industries as microelectronics, micromechanics, lithography and biotechnology. Conventional SPMs use piezoelectric actuators in order to move either the sample or the probe. The voltage across the piezos is taken as a position indicator. However, it is known that piezos suffer from hysteresis, and from time- and temperature-dependent creep. A solution to this problem is provided by accurate, traceable measurement of the cantilever position. An exact dimensional measurement can only take place via direct comparison with a well-known reference. The traceability of the SPM can be achieved using an interferometer, traceable to the 633 nm wavelength of the He-Ne laser. For accurate measurements the position of the cantilever must be measured in addition to the torsion and bending.
This article shows the basic SPM principle as well as the addition of a cantilever position detection system. This system has been realized with a special interferometer with a quadrant diode to detect the cantilever torsion and bending. The measuring beam is focused on the cantilever backside using a lens. The reflected laser beam is split and evaluated; one part of the beam is used for the interferometrical position measurement with the other part focused onto a quadrant diode. Due to the structure of the interferometrical SPM, it can be installed in many different positioning systems with large measuring ranges, including a nanopositioning and nanomeasuring machine (NPM machine), developed at the Institute of Process Measurement and Sensor Technology of the Technische Universitaet Ilmenau.
Today's technological progress calls for metrologically accurate object measurement, positioning and scanning with nanometre precision and over large measuring ranges. In order to meet that requirement a nanopositioning and nanomeasuring machine (NPM machine) was developed at the Institute of Process Measurement and Sensor Technology of the Technische Universitaet Ilmenau. This device is capable of highly exact long-range positioning and measurement of objects with a resolution of less than 0.1 nm. Due to the structure of the machine many different probe systems can be
installed, including scanning probe microscopes (SPMs). A few SPMs have outstanding metrological characteristics and many commercial microscopes only perform as image acquisition tools. Commercial SPMs use piezoelectric actuators in order to move either the sample or the probe. The position measurement sometimes results from the applied voltage to the piezoelectric actuators or from the strain gauge or capacitive displacement sensor data. This means that they suffer from hysteresis, creep, nonlinear characteristics and Abbe offsets. For an accurate measurement the position of the cantilever must be measured in addition to the torsion and bending. The best solution is a combined detection system with a single laser beam. This system has been realized with a special interferometer system, in which the measuring beam is focused on the cantilever backside using a lens. The reflected beam is split with a part being detected by a quadrant photo-diode and the other part being fed back into the
interferometer for position measurement. The quadrant photo-diode is used to detect the cantilever torsion and bending.
This article deals with a high-precision three-dimensional positioning and measuring machine and its application as a metrological long-range scanning force microscope. At the Institute of Process Measurement and Sensor Technology of the Technische Universitaet Ilmenau an interferometric nanopositioning and nanomeasuring machine has been developed. Which is able to achieve a resolution of less than 0.1 nm over the entire positioning and measurement range of 25 mm x 25 mm x 5 mm and is traceable to the length standard. The Abbe offset-free design in conjunction with a corner mirror as a reference coordinate system provides extraordinary accuracy. The integration of several probe systems and nanotools (AFM, STM, focus sensor, tactile probes) makes the nanopositioning and nanomeasuring machine suitable for various tasks in the micro- and nanotechnologies. Various probe systems have been integrated in the last few years. For example, a commercial piezo tube AFM was integrated and tested. Additionally, interferometeric measurement systems of the nanopositioning and nanomeasuring machine enables the calibration of probe systems. Also in order to achieve the best possible measurement results special probe systems have been developed and tested and are discussed briefly.
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