Dr. Nicholas G. Doe Profile

Dr. Nicholas G. Doe

Systems Engineer at Technical Instrument

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Author

Publications (5)

Proceedings Article | 16 August 2002 Paper

Long-term performance of the DUV optical metrology tool for the 90-nm node

Louis Chacon, Nicholas Doe, Richard Eandi, Patrick St. Cin

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479347

KEYWORDS: Optical metrology, Metrology, Photomasks, Deep ultraviolet, Distortion, Wafer-level optics, Lithography, Argon ion lasers, Modulation, Semiconducting wafers

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Proceedings Article | 16 July 2002 Paper

DUV optical metrology for the 90-nm node, CD linearity, contacts, and corner rounding

Louis Chacon, Nicholas Doe, Richard Eandi, Patrick St. Cin

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473474

KEYWORDS: Lenses, Photomasks, Deep ultraviolet, Optical metrology, Metrology, Optical proximity correction, Algorithm development, Imaging systems, Modulation transfer functions, Critical dimension metrology

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Proceedings Article | 11 March 2002 Paper

New algorithm for optical photomask CD metrology for the 100-nm node

Nicholas Doe, Richard Eandi, Patrick St. Cin

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458295

KEYWORDS: Critical dimension metrology, Metrology, Photomasks, Imaging systems, Modulation transfer functions, Deep ultraviolet, Optics manufacturing, Optical metrology, Binary data, Calibration

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Proceedings Article | 3 February 2000 Paper

Optical proximity effects in submicron photomask CD metrology

Nicholas Doe, Richard Eandi

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377105

KEYWORDS: Optical transfer functions, Critical dimension metrology, Photomasks, Imaging systems, Calibration, Spatial frequencies, Modulation, Metrology, Data modeling, Modulation transfer functions

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Proceedings Article | 27 December 1996 Paper

Evaluation of a new photomask CD metrology tool

Leonard Dubuque, Nicholas Doe, Patrick St. Cin

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262804

KEYWORDS: Photomasks, Critical dimension metrology, Metrology, Tolerancing, Electronics, Environmental sensing, Pattern recognition, Optics manufacturing, Calibration, Lithium

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