Mr. Paolo Alagna Profile

Paolo Alagna

Project Manager - Memory Division

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 25 March 2020 Presentation

Multi-focal imaging for improved depth of focus; principles and application to ArFi use cases (Conference Presentation)

Will Conley, Josh Thornes, Paolo Alagna, Omar Zurita, Kuo-Tai Teng, Stephen Hsu, Xiang-ru Xu, Sam Liu

Proceedings Volume 11327, 113270P (2020) https://doi.org/10.1117/12.2552505

Read Abstract +

Over the years, lithography engineers have continued to focus on CD control, overlay and process capability to meet node requirements for yield and device performance. The use of ArFi lithography for advanced process nodes demands challenging patterning budget improvements in the sub-nm range.1 In 3D NAND devices, the height differences between the cell and periphery create issues with the ability to adequately image and maintain a useable process window in both regions. Previous work by Fukuda2 developed a multi-exposure technique at multi-focus positions to image contact holes with adequate DOF. Lalovic3 demonstrated a fixed 2 wavelength technique to improve DOF called RELAX. ASML introduced EFESE Rx, a method of tilting the stage during exposure to create multiple focus positions and finally Lalovic4 introduced a broadband laser solution to provide additional DOF. All of these techniques suffered from a number of problems that limited usability. In this work the authors will introduce a new method to increase DOF through alternating wavelength’s from an ArFi light source. This technique, called MFI (multi-focal imaging), can be tuned specifically to provide the required amount of wavelength separation for a specific DOF need. Two focal positions are created that are averaged over the exposure field. The authors will review this wavelength “dithering” approach which can be turned on and off, thus eliminating any potential scanner calibration issues. Initial simulation studies with a fixed source and mask indicated increased DOF with wavelength separation. These DOF improvements have been confirmed with on-wafer single-exposure data. The Tachyon MFI aware engine flow will be reviewed using several customer use cases that have been analyzed to demonstrate maximum DOF and ILS vs wavelength separation. The authors will also review the optimization of new pupils and OPC solutions that are unique with each wavelength separation case and maximize process capability. The presentation will close with a product availability timeline and roadmap.

Proceedings Article | 20 March 2018 Presentation + Paper

Tunable bandwidth for application-specific SAxP process enhancement

Paolo Alagna, Will Conley, Greg Rechtsteiner, Kathleen Nafus, Serge Biesemans, Gian Francesco Lorusso

Proceedings Volume 10587, 1058705 (2018) https://doi.org/10.1117/12.2300511

KEYWORDS: Light sources, Line width roughness, Semiconducting wafers, Optical lithography, Metrology, Line edge roughness, Etching, Lithography, Temporal coherence

Read Abstract +

Proceedings Article | 1 May 2017 Paper

Assessment of light source bandwidth impacts on image contrast enhancement using process window discovery

Paolo Alagna, Greg Rechtsteiner, Will Conley, Andrew Cross, Kaushik Sah, Sandip Halder

Proceedings Volume 10147, 101471X (2017) https://doi.org/10.1117/12.2260314

KEYWORDS: Light sources, Deep ultraviolet, Optical lithography, Image contrast enhancement, Semiconductors, Immersion lithography, Scanners, Inspection, Modulation, Semiconducting wafers

Read Abstract +

Proceedings Article | 30 March 2017 Presentation + Paper

Image contrast enhancement of multiple patterning features through lower light source bandwidth

Paolo Alagna, Will Conley, Greg Rechtsteiner, Kathleen Nafus, Serge Biesemans

Proceedings Volume 10147, 101470N (2017) https://doi.org/10.1117/12.2263228

KEYWORDS: Optical lithography, Light sources, Lithography, Immersion lithography, Semiconductors, Image contrast enhancement, Deep ultraviolet, Semiconductor manufacturing, Manufacturing, Double patterning technology, Optical proximity correction, Semiconducting wafers, Photomasks, Metrology, Source mask optimization

Read Abstract +

Proceedings Article | 30 March 2017 Presentation + Paper

The impact of lower light source bandwidth on sub-10nm process node features

Will Conley, Paolo Alagna, Jason Shieh, Simon Hsieh, Tsann-Bim Chiou, Stephen Hsu, Greg Rechtsteiner

Proceedings Volume 10147, 1014707 (2017) https://doi.org/10.1117/12.2260210

KEYWORDS: Light sources, Process control, Image processing, Source mask optimization, Lithography, Critical dimension metrology, Optical proximity correction, Control systems, Overlay metrology, Optical lithography, Eye, Metrology, Electroluminescence

Read Abstract +

Proceedings Article | 23 March 2016 Paper

Impact of bandwidth variation on OPC model accuracy

Will Conley, Paolo Alagna, Stephen Hsu, Qian Zhao

Proceedings Volume 9780, 97800K (2016) https://doi.org/10.1117/12.2219892

KEYWORDS: Optical proximity correction, Critical dimension metrology, Optical lithography, Lithography, Control systems, Process control, Light sources, Overlay metrology, Manufacturing, Source mask optimization, Data modeling, Panoramic photography, Semiconducting wafers, Scanners

Read Abstract +

Proceedings Article | 16 March 2016 Paper

Lower BW and its impact on the patterning performance

Paolo Alagna, Greg Rechtsteiner, Vadim Timoshkov, Patrick Wong, Will Conley, Jan Baselmans

Proceedings Volume 9780, 978008 (2016) https://doi.org/10.1117/12.2219945

KEYWORDS: Optical lithography, Light sources, Lithography, Deep ultraviolet, Data modeling, Electroluminescence, Logic, Metals, Optical proximity correction, Etching

Read Abstract +

Proceedings Article | 4 September 2015 Paper

Advanced process characterization of a 10nm Metal 1 Logic layer using light source modulation and monitoring

Paolo Alagna, Omar Zurita, Vadim Timoshkov, Patrick Wong, Greg Rechtsteiner, Jan Baselmans, Julien Mailfert, Will Conley, Simon Hsieh

Proceedings Volume 9661, 966105 (2015) https://doi.org/10.1117/12.2196862

KEYWORDS: Light sources, Semiconducting wafers, Optical lithography, Critical dimension metrology, Logic, Line width roughness, Optical proximity correction, Metals, Scanners, Modulation

Read Abstract +

Proceedings Article | 18 March 2015 Paper

Impact of bandwidth on contrast sensitive structures for low k1 lithography

Will Conley, Simon Hsieh, Paolo Alagna, Yaching Hou, Pedro Martinez

Proceedings Volume 9426, 942607 (2015) https://doi.org/10.1117/12.2085826

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanners, Lithography, Control systems, Yield improvement, Optical proximity correction, Overlay metrology, Process control, Metals

Read Abstract +

Proceedings Article | 18 March 2015 Paper

Advanced process characterization using light source performance modulation and monitoring

Paolo Alagna, Omar Zurita, Gregory Rechtsteiner

Proceedings Volume 9426, 94261D (2015) https://doi.org/10.1117/12.2085838

KEYWORDS: Optical lithography, Modulation, Light sources, Semiconducting wafers, Lithography, Wafer-level optics, Neodymium, Light, Polarization, Metrology

Read Abstract +

Proceedings Article | 18 March 2015 Paper

Optimum ArFi laser bandwidth for 10nm node logic imaging performance

Paolo Alagna, Omar Zurita, Vadim Timoshkov, Patrick Wong, Gregory Rechtsteiner, Jan Baselmans, Julien Mailfert

Proceedings Volume 9426, 942609 (2015) https://doi.org/10.1117/12.2085823

KEYWORDS: Optical lithography, Logic, Semiconducting wafers, Line width roughness, Light sources, Photomasks, Optical proximity correction, Lithography, Process control, Critical dimension metrology

Read Abstract +

Proceedings Article | 4 April 2014 Paper

Improving on-wafer CD correlation analysis using advanced diagnostics and across-wafer light-source monitoring

Paolo Alagna, Omar Zurita, Gregory Rechtsteiner, Ivan Lalovic, Joost Bekaert

Proceedings Volume 9052, 905228 (2014) https://doi.org/10.1117/12.2047449

KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Modulation, Lithography, Metrology, Wafer-level optics, Scatterometry, Double patterning technology, Photomasks

Read Abstract +

Proceedings Article | 12 April 2013 Paper

Lithography imaging control by enhanced monitoring of light source performance

Paolo Alagna, Omar Zurita, Ivan Lalovic, Nakgeuon Seong, Gregory Rechsteiner, Joshua Thornes, Koen D'havé, Lieve Van Look , Joost Bekaert

Proceedings Volume 8683, 86830S (2013) https://doi.org/10.1117/12.2013213

KEYWORDS: Semiconducting wafers, Lithography, Optical lithography, Metrology, Polarization, Light sources, Critical dimension metrology, Scanners, Control systems, Lithographic illumination

Read Abstract +

Showing 5 of 13 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years