Ms. Patricia Marmillion Profile

Patricia Marmillion

Project Engineer

SPIE Involvement:

Author

Proceedings Article | 2 May 2008 Paper

Mask industry assessment trend analysis

Gilbert Shelden, Patricia Marmillion, Greg Hughes

Proceedings Volume 6792, 679202 (2008) https://doi.org/10.1117/12.798511

KEYWORDS: Photomasks, Binary data, Optical proximity correction, Data processing, Pellicles, Phase shifts, Data conversion, Microelectronics, Printing, Manufacturing

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Proceedings Article | 1 April 2008 Paper

Sub 50 nm cleaning-induced damage in EUV mask blanks

Abbas Rastegar, Sean Eichenlaub, Vivek Kapila, Arun John Kadaksham, Pat Marmillion

Proceedings Volume 6921, 692120 (2008) https://doi.org/10.1117/12.774951

KEYWORDS: Glasses, Cavitation, Particles, Extreme ultraviolet, Surface finishing, Acoustics, Quartz, Inspection, Photomasks, Atomic force microscopy

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Proceedings Article | 16 November 2007 Paper

A method to determine the origin of remaining particles after mask blank cleaning

Vivek Kapila, Sean Eichenlaub, Abbas Rastegar, Arun John, Pat Marmillion

Proceedings Volume 6730, 67304L (2007) https://doi.org/10.1117/12.746798

KEYWORDS: Particles, Quartz, Scanning probe microscopy, Photomasks, Chemistry, Extreme ultraviolet lithography, Liquids, Mask cleaning, Ions, Vacuum ultraviolet

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Proceedings Article | 23 October 2007 Paper

Mask Industry Assessment: 2007

Gilbert Shelden, Patricia Marmillion, Greg Hughes

Proceedings Volume 6730, 673003 (2007) https://doi.org/10.1117/12.730158

KEYWORDS: Photomasks, Binary data, Optical proximity correction, Pellicles, Glasses, Manufacturing, Data processing, Photomask technology, Inspection, Logic

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Proceedings Article | 3 May 2007 Paper

Mask industry assessment trend analysis 2006

Gilbert Shelden, Patricia Marmillion

Proceedings Volume 6533, 653303 (2007) https://doi.org/10.1117/12.731817

KEYWORDS: Photomasks, Optical proximity correction, Binary data, Data processing, Pellicles, Data conversion, Microelectronics, Printing, Logic, Phase shifts

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Proceedings Article | 3 May 2007 Paper

Hydrogenated water application for particle removal on EUV mask blank substrates

Sean Eichenlaub, Abbas Rastegar, Peter Dress, Fei Xu, Pat Marmillion

Proceedings Volume 6533, 653311 (2007) https://doi.org/10.1117/12.737174

KEYWORDS: Particles, Extreme ultraviolet, Hydrogen, Photomasks, Lithography, Acquisition tracking and pointing, Defect inspection, Quartz, Standards development, Inspection

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Proceedings Article | 15 March 2007 Paper

New requirements for the cleaning of EUV mask blanks

Abbas Rastegar, Sean Eichenlaub, Vivek Kapila, Arun John Kadaksham, Pat Marmillion

Proceedings Volume 6517, 65171D (2007) https://doi.org/10.1117/12.712105

KEYWORDS: Particles, Extreme ultraviolet, Quartz, Atomic force microscopy, Glasses, Inspection, Iron, Gold, Aluminum, Surface finishing

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Proceedings Article | 20 October 2006 Paper

Cleaning of MoSi multilayer mask blanks for EUVL

Vivek Kapila, Abbas Rastegar, Yoshiaki Ikuta, Sean Eichenlaub, Pat Marmillion

Proceedings Volume 6349, 63492W (2006) https://doi.org/10.1117/12.686556

KEYWORDS: Photomasks, Particles, Multilayers, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Quartz, Deposition processes, Chemistry

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Proceedings Article | 20 October 2006 Paper

Mask industry assessment: 2006

Gilbert Shelden, Patricia Marmillion

Proceedings Volume 6349, 634902 (2006) https://doi.org/10.1117/12.684179

KEYWORDS: Photomasks, Binary data, Data processing, Microelectronics, Pellicles, Yield improvement, Glasses, Manufacturing, Semiconductors, Databases

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Proceedings Article | 20 October 2006 Paper

Dependency of EUV mask defects on substrate defects

Sean Eichenlaub, Abbas Rastegar, Vivek Kapila, Yoshiaki Ikuta, Pat Marmillion

Proceedings Volume 6349, 63493C (2006) https://doi.org/10.1117/12.686437

KEYWORDS: Particles, Inspection, Scanning probe microscopy, Extreme ultraviolet, Defect inspection, Multilayers, Deposition processes, Scanning electron microscopy, Atomic force microscopy, Defect detection

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Proceedings Article | 20 October 2006 Paper

Point cleaning of mask blanks for extreme ultraviolet lithography

Mike Brown, John Hartley, Sean Eichenlaub, Abbas Rastegar, Patricia Marmillion, Ken Roessler

Proceedings Volume 6349, 63492K (2006) https://doi.org/10.1117/12.686764

KEYWORDS: Atomic force microscopy, Photomasks, Extreme ultraviolet lithography, Inspection, Image processing, Extreme ultraviolet, Atomic force microscope, Coating, Particles, Image resolution

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Proceedings Article | 21 June 2006 Paper

Mask industry assessment trend analysis

Gilbert Shelden, Scott Hector, Pat Marmillion, Michael Lercel

Proceedings Volume 6281, 628103 (2006) https://doi.org/10.1117/12.692628

KEYWORDS: Photomasks, Binary data, Manufacturing, Data processing, Optical proximity correction, Data conversion, Microelectronics, Printing, Pellicles, Semiconductors

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Proceedings Article | 20 May 2006 Paper

A study of damage mechanisms during EUV mask substrate cleaning

Abbas Rastegar, Sean Eichenalub, Kurt Goncher, Pat Marmillion

Proceedings Volume 6283, 62830I (2006) https://doi.org/10.1117/12.681841

KEYWORDS: Particles, Extreme ultraviolet, Glasses, Photomasks, Quartz, Atomic force microscopy, Image processing, Chemical mechanical planarization, Surface roughness, Extreme ultraviolet lithography

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Proceedings Article | 9 November 2005 Paper

Cleaning of low thermal expansion material substrates for mask blanks in EUV lithography

Sean Eichenlaub, Sebastian Dietze, Yoshiaki Ikuta, Helmut Popp, Kurt Goncher, Pat Marmillion, Abbas Rastegar

Proceedings Volume 5992, 59923K (2005) https://doi.org/10.1117/12.658508

KEYWORDS: Particles, Quartz, Scanning probe microscopy, Defect inspection, Photomasks, Extreme ultraviolet lithography, Inspection, Surface roughness, Silica, Scanning electron microscopy

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Proceedings Article | 6 December 2004 Paper

Advanced photomask cleaning

Pat Marmillion, Walt Trybula, Brian Grenon

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570013

KEYWORDS: Photomasks, Ions, Particles, Contamination, Mask cleaning, Semiconducting wafers, Chromium, Pellicles, Air contamination, Manufacturing

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Proceedings Article | 6 December 2004 Paper

A benchmark investigation on cleaning photomasks using wafer cleaning technologies

Louis Kindt, Jay Burnham, Pat Marmillion

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579366

KEYWORDS: Photomasks, Particles, Contamination, Semiconducting wafers, Quartz, Ions, Attenuators, Inspection, Fermium, Frequency modulation

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Proceedings Article | 24 May 2004 Paper

Phase defect detection with spatial heterodyne interferometry

Philip Bingham, Kenneth Tobin, Marylyn Bennett, Pat Marmillion

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536765

KEYWORDS: Phase shifts, Defect detection, Photomasks, Wavefronts, Reflectivity, Phase measurement, Inspection, Heterodyning, Interferometry, Imaging systems

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Proceedings Article | 17 December 2003 Paper

Preliminary results for mask metrology using spatial heterodyne interferometry

Philip Bingham, Kenneth Tobin, Marylyn Bennett, Pat Marmillion

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518364

KEYWORDS: Photomasks, Metrology, Phase measurement, Phase shifts, Inspection, Wavefronts, Phase shifting, Refraction, Semiconducting wafers, Quartz

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Showing 5 of 18 publications

SPIE Conference Volume | 10 May 2007

Photomask and Next-Generation Lithography Mask Technology XIV

Conference Committee Involvement (1)

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

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