Stephen Milton, N. Arnold, Christa Benson, S. Berg, William Berg, Sandra Biedron, Y. Chae, E. Crosbie, G. Decker, B. Deriy, Roger Dejus, Pat Hartog, R. Dortwegt, M. Erdmann, Zhirong Huang, H. Friedsam, Henry Freund, J. Galayda, Efim Gluskin, G. Goeppner, A. Grelick, J. Jones, Y. Kang, Kwang Kim, S. Kim, Kim Kinoshita, B. Lill, John Lewellen, Alex Lumpkin, G. Markovich, Oleg Makarov, E. Moog, A. Nassiri, V. Ogurtsov, S. Pasky, J. Power, Brian Tieman, Emil Trakhtenberg, Gil Travish, I. Vasserman, Nikolai Vinokurov, D. Walters, Jin Wang, Xi Wang, Bingxin Yang, Shenglan Xu
KEYWORDS: Free electron lasers, Diagnostics, Light sources, Electron beams, Ultraviolet radiation, Vacuum ultraviolet, X-rays, Medium wave, S band, Copper
Construction of a single-pass free-electron laser (FEL) based on the self-amplified spontaneous emission (SASE) mode of operation is nearing completion at the Advanced Photon Source (APS) with initial experiments imminent. The APS SASE FEL is a proof-of-principle fourth-generation light source. As of January 1999 the undulator hall, end-station building, necessary transfer lines, electron and optical diagnostics, injectors, and initial undulators have been constructed and, with the exception of the undulators, installed. All preliminary code development and simulations have also been completed. The undulator hall is now ready to accept first beam for characterization of the output radiation. It is the project goal to push towards full FEL saturation, initially in the visible, but ultimately to UV and VUV, wavelengths.
The use of the X-ray lithography to produce blazed diffractive optical elements (DOEs) is described. The proposed method allows one to make highly efficient blazed DOE with a deep phase profile (ten wavelengths and more) using a single X-ray mask with a binary transmission pattern. Unlike the well-known multilevel DOEs, blazed ones do not involve fabrication and aligning of a set of masks. DOEs with a profile depth of 10 micrometers and more and zone sizes of down to 1 micrometers can be obtained due to the short wavelength and high penetrability of X- rays. The first experimental samples of blazed DOEs with a 10 micrometers -height profile (lenses and gratings) were fabricated by X-ray lithography with synchrotron radiation using the X-ray masks, prepared in accordance with the pulse-width modulation algorithm. Diffraction efficiency for lenses was measured for white light. It is higher than 80 percent for the central part of the lenses (inside a 10 mm diameter) and about 60 percent for an area of 20 mm diameter.
G. Kulipanov, Oleg Makarov, Lubov Mezentseva, S. Mishnev, Vladimir Nazmov, Valery Pindyurin, A. Skrinsky, L. Artamonova, G. Cherkov, V. Gashtold, V. Prokopenko, Vladimir Chesnokov, Elena Reznikova
The X-ray lithography with synchrotron radiation at the VEPP-3 storage ring was applied for fabrication of polymer microstructures with submicron sizes of elements and with rather high aspect ratio (up to 20). The microstructures are the regular microporous membranes with pores of 0.3-0.5 micrometers in diameter arranged with a 1 micrometers spacing. The membranes were fabricated on a base of 2.5, 3, 6 and 10 micrometers thick mylar films. In contrast to the commercial track membranes with random pore locations, the regular membranes have no dispersion of pore sizes caused by confluence of adjoining pores. The fabricated membranes have a porosity of 10-20 percent and this value can be increased up to 50 percent and higher by using an X-ray mask with an appropriate pattern. The results of the membrane examination by different techniques are presented. Possible improvements of the membrane parameters and some potential applications of the membranes are discussed as well.
Vyacheslav Kochubey, Konsuella Gyunsburg, Yuliya Sedova, Nina Zvezdova, D. Kochubey, I. Dolbnya, G. Kulipanov, V. Lyakh, Oleg Makarov, Valery Pindyurin
The new silverless radiophotoluminescence substances - a single alkaly- halide crystals (nondoped and doped by In +2 ) are proposed and tested as X-ray image detectors. Their spatial resolution is not worse than 2 pm and they allow detection of pictures in X-rays with a dynamic range of about I 0 000. A stored X-ray image can be read out many times by photoluminescence measurements under UV excitation. The image can be erased completely by heating ofphosphor at a temperature of 400 °C during a half an hour. Unique combination of the resolution and the dynamic range of lyminosity offers sample scope for x-ray microscopy under biology.
Keywords: X-ray microscopy, radiophotoluminescence, alkaly- halide crystals
X-ray lithography with synchrotron radiation was applied for formation of the Fresnel zone structure profile onto a curved surface of a refractive polymer lens to achieve multifocus properties of the lens. First prototypes of the hybrid refractive-diffractive lens were fabricated in such a way and their optical properties were investigated. Some possibilities for creation of diffraction apochromatic optical elements are considered as well.
The use of laser-induced chemical vapor deposition (LCVD) of chromium and rhenium film patterns for reporting of photomask defects and LCVD of rhenium, gold and platinum film pattern for repairing similar defects of X-ray masks was demonstrated. Initial compounds were Cr(CO)6, Re2(CO)10, Me2Au(dpm) and Pt(hfa)2. The high marginal sharpness and the thickness uniformity of deposited films was provided by the use of powerful nanosecond pulse laser, the protective system for a delineation of a irradiation zone and the laser beam microscanning in limits of this zone. The scheme of the set for the direct laser deposition of film micropatterns was presented.
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